Tsuneo Terasawa

Person

Hachioji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,181,790
- Issue date Dec 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defect inspection apparatus, method for inspecting defect, and meth...
- Patent number 11,940,391
- Issue date Mar 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Ryusei Terashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,860,529
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,835,851
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing reflective mask blank, and reflective mask...
- Patent number 11,789,357
- Issue date Oct 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate defect inspection method and substrate defect inspection...
- Patent number 11,624,712
- Issue date Apr 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing reflective mask blank, reflective mask blan...
- Patent number 11,415,874
- Issue date Aug 16, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and making method
- Patent number 11,061,319
- Issue date Jul 13, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defect classification method, method of sorting photomask blanks, a...
- Patent number 10,488,347
- Issue date Nov 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for defect inspection, sorting, and manufacturing photomask...
- Patent number 10,295,477
- Issue date May 21, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging apparatus and imaging method
- Patent number 9,958,399
- Issue date May 1, 2018
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- G02 - OPTICS
Information Patent Grant
Defect inspecting method, sorting method, and producing method for...
- Patent number 9,829,787
- Issue date Nov 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defect inspecting method, sorting method and producing method for p...
- Patent number 9,829,442
- Issue date Nov 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaluation method of defect size of photomask blank, selection meth...
- Patent number 9,772,551
- Issue date Sep 26, 2017
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of inspecting mask, mask inspection device, and method of ma...
- Patent number 9,229,314
- Issue date Jan 5, 2016
- Renesas Electronics Corporation
- Tsuneo Terasawa
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting mask, mask inspection device, and method of ma...
- Patent number 9,063,098
- Issue date Jun 23, 2015
- Renesas Electronics Corporation
- Tsuneo Terasawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting a mask substrate for defects, m...
- Patent number 8,986,913
- Issue date Mar 24, 2015
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- G01 - MEASURING TESTING
Information Patent Grant
Optimum imaging position detecting method, optimum imaging position...
- Patent number 8,912,501
- Issue date Dec 16, 2014
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Mask inspection method and mask inspection apparatus
- Patent number 8,797,524
- Issue date Aug 5, 2014
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- G01 - MEASURING TESTING
Information Patent Grant
Mask defect inspection method and defect inspection apparatus
- Patent number 8,699,783
- Issue date Apr 15, 2014
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting mask pattern and mask pattern inspection appar...
- Patent number 8,488,866
- Issue date Jul 16, 2013
- Renesas Electronics Corporation
- Tsuneo Terasawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Manufacturing method of semiconductor device and manufacturing meth...
- Patent number 8,435,702
- Issue date May 7, 2013
- Renesas Electronics Corporation
- Tsuneo Terasawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask defect measurement method, mask quality determination and meth...
- Patent number 8,384,888
- Issue date Feb 26, 2013
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and a method for inspection of a mask blank, a method for...
- Patent number 7,911,600
- Issue date Mar 22, 2011
- Renesas Electronics Corporation
- Tsuneo Terasawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and system of defect inspection for mask blank and method of...
- Patent number 7,630,068
- Issue date Dec 8, 2009
- Renesas Technology Corporation
- Toshihiko Tanaka
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for circuit pattern inspection
- Patent number 7,369,703
- Issue date May 6, 2008
- Hitachi, Ltd.
- Atsuko Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of fabricating a semiconductor integrated circuit that inclu...
- Patent number 7,361,530
- Issue date Apr 22, 2008
- Renesas Technology Corporation
- Tsuneo Terasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor integrated circuit that inclu...
- Patent number 7,205,222
- Issue date Apr 17, 2007
- Renesas Technology Corp.
- Tsuneo Terasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor integrated circuit device opt...
- Patent number 7,125,651
- Issue date Oct 24, 2006
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for circuit pattern inspection
- Patent number 7,095,884
- Issue date Aug 22, 2006
- Hitachi, Ltd.
- Atsuko Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20240248388
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFECT INSPECTION APPARATUS, METHOD FOR INSPECTING DEFECT, AND METH...
- Publication number 20220317061
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Ryusei TERASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING THEREOF
- Publication number 20220283491
- Publication date Sep 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20220283492
- Publication date Sep 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Shohei MIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075254
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075255
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE DEFECT INSPECTION METHOD AND SUBSTRATE DEFECT INSPECTION...
- Publication number 20220065797
- Publication date Mar 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20210333702
- Publication date Oct 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...
- Publication number 20210278759
- Publication date Sep 9, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20210080819
- Publication date Mar 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEFECT CLASSIFICATION METHOD, METHOD OF SORTING PHOTOMASK BLANKS, A...
- Publication number 20190331608
- Publication date Oct 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK BLANK AND MAKING METHOD
- Publication number 20180356721
- Publication date Dec 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DEFECT INSPECTION, SORTING, AND MANUFACTURING PHOTOMASK...
- Publication number 20180209916
- Publication date Jul 26, 2018
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
DEFECT INSPECTING METHOD, SORTING METHOD AND PRODUCING METHOD FOR P...
- Publication number 20170068158
- Publication date Mar 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
DEFECT INSPECTING METHOD, SORTING METHOD, AND PRODUCING METHOD FOR...
- Publication number 20160377553
- Publication date Dec 29, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
EVALUATION METHOD OF DEFECT SIZE OF PHOTOMASK BLANK, SELECTION METH...
- Publication number 20160116837
- Publication date Apr 28, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING MASK, MASK INSPECTION DEVICE, AND METHOD OF MA...
- Publication number 20150253658
- Publication date Sep 10, 2015
- Renesas Electronics Corporation
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
IMAGING APPARATUS AND IMAGING METHOD
- Publication number 20150138344
- Publication date May 21, 2015
- Kabushiki Kaisha Toshiba
- Takeshi Yamane
- G02 - OPTICS
Information Patent Application
Method and Apparatus for Inspecting a Mask Substrate for Defects, M...
- Publication number 20130244142
- Publication date Sep 19, 2013
- Takeshi YAMANE
- G01 - MEASURING TESTING
Information Patent Application
Optimum Imaging Position Detecting Method, Optimum Imaging Position...
- Publication number 20130244143
- Publication date Sep 19, 2013
- Kabushiki Kaihsa Toshiba
- Takeshi YAMANE
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
METHOD OF INSPECTING MASK, MASK INSPECTION DEVICE, AND METHOD OF MA...
- Publication number 20130017475
- Publication date Jan 17, 2013
- Renesas Electronics Corporation
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS
- Publication number 20120224051
- Publication date Sep 6, 2012
- Takeshi YAMANE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS
- Publication number 20120218543
- Publication date Aug 30, 2012
- Takeshi YAMANE
- G01 - MEASURING TESTING
Information Patent Application
MASK DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS
- Publication number 20120063667
- Publication date Mar 15, 2012
- Takeshi YAMANE
- G01 - MEASURING TESTING
Information Patent Application
MASK DEFECT MEASUREMENT METHOD, MASK QUALITY DETERMINATION METHOD,...
- Publication number 20110043811
- Publication date Feb 24, 2011
- Takeshi Yamane
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING MASK PATTERN AND MASK PATTERN INSPECTION APPAR...
- Publication number 20100208978
- Publication date Aug 19, 2010
- NEC ELECTRONICS CORPORAITON
- Tsuneo TERASAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND MANUFACTURING METH...
- Publication number 20100080647
- Publication date Apr 1, 2010
- RENESAS TECHNOLOGY CORP.
- Tsuneo TERASAWA
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND A METHOD FOR INSPECTION OF A MASK BLANK, A METHOD FOR...
- Publication number 20090091752
- Publication date Apr 9, 2009
- RENESAS TECHNOLOGY CORP.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
Mask Pattern Designing Method Using Optical Proximity Correction in...
- Publication number 20080276215
- Publication date Nov 6, 2008
- National Inst. of Adv. Indust. Science and Tech.
- Tetsuya Higuchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for designing mask pattern and method for manufacturing semi...
- Publication number 20080250383
- Publication date Oct 9, 2008
- Toshihiko Tanaka
- G06 - COMPUTING CALCULATING COUNTING

Tsuneo Terasawa

Person

Patents Grantslast 30 patents

Reflective mask blank and reflective mask

Defect inspection apparatus, method for inspecting defect, and meth...

