Tsutomu Shimokawa

Person

Yokkaichi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer, antimicrobial agent, disinfectant, antimicrobial material,...
- Patent number 11,384,172
- Issue date Jul 12, 2022
- JSR Corporation
- Hidenori Naruse
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Adherend recovery method, adherend recovery apparatus, gas-generati...
- Patent number 10,415,011
- Issue date Sep 17, 2019
- JSR Corporation
- Katsuhiko Hieda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,348,226
- Issue date May 24, 2016
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 8,450,045
- Issue date May 28, 2013
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,431,324
- Issue date Apr 30, 2013
- JSR Corporation
- Tsutomu Shimokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and radiation-sensitive composition
- Patent number 8,377,627
- Issue date Feb 19, 2013
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for pattern formation and resin composition for use in the m...
- Patent number 8,211,624
- Issue date Jul 3, 2012
- JSR Corporation
- Atsushi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compound and radiation-sensitive composition
- Patent number 8,173,351
- Issue date May 8, 2012
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming pattern and composition for forming of organic th...
- Patent number 8,173,348
- Issue date May 8, 2012
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming pattern, composition for forming upper-layer film...
- Patent number 8,119,324
- Issue date Feb 21, 2012
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium compound
- Patent number 7,897,821
- Issue date Mar 1, 2011
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, polymer, and radiation-sensitive composition
- Patent number 7,812,105
- Issue date Oct 12, 2010
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 7,297,461
- Issue date Nov 20, 2007
- JSR Corporation
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,288,359
- Issue date Oct 30, 2007
- JSR Corporation
- Haruo Iwasawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method and bilayer film
- Patent number 7,244,549
- Issue date Jul 17, 2007
- JSR Corporation
- Haruo Iwasawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,202,016
- Issue date Apr 10, 2007
- JSR Corporation
- Masaaki Miyaji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polysiloxane, process for production thereof and radiation-sensitiv...
- Patent number 7,108,955
- Issue date Sep 19, 2006
- JSR Corporation
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition changing in refractive index and me...
- Patent number 7,108,954
- Issue date Sep 19, 2006
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer, polymer mixture, and radiation-sensitive resin composition
- Patent number 7,105,269
- Issue date Sep 12, 2006
- JSR Corporation
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acenaphthylene derivative, polymer, and antireflection film-forming...
- Patent number 7,037,994
- Issue date May 2, 2006
- JSR Corporation
- Hikaru Sugita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,964,840
- Issue date Nov 15, 2005
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,933,094
- Issue date Aug 23, 2005
- JSR Corporation
- Masaaki Miyaji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Anti-reflection coating forming composition
- Patent number 6,852,791
- Issue date Feb 8, 2005
- JSR Corporation
- Kazuo Kawaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysiloxane, method of manufacturing same, silicon-containing alic...
- Patent number 6,846,895
- Issue date Jan 25, 2005
- JSR Corporation
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Anthracene derivative and radiation-sensitive resin composition
- Patent number 6,830,868
- Issue date Dec 14, 2004
- JSR Corporation
- Tomoki Nagai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition having refractive index sensitively changeable by radia...
- Patent number 6,828,078
- Issue date Dec 7, 2004
- JSR Corporation
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonyloxime compound, and radiation sensitive acid generator, pos...
- Patent number 6,824,954
- Issue date Nov 30, 2004
- JSR Corporation
- Eiji Yoneda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,821,705
- Issue date Nov 23, 2004
- JSR Corporation
- Tomoki Nagai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,800,414
- Issue date Oct 5, 2004
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Vinylphenylpropionic acid derivatives, production process therefor,...
- Patent number 6,770,780
- Issue date Aug 3, 2004
- JSR Corporation
- Yong Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POLYMER, ANTIMICROBIAL AGENT, DISINFECTANT, ANTIMICROBIAL MATERIAL,...
- Publication number 20180360033
- Publication date Dec 20, 2018
- JSR Corporation
- Hidenori NARUSE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATI...
- Publication number 20160168532
- Publication date Jun 16, 2016
- JSR Corporation
- Katsuhiko HIEDA
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140363773
- Publication date Dec 11, 2014
- JSR Corporation
- Atsushi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120156621
- Publication date Jun 21, 2012
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20120122036
- Publication date May 17, 2012
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20110143279
- Publication date Jun 16, 2011
- JSR Corporation
- Tsutomu SHIMOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20110117489
- Publication date May 19, 2011
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND
- Publication number 20100324329
- Publication date Dec 23, 2010
- JSR Corporation
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20100285405
- Publication date Nov 11, 2010
- JSR Corporation
- Tsutomu SHIMOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC TH...
- Publication number 20100233635
- Publication date Sep 16, 2010
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE M...
- Publication number 20100190104
- Publication date Jul 29, 2010
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM...
- Publication number 20090311622
- Publication date Dec 17, 2009
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20090274977
- Publication date Nov 5, 2009
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Novel Compound, Polymer, and Radiation-Sensitive Composition
- Publication number 20090069521
- Publication date Mar 12, 2009
- JSR Corporation
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-Sensitive Resin Composition
- Publication number 20080187859
- Publication date Aug 7, 2008
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Compos...
- Publication number 20080026314
- Publication date Jan 31, 2008
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Pattern forming method and bilayer film
- Publication number 20070248911
- Publication date Oct 25, 2007
- Haruo Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060234154
- Publication date Oct 19, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20050214680
- Publication date Sep 29, 2005
- Masaaki Miyaji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation sensitive resin composition
- Publication number 20050171226
- Publication date Aug 4, 2005
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20040241580
- Publication date Dec 2, 2004
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polysiloxane, process for production thereof and radiation-sensitiv...
- Publication number 20040143082
- Publication date Jul 22, 2004
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Acenaphthylene derivative, polymer, and antireflection film-forming...
- Publication number 20040034155
- Publication date Feb 19, 2004
- Hikaru Sugita
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Radiation-sensitive composition changing in refractive index and me...
- Publication number 20040013972
- Publication date Jan 22, 2004
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel anthracene derivative and radiation-sensitive resin composition
- Publication number 20030194634
- Publication date Oct 16, 2003
- Tomoki Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polysiloxane, method of manufacturing same, silicon-containing alic...
- Publication number 20030191268
- Publication date Oct 9, 2003
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20030170561
- Publication date Sep 11, 2003
- Haruo Iwasawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Copolymer, polymer mixture, and radiation-sensitive resin composition
- Publication number 20030157423
- Publication date Aug 21, 2003
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonyloxime compound, and radiation sensitive acid generator, pos...
- Publication number 20030113660
- Publication date Jun 19, 2003
- Eiji Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and bilayer film
- Publication number 20030073040
- Publication date Apr 17, 2003
- Haruo Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tsutomu Shimokawa

