Tsutomu Tsukada

Person

Fuchu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 6,199,505
- Issue date Mar 13, 2001
- Anelva Corporation
- Hisaaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,043,608
- Issue date Mar 28, 2000
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,016,765
- Issue date Jan 25, 2000
- Anelva Corporation
- Yoichiro Numasawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface processing apparatus
- Patent number 5,961,776
- Issue date Oct 5, 1999
- Anelva Corporation
- Hisaaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus for producing plasma at low electron te...
- Patent number 5,936,352
- Issue date Aug 10, 1999
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator with a shield interposing the antenna
- Patent number 5,900,699
- Issue date May 4, 1999
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus which uses a uniquely shaped antenna to...
- Patent number 5,565,738
- Issue date Oct 15, 1996
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching apparatus and method
- Patent number 5,087,341
- Issue date Feb 11, 1992
- Anelva Corporation
- Tsutomu Tsukada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching apparatus with dielectrically isolated electrodes
- Patent number 4,968,374
- Issue date Nov 6, 1990
- Anelva Corporation
- Tsutomu Tsukada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 4,950,956
- Issue date Aug 21, 1990
- Anelva Corporation
- Tatsuo Asamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 4,816,638
- Issue date Mar 28, 1989
- Anelva Corporation
- Katsumi Ukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waste gas exhaust system for vacuum process apparatus
- Patent number 4,655,800
- Issue date Apr 7, 1987
- Anelva Corporation
- Tsutomu Tsukada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Dry etching apparatus comprising etching chambers of different etch...
- Patent number 4,482,419
- Issue date Nov 13, 1984
- Anelva Corporation
- Tsutomu Tsukada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of monitoring status of a silicon layer by detecting, emissi...
- Patent number 4,430,151
- Issue date Feb 7, 1984
- Anelva Corporation
- Tsutomu Tsukada
- G01 - MEASURING TESTING
Information Patent Grant
Spectral monitoring device for both plasma etching and sputtering
- Patent number 4,405,989
- Issue date Sep 20, 1983
- Anelva Corporation
- Tsutomu Tsukada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma device comprising an intermediate electrode out of contact w...
- Patent number 4,399,016
- Issue date Aug 16, 1983
- Anelva Corporation
- Tsutomu Tsukada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching device comprising a member for bringing a specimen into...
- Patent number 4,376,692
- Issue date Mar 15, 1983
- Anelva Corporation
- Tsutomu Tsukada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching device comprising an electrode for controlling etch rate
- Patent number 4,352,725
- Issue date Oct 5, 1982
- Anelva Corporation
- Tsutomu Tsukada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Apparatus and method for manufacturing halogen gas and halogen gas...
- Publication number 20090260974
- Publication date Oct 22, 2009
- Yoichiro Numasawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Apparatus and method for manufacturing halogen gas and halogen gas...
- Publication number 20070086939
- Publication date Apr 19, 2007
- Yoichiro Numasawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Apparatus and method for manufacturing halogen gas and halogen gas...
- Publication number 20040035691
- Publication date Feb 26, 2004
- Yoichiro Numasawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Tsutomu Tsukada

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Surface processing apparatus

Plasma processing apparatus for producing plasma at low electron te...

Plasma generator with a shield interposing the antenna

Plasma processing apparatus which uses a uniquely shaped antenna to...

Dry etching apparatus and method

Plasma etching apparatus with dielectrically isolated electrodes

Plasma processing apparatus

Vacuum processing apparatus

Waste gas exhaust system for vacuum process apparatus

Dry etching apparatus comprising etching chambers of different etch...

Method of monitoring status of a silicon layer by detecting, emissi...

Spectral monitoring device for both plasma etching and sputtering

Plasma device comprising an intermediate electrode out of contact w...

Dry etching device comprising a member for bringing a specimen into...

Dry etching device comprising an electrode for controlling etch rate

Patents Applicationslast 30 patents

Apparatus and method for manufacturing halogen gas and halogen gas...

Apparatus and method for manufacturing halogen gas and halogen gas...

Apparatus and method for manufacturing halogen gas and halogen gas...