Tsung-Chih CHIEN

Person

Caotun Township, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,216,399
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,181,791
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Operating method for preventing photomask particulate contamination
- Patent number 12,066,765
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle enclosure for lithography systems
- Patent number 11,940,727
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,774,844
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle enclosure for lithography systems
- Patent number 11,614,683
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor apparatus and method of operating the same for preven...
- Patent number 11,506,985
- Issue date Nov 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle enclosure for lithography systems
- Patent number 11,415,879
- Issue date Aug 16, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,275,301
- Issue date Mar 15, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to reduce native defect printability
- Patent number 10,824,080
- Issue date Nov 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for charged particle lithography system
- Patent number 9,911,575
- Issue date Mar 6, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bonding pad surface damage reduction in a formation of digital patt...
- Patent number 9,633,958
- Issue date Apr 25, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for charged particle lithography system
- Patent number 9,390,891
- Issue date Jul 12, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer edge exposure module
- Patent number 8,625,076
- Issue date Jan 7, 2014
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Chih Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of inhibiting photoresist pattern collapse
- Patent number 8,101,340
- Issue date Jan 24, 2012
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ching-Yu Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240192588
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230367195
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS
- Publication number 20230236498
- Publication date Jul 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPERATING METHOD FOR PREVENTING PHOTOMASK PARTICULATE CONTAMINATION
- Publication number 20230073062
- Publication date Mar 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Chieh CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS
- Publication number 20220357651
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220197127
- Publication date Jun 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20200341388
- Publication date Oct 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Chieh CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO REDUCE NATIVE DEFECT PRINTABILITY
- Publication number 20200133141
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20200073225
- Publication date Mar 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for Charged Particle Lithography System
- Publication number 20160322199
- Publication date Nov 3, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bonding Pad Surface Damage Reduction in a Formation of Digital Patt...
- Publication number 20160225612
- Publication date Aug 4, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Charged Particle Lithography System
- Publication number 20160049278
- Publication date Feb 18, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE EXPOSURE MODULE
- Publication number 20110194086
- Publication date Aug 11, 2011
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Chih CHIEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Inhibiting Photoresist Pattern Collapse
- Publication number 20070264594
- Publication date Nov 15, 2007
- Ching-Yu Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tsung-Chih CHIEN

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Extreme ultraviolet mask and method of manufacturing the same

Operating method for preventing photomask particulate contamination

Reticle enclosure for lithography systems

Extreme ultraviolet mask and method of manufacturing the same

Reticle enclosure for lithography systems

Semiconductor apparatus and method of operating the same for preven...

Reticle enclosure for lithography systems

Extreme ultraviolet mask and method of manufacturing the same

Method to reduce native defect printability

Apparatus for charged particle lithography system

Bonding pad surface damage reduction in a formation of digital patt...

Apparatus for charged particle lithography system

Wafer edge exposure module

Method of inhibiting photoresist pattern collapse

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

OPERATING METHOD FOR PREVENTING PHOTOMASK PARTICULATE CONTAMINATION

RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME

METHOD TO REDUCE NATIVE DEFECT PRINTABILITY

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

Apparatus for Charged Particle Lithography System

Bonding Pad Surface Damage Reduction in a Formation of Digital Patt...

Apparatus for Charged Particle Lithography System

WAFER EDGE EXPOSURE MODULE

Method of Inhibiting Photoresist Pattern Collapse