Tsutomu Shoki

Person

Tama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,880,130
- Issue date Jan 23, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,852,964
- Issue date Dec 26, 2023
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 11,815,806
- Issue date Nov 14, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,815,807
- Issue date Nov 14, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with a multilayer reflective film, reflective mask blank,...
- Patent number 11,681,214
- Issue date Jun 20, 2023
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with conductive film, substrate with multilayer reflectiv...
- Patent number 11,561,463
- Issue date Jan 24, 2023
- Hoya Corporation
- Masanori Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,550,215
- Issue date Jan 10, 2023
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 11,531,264
- Issue date Dec 20, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,480,867
- Issue date Oct 25, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with a multilayer reflective film, reflective mask blank,...
- Patent number 11,281,090
- Issue date Mar 22, 2022
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, reflective mask blank, r...
- Patent number 11,262,647
- Issue date Mar 1, 2022
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing sam...
- Patent number 11,249,385
- Issue date Feb 15, 2022
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, method of manufacturing reflective mask and...
- Patent number 11,187,972
- Issue date Nov 30, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask blank, and method for manu...
- Patent number 11,131,921
- Issue date Sep 28, 2021
- Hoya Corporation
- Tsutomu Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,048,159
- Issue date Jun 29, 2021
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
- Patent number 11,003,068
- Issue date May 11, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with an electrically conductive film, substrate with a mu...
- Patent number 10,996,554
- Issue date May 4, 2021
- Hoya Corporation
- Takumi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflective film, re...
- Patent number 10,921,705
- Issue date Feb 16, 2021
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,620,527
- Issue date Apr 14, 2020
- Hoya Corporation
- Kazuhiro Hamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate with electrically conductive film, substrate with multila...
- Patent number 10,606,166
- Issue date Mar 31, 2020
- Hoya Corporation
- Takumi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method for manufacturing re...
- Patent number 10,481,484
- Issue date Nov 19, 2019
- Hoya Corporation
- Yohei Ikebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,429,728
- Issue date Oct 1, 2019
- Hoya Corporation
- Kazuhiro Hamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, method for manufacturing same, reflective ma...
- Patent number 10,347,485
- Issue date Jul 9, 2019
- Hoya Corporation
- Tsutomu Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,295,900
- Issue date May 21, 2019
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank, method of manufacturing reflective mask blan...
- Patent number 10,191,365
- Issue date Jan 29, 2019
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer reflective film formed substrate, reflective mask blank,...
- Patent number 10,126,641
- Issue date Nov 13, 2018
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask blank, and method for manu...
- Patent number 10,067,419
- Issue date Sep 4, 2018
- Hoya Corporation
- Tsutomu Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank substrate, substrate with multilayer reflective film, re...
- Patent number 10,025,176
- Issue date Jul 17, 2018
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,001,699
- Issue date Jun 19, 2018
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 9,897,909
- Issue date Feb 20, 2018
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240103354
- Publication date Mar 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240036458
- Publication date Feb 1, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
- Publication number 20240036457
- Publication date Feb 1, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE STRUCTURE, REFLECTIVE MASK BLANK, REFLECTIVE MASK AND ME...
- Publication number 20230266658
- Publication date Aug 24, 2023
- HOYA CORPORATION
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20230244135
- Publication date Aug 3, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
- Publication number 20230168575
- Publication date Jun 1, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20230087016
- Publication date Mar 23, 2023
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220229357
- Publication date Jul 21, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220206379
- Publication date Jun 30, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...
- Publication number 20220146925
- Publication date May 12, 2022
- HOYA CORPORATION
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME,...
- Publication number 20220121102
- Publication date Apr 21, 2022
- HOYA CORPORATION
- Tsutomu SHOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLA...
- Publication number 20210294202
- Publication date Sep 23, 2021
- HOYA CORPORATION
- Tsutomu SHOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20210255536
- Publication date Aug 19, 2021
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR PRODUCING R...
- Publication number 20210223681
- Publication date Jul 22, 2021
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, PRODUCTION METHOD THEREFOR,...
- Publication number 20210208498
- Publication date Jul 8, 2021
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...
- Publication number 20210103209
- Publication date Apr 8, 2021
- HOYA CORPORATION
- Masanori NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE EQUIPPED WITH MULTI-LAYER REFLECTION FILM, REFLECTION-TYP...
- Publication number 20200310239
- Publication date Oct 1, 2020
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20200249558
- Publication date Aug 6, 2020
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH AN ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH A MU...
- Publication number 20200192213
- Publication date Jun 18, 2020
- HOYA CORPORATION
- Takumi KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...
- Publication number 20190384158
- Publication date Dec 19, 2019
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...
- Publication number 20190369483
- Publication date Dec 5, 2019
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20190361337
- Publication date Nov 28, 2019
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING SAM...
- Publication number 20190361338
- Publication date Nov 28, 2019
- HOYA CORPORATION
- Yohei IKEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING REFLECTIVE MASK AND...
- Publication number 20190265585
- Publication date Aug 29, 2019
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLA...
- Publication number 20190079382
- Publication date Mar 14, 2019
- HOYA CORPORATION
- Tsutomu SHOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...
- Publication number 20180356719
- Publication date Dec 13, 2018
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD FOR MANU...
- Publication number 20180348628
- Publication date Dec 6, 2018
- HOYA CORPORATION
- Tsutomu SHOKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20180275507
- Publication date Sep 27, 2018
- HOYA CORPORATION
- Toshihiko ORIHARA
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE WITH ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH MULTILA...
- Publication number 20180149962
- Publication date May 31, 2018
- HOYA CORPORATION
- Takumi KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...
- Publication number 20180120692
- Publication date May 3, 2018
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tsutomu Shoki

Person

Patents Grantslast 30 patents

Reflective mask blank, reflective mask and method of manufacturing...

Method for manufacturing reflective mask blank, reflective mask bla...

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, reflective mask, method of manufacturing ref...

Substrate with a multilayer reflective film, reflective mask blank,...

Substrate with conductive film, substrate with multilayer reflectiv...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask and manufacturing method the...

Reflective mask blank, reflective mask and method of manufacturing...

Substrate with a multilayer reflective film, reflective mask blank,...

Substrate with multilayer reflective film, reflective mask blank, r...

Reflective mask blank, reflective mask, method of manufacturing sam...

Reflective mask blank, method of manufacturing reflective mask and...

Method for manufacturing reflective mask blank, and method for manu...

Method for manufacturing reflective mask blank, reflective mask bla...

Reflective mask blank, reflective mask and method of manufacturing...

Substrate with an electrically conductive film, substrate with a mu...

Mask blank substrate, substrate with multilayer reflective film, re...

Mask blank substrate, substrate with multilayer reflection film, tr...

Substrate with electrically conductive film, substrate with multila...

Reflective mask blank, reflective mask, method for manufacturing re...

Mask blank substrate, substrate with multilayer reflection film, tr...

Reflective mask blank, method for manufacturing same, reflective ma...

Mask blank substrate, substrate with multilayer reflection film, tr...

Reflective mask blank, method of manufacturing reflective mask blan...

Multilayer reflective film formed substrate, reflective mask blank,...

Method for manufacturing reflective mask blank, and method for manu...

Mask blank substrate, substrate with multilayer reflective film, re...

Mask blank substrate, substrate with multilayer reflection film, tr...

Mask blank substrate, substrate with multilayer reflection film, tr...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...

REFLECTIVE STRUCTURE, REFLECTIVE MASK BLANK, REFLECTIVE MASK AND ME...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

SUBSTRATE WITH A MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK,...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME,...

METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLA...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR PRODUCING R...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, PRODUCTION METHOD THEREFOR,...

SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...

SUBSTRATE EQUIPPED WITH MULTI-LAYER REFLECTION FILM, REFLECTION-TYP...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

SUBSTRATE WITH AN ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH A MU...

REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING...

SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING SAM...

REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING REFLECTIVE MASK AND...

METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLA...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...

METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD FOR MANU...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

SUBSTRATE WITH ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH MULTILA...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING RE...