Person

Patents Grantslast 30 patents

Polymer, antimicrobial agent, disinfectant, antimicrobial material,...

Adherend recovery method, adherend recovery apparatus, gas-generati...

Radiation-sensitive resin composition

Pattern forming method

Radiation-sensitive resin composition

Compound and radiation-sensitive composition

Method for pattern formation and resin composition for use in the m...

Compound and radiation-sensitive composition

Method of forming pattern and composition for forming of organic th...

Method of forming pattern, composition for forming upper-layer film...

Sulfonium compound

Compound, polymer, and radiation-sensitive composition

Radiation sensitive resin composition

Radiation-sensitive resin composition

Pattern forming method and bilayer film

Radiation-sensitive resin composition

Polysiloxane, process for production thereof and radiation-sensitiv...

Radiation-sensitive composition changing in refractive index and me...

Copolymer, polymer mixture, and radiation-sensitive resin composition

Acenaphthylene derivative, polymer, and antireflection film-forming...

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Anti-reflection coating forming composition

Polysiloxane, method of manufacturing same, silicon-containing alic...

Anthracene derivative and radiation-sensitive resin composition

Composition having refractive index sensitively changeable by radia...

Sulfonyloxime compound, and radiation sensitive acid generator, pos...

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Vinylphenylpropionic acid derivatives, production process therefor,...

Patents Applicationslast 30 patents

POLYMER, ANTIMICROBIAL AGENT, DISINFECTANT, ANTIMICROBIAL MATERIAL,...

ADHEREND RECOVERY METHOD, ADHEREND RECOVERY APPARATUS, GAS-GENERATI...

PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION

PATTERN FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION

COMPOUND AND RADIATION-SENSITIVE COMPOSITION

COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION

METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC TH...

METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE M...

METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM...

COMPOUND AND RADIATION-SENSITIVE COMPOSITION

Novel Compound, Polymer, and Radiation-Sensitive Composition

Radiation-Sensitive Resin Composition

Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Compos...

Pattern forming method and bilayer film

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation sensitive resin composition

Radiation-sensitive resin composition

Polysiloxane, process for production thereof and radiation-sensitiv...

Acenaphthylene derivative, polymer, and antireflection film-forming...

Radiation-sensitive composition changing in refractive index and me...

Novel anthracene derivative and radiation-sensitive resin composition

Polysiloxane, method of manufacturing same, silicon-containing alic...

Radiation-sensitive resin composition

Copolymer, polymer mixture, and radiation-sensitive resin composition

Sulfonyloxime compound, and radiation sensitive acid generator, pos...

Pattern forming method and bilayer film