Tsutomu OGIHARA

Person

Jyoetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Material for forming adhesive film, patterning process, and method...
- Patent number 12,351,742
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Mamoru Watabe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 12,332,565
- Issue date Jun 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film,...
- Patent number 12,332,567
- Issue date Jun 17, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke Niida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coating-type composition for forming organic film, patterning proce...
- Patent number 12,105,420
- Issue date Oct 1, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keisuke Niida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 12,032,293
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,013,640
- Issue date Jun 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,001,138
- Issue date Jun 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yusuke Kai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming organic film, substrate for manufacturing semi...
- Patent number 11,692,066
- Issue date Jul 4, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for forming organic film, substrate for manufacturing semi...
- Patent number 11,676,814
- Issue date Jun 13, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,635,691
- Issue date Apr 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 11,614,686
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hironori Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling flatness, method for forming coating film, a...
- Patent number 11,615,978
- Issue date Mar 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,592,287
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,555,697
- Issue date Jan 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing iodine-containing silicon compound
- Patent number 11,518,774
- Issue date Dec 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Material for forming organic film, substrate for manufacturing semi...
- Patent number 11,500,292
- Issue date Nov 15, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermosetting silicon-containing compound, composition for forming...
- Patent number 11,485,824
- Issue date Nov 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu Yano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,480,879
- Issue date Oct 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,385,544
- Issue date Jul 12, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process
- Patent number 11,366,386
- Issue date Jun 21, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsukasa Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, composition for forming organic film, substrate for manuf...
- Patent number 11,307,497
- Issue date Apr 19, 2022
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing dihydroxynaphthalene condensate and dihydroxyn...
- Patent number 11,267,937
- Issue date Mar 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Patterning process
- Patent number 11,231,649
- Issue date Jan 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsukasa Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,181,821
- Issue date Nov 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming organic film
- Patent number 11,042,090
- Issue date Jun 22, 2021
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound and composition for forming organic film
- Patent number 11,022,882
- Issue date Jun 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,018,015
- Issue date May 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20230333472
- Publication date Oct 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING...
- Publication number 20230274936
- Publication date Aug 31, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yasuyuki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20230244149
- Publication date Aug 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD...
- Publication number 20230203354
- Publication date Jun 29, 2023
- Shin-Etsu Chemical Co., Ltd.
- Mamoru WATABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FIL...
- Publication number 20230059089
- Publication date Feb 23, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM,...
- Publication number 20220221793
- Publication date Jul 14, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
- Publication number 20220214618
- Publication date Jul 7, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20210397092
- Publication date Dec 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR CONTROLLING FLATNESS, METHOD FOR FORMING COATING FILM, A...
- Publication number 20210335649
- Publication date Oct 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCE...
- Publication number 20210278766
- Publication date Sep 9, 2021
- Shin-Etsu Chemical Co., Ltd.
- Keisuke NIIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20210088908
- Publication date Mar 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yusuke KAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20210026246
- Publication date Jan 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...
- Publication number 20210003920
- Publication date Jan 7, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20200381247
- Publication date Dec 3, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
- Publication number 20200356007
- Publication date Nov 12, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST
- Publication number 20200340806
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20200341377
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20200332062
- Publication date Oct 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...
- Publication number 20200333709
- Publication date Oct 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20200233303
- Publication date Jul 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20200216670
- Publication date Jul 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu YANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20200159120
- Publication date May 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING IODINE-CONTAINING SILICON COMPOUND
- Publication number 20200148709
- Publication date May 14, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND
- Publication number 20200115400
- Publication date Apr 16, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryo MITSUI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNING PROCESS
- Publication number 20200090935
- Publication date Mar 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND AND COMPOSITION FOR FORMING ORGANIC FILM
- Publication number 20190391493
- Publication date Dec 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, METHOD FOR MANUFACTURING THE COMPOUND, AND COMPOSITION FO...
- Publication number 20190390000
- Publication date Dec 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS
- Publication number 20190354016
- Publication date Nov 21, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsukasa WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20190354017
- Publication date Nov 21, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsukasa WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUF...
- Publication number 20190300498
- Publication date Oct 3, 2019
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C07 - ORGANIC CHEMISTRY

Tsutomu OGIHARA

Person

Patents Grantslast 30 patents

Material for forming adhesive film, patterning process, and method...

Thermosetting iodine- and silicon-containing material, composition...

Composition for forming silicon-containing resist underlayer film,...

Composition for forming silicon-containing resist underlayer film a...

Coating-type composition for forming organic film, patterning proce...

Composition for forming silicon-containing resist underlayer film a...

Composition for forming organic film, patterning process, and polymer

Resist underlayer film material, patterning process, and method for...

Composition for forming silicon-containing resist underlayer film a...

Thermosetting iodine- and silicon-containing material, composition...

Material for forming organic film, substrate for manufacturing semi...

Material for forming organic film, substrate for manufacturing semi...

Composition for forming organic film, substrate for manufacturing s...

Resist composition and patterning process

Method for controlling flatness, method for forming coating film, a...

Method for measuring distance of diffusion of curing catalyst

Method for measuring distance of diffusion of curing catalyst

Method for producing iodine-containing silicon compound

Material for forming organic film, substrate for manufacturing semi...

Thermosetting silicon-containing compound, composition for forming...

Composition for forming silicon-containing resist underlayer film a...

Composition for forming silicon-containing resist underlayer film a...

Patterning process

Compound, composition for forming organic film, substrate for manuf...

Method for producing dihydroxynaphthalene condensate and dihydroxyn...

Patterning process

Composition for forming organic film, substrate for manufacturing s...

Composition for forming organic film

Compound and composition for forming organic film

Composition for forming organic film, substrate for manufacturing s...

Patents Applicationslast 30 patents

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD...

MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FIL...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM,...

MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

METHOD FOR CONTROLLING FLATNESS, METHOD FOR FORMING COATING FILM, A...

COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCE...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMI...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

METHOD FOR PRODUCING IODINE-CONTAINING SILICON COMPOUND

METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND

PATTERNING PROCESS

COMPOUND AND COMPOSITION FOR FORMING ORGANIC FILM

COMPOUND, METHOD FOR MANUFACTURING THE COMPOUND, AND COMPOSITION FO...

PATTERNING PROCESS

PATTERNING PROCESS

COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUF...