Tsubasa ABE

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,320,739
- Issue date May 3, 2022
- JSR Corporation
- Goji Wakamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,243,468
- Issue date Feb 8, 2022
- JSR Corporation
- Naoya Nosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,126,084
- Issue date Sep 21, 2021
- JSR Corporation
- Naoya Nosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for film formation, film, resist underlayer film-formin...
- Patent number 11,003,079
- Issue date May 11, 2021
- JSR Corporation
- Naoya Nosaka
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition, resist underlayer film,...
- Patent number 10,520,814
- Issue date Dec 31, 2019
- JSR Corporation
- Masayuki Miyake
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for film formation, film, production method of patterne...
- Patent number 10,053,539
- Issue date Aug 21, 2018
- JSR Corporation
- Shin-ya Nakafuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for film formation, and pattern-forming method
- Patent number 9,958,781
- Issue date May 1, 2018
- JSR Corporation
- Yuushi Matsumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for film formation, film, production method of patterne...
- Patent number 9,620,378
- Issue date Apr 11, 2017
- JSR Corporation
- Shin-ya Nakafuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD O...
- Publication number 20230041656
- Publication date Feb 9, 2023
- JSR Corporation
- Yugaku TAKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD...
- Publication number 20220197144
- Publication date Jun 23, 2022
- JSR Corporation
- Naoya NOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD
- Publication number 20210286267
- Publication date Sep 16, 2021
- JSR Corporation
- Tsubasa Abe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20200012193
- Publication date Jan 9, 2020
- JSR Corporation
- Naoya NOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20190243247
- Publication date Aug 8, 2019
- JSR Corporation
- Naoya NOSAKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMIN...
- Publication number 20190094695
- Publication date Mar 28, 2019
- JSR Corporation
- Naoya NOSAKA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20180348633
- Publication date Dec 6, 2018
- JSR Corporation
- Goji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...
- Publication number 20180114698
- Publication date Apr 26, 2018
- JSR Corporation
- Shin-ya NAKAFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...
- Publication number 20180046081
- Publication date Feb 15, 2018
- JSR Corporation
- Masayuki MIYAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...
- Publication number 20170154782
- Publication date Jun 1, 2017
- JSR Corporation
- Shin-ya NAKAFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20170137663
- Publication date May 18, 2017
- JSR Corporation
- Goji WAKAMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20160314984
- Publication date Oct 27, 2016
- JSR Corporation
- Yuushi MATSUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20160257842
- Publication date Sep 8, 2016
- JSR Corporation
- Goji WAKAMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Tsubasa ABE

Person

Patents Grantslast 30 patents

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Composition for resist underlayer film formation, resist underlayer...

Composition for film formation, film, resist underlayer film-formin...

Resist underlayer film-forming composition, resist underlayer film,...

Composition for film formation, film, production method of patterne...

Method for film formation, and pattern-forming method

Composition for film formation, film, production method of patterne...

Patents Applicationslast 30 patents

COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD O...

COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD...

COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMIN...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...

RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...

COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNE...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...