Tsutomu Nakamura

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Saitama-ken, JP

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Patents Grantslast 30 patents

Information Patent Grant
Electrolytic copper-plated R-T-B magnet and plating method thereof
- Patent number 6,866,765
- Issue date Mar 15, 2005
- Hitachi Metals, Ltd.
- Setsuo Ando
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Electrolytic copper-plated r-t-b magnet and plating method thereof
- Publication number 20030052013
- Publication date Mar 20, 2003
- Setsuo Ando
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR