Tsutomu Ogawa

Person

Machida, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gas discharge panel and its production method
- Patent number 7,061,181
- Issue date Jun 13, 2006
- Fujitsu Hitachi Plasma Display Limited
- Hideki Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-excited RCC type switching power supply apparatus
- Patent number 5,943,222
- Issue date Aug 24, 1999
- Pioneer Electronic Corporation
- Tsutomu Ogawa
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Stabilizing circuit for stabilizing the horizontal picture size on...
- Patent number 5,625,261
- Issue date Apr 29, 1997
- Pioneer Electronic Corporation
- Tsutomu Ogawa
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Apparatus made of silica for semiconductor device fabrication
- Patent number 5,395,452
- Issue date Mar 7, 1995
- Fujitsu Limited
- Masanori Kobayashi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for fabricating a semiconductor device including a step for...
- Patent number 5,176,756
- Issue date Jan 5, 1993
- Fujitsu Limited
- Kazushi Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming selective single crystal regions in insulated pockets forme...
- Patent number 5,011,783
- Issue date Apr 30, 1991
- Fujitsu Limited
- Tsutomu Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing a contact plug
- Patent number 4,906,593
- Issue date Mar 6, 1990
- Fujitsu Limited
- Yoshimi Shioya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chuck apparatus for wet processing wafers
- Patent number 4,858,975
- Issue date Aug 22, 1989
- Fujitsu Limited
- Tsutomu Ogawa
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Method for measuring lattice defects in semiconductor
- Patent number 4,803,884
- Issue date Feb 14, 1989
- Fujitsu Limited
- Hiroshi Kaneta
- G01 - MEASURING TESTING
Information Patent Grant
Process for selective cutting of electrical conductive layer by irr...
- Patent number 4,476,375
- Issue date Oct 9, 1984
- Fujitsu Limited
- Tsutomu Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective epitaxy by beam energy and devices thereon
- Patent number 4,381,202
- Issue date Apr 26, 1983
- Fujitsu Limited
- Haruhisa Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing dynamic random-access memory cells
- Patent number 4,350,536
- Issue date Sep 21, 1982
- Fujitsu Limited
- Motoo Nakano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Gas discharge panel and its production method
- Publication number 20040155585
- Publication date Aug 12, 2004
- FUJITSU HITACHI PLASMA DISPLAY LIMITED
- Hideki Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tsutomu Ogawa

Person

Patents Grantslast 30 patents

Gas discharge panel and its production method

Self-excited RCC type switching power supply apparatus

Stabilizing circuit for stabilizing the horizontal picture size on...

Apparatus made of silica for semiconductor device fabrication

Method for fabricating a semiconductor device including a step for...

Forming selective single crystal regions in insulated pockets forme...

Method of producing a contact plug

Vacuum chuck apparatus for wet processing wafers

Method for measuring lattice defects in semiconductor

Process for selective cutting of electrical conductive layer by irr...

Selective epitaxy by beam energy and devices thereon

Method of producing dynamic random-access memory cells

Patents Applicationslast 30 patents

Gas discharge panel and its production method