Tsuyoshi Yoshida

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 8,083,888
- Issue date Dec 27, 2011
- Hitachi High-Technologies Corporation
- Tatehito Usui
- G01 - MEASURING TESTING
Information Patent Grant
Specimen surface processing apparatus and surface processing method
- Patent number 7,354,525
- Issue date Apr 8, 2008
- Hitachi High-Technologies Corporation
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
LSI device etching method and apparatus thereof
- Patent number 6,919,274
- Issue date Jul 19, 2005
- Hitachi High-Technologies Corporation
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 6,156,663
- Issue date Dec 5, 2000
- Hitachi, Ltd.
- Katsuya Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090159211
- Publication date Jun 25, 2009
- Hitachi High-Technologies Corporation
- Tatehito Usui
- G01 - MEASURING TESTING
Information Patent Application
Plasma Etching Method
- Publication number 20080076259
- Publication date Mar 27, 2008
- Yoshiyuki OOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20080017107
- Publication date Jan 24, 2008
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method
- Publication number 20070090090
- Publication date Apr 26, 2007
- Koichi Nakaune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor fabricating apparatus and method and apparatus for de...
- Publication number 20060073619
- Publication date Apr 6, 2006
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Specimen surface processing apparatus and surface processing method
- Publication number 20060000804
- Publication date Jan 5, 2006
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050126711
- Publication date Jun 16, 2005
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050051273
- Publication date Mar 10, 2005
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050045104
- Publication date Mar 3, 2005
- Masatsugu Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LSI device etching method and apparatus thereof
- Publication number 20050026431
- Publication date Feb 3, 2005
- Hitachi High-Technologies Corporation
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Specimen surface processing apparatus and surface processing method
- Publication number 20040171273
- Publication date Sep 2, 2004
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor fabricating apparatus and method and apparatus for de...
- Publication number 20040040658
- Publication date Mar 4, 2004
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS

Tsuyoshi Yoshida

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Specimen surface processing apparatus and surface processing method

LSI device etching method and apparatus thereof

Method and apparatus for plasma processing

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

Plasma Etching Method

Plasma processing apparatus

Dry etching method

Semiconductor fabricating apparatus and method and apparatus for de...

Specimen surface processing apparatus and surface processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

LSI device etching method and apparatus thereof

Specimen surface processing apparatus and surface processing method

Semiconductor fabricating apparatus and method and apparatus for de...