Substrate with multilayer reflection film for EUV mask blank, manuf...

Substrate with multilayer reflection film for EUV mask blank, manuf...

Method of manufacturing reflective mask blank, and reflective mask...

Substrate defect inspection method and substrate defect inspection...

Method of manufacturing reflective mask blank, reflective mask blan...

Photomask blank and making method

Defect classification method, method of sorting photomask blanks, a...

Methods for defect inspection, sorting, and manufacturing photomask...

Imaging apparatus and imaging method

Defect inspecting method, sorting method, and producing method for...

Defect inspecting method, sorting method and producing method for p...

Evaluation method of defect size of photomask blank, selection meth...

Method of inspecting mask, mask inspection device, and method of ma...

Method of inspecting mask, mask inspection device, and method of ma...

Method and apparatus for inspecting a mask substrate for defects, m...

Optimum imaging position detecting method, optimum imaging position...

Mask inspection method and mask inspection apparatus

Mask defect inspection method and defect inspection apparatus

Method of inspecting mask pattern and mask pattern inspection appar...

Manufacturing method of semiconductor device and manufacturing meth...

Mask defect measurement method, mask quality determination and meth...

Apparatus and a method for inspection of a mask blank, a method for...

Method and system of defect inspection for mask blank and method of...

Method and apparatus for circuit pattern inspection

Method of fabricating a semiconductor integrated circuit that inclu...

Method of fabricating a semiconductor integrated circuit that inclu...

Method of manufacturing semiconductor integrated circuit device opt...

Method and apparatus for circuit pattern inspection

Patents Applicationslast 30 patents

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

DEFECT INSPECTION APPARATUS, METHOD FOR INSPECTING DEFECT, AND METH...

REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING THEREOF

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

SUBSTRATE DEFECT INSPECTION METHOD AND SUBSTRATE DEFECT INSPECTION...

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

DEFECT CLASSIFICATION METHOD, METHOD OF SORTING PHOTOMASK BLANKS, A...

PHOTOMASK BLANK AND MAKING METHOD

METHODS FOR DEFECT INSPECTION, SORTING, AND MANUFACTURING PHOTOMASK...

DEFECT INSPECTING METHOD, SORTING METHOD AND PRODUCING METHOD FOR P...

DEFECT INSPECTING METHOD, SORTING METHOD, AND PRODUCING METHOD FOR...

EVALUATION METHOD OF DEFECT SIZE OF PHOTOMASK BLANK, SELECTION METH...

METHOD OF INSPECTING MASK, MASK INSPECTION DEVICE, AND METHOD OF MA...

IMAGING APPARATUS AND IMAGING METHOD

Method and Apparatus for Inspecting a Mask Substrate for Defects, M...

Optimum Imaging Position Detecting Method, Optimum Imaging Position...

METHOD OF INSPECTING MASK, MASK INSPECTION DEVICE, AND METHOD OF MA...

MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS

MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS

MASK DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS

MASK DEFECT MEASUREMENT METHOD, MASK QUALITY DETERMINATION METHOD,...

METHOD OF INSPECTING MASK PATTERN AND MASK PATTERN INSPECTION APPAR...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND MANUFACTURING METH...

APPARATUS AND A METHOD FOR INSPECTION OF A MASK BLANK, A METHOD FOR...

Mask Pattern Designing Method Using Optical Proximity Correction in...

Method for designing mask pattern and method for manufacturing semi...