Tuan Ngo

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Measuring and controlling wafer potential in pulsed RF bias processing
- Patent number 9,659,757
- Issue date May 23, 2017
- Lam Research Corporation
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring and controlling wafer potential in pulsed RF bias processing
- Patent number 8,303,763
- Issue date Nov 6, 2012
- Lam Research Corporation
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of and apparatus for measuring and controlling wafer potent...
- Patent number 8,192,576
- Issue date Jun 5, 2012
- Lam Research Corporation
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated electronic hardware for wafer processing control and dia...
- Patent number 6,622,286
- Issue date Sep 16, 2003
- Lam Research Corporation
- Tuan Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated full wavelength spectrometer for wafer processing
- Patent number 6,526,355
- Issue date Feb 25, 2003
- Lam Research Corporation
- Tuqiang Ni
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for compensating wafer bias in a plasma processin...
- Patent number 6,361,645
- Issue date Mar 26, 2002
- Lam Research Corporation
- Alan M. Schoepp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for minimizing plasma instability in an rf...
- Patent number 6,060,837
- Issue date May 9, 2000
- Lam Research Corporation
- Brett C. Richardson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for igniting a plasma in an r.f. plasma pro...
- Patent number 5,982,099
- Issue date Nov 9, 1999
- Lam Research Corporation
- Michael S. Barnes
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of and apparatus for minimizing plasma instability in an RF...
- Patent number 5,929,717
- Issue date Jul 27, 1999
- Lam Research Corporation
- Brett C. Richardson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for controlling reactive impedances of a ma...
- Patent number 5,689,215
- Issue date Nov 18, 1997
- Lam Research Corporation
- Brett Richardson
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Wafer handling apparatus and method
- Patent number 4,507,078
- Issue date Mar 26, 1985
- Silicon Valley Group, Inc.
- Johann Tam
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING
- Publication number 20130050892
- Publication date Feb 28, 2013
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING
- Publication number 20120206127
- Publication date Aug 16, 2012
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of and apparatus for measuring and controlling wafer potent...
- Publication number 20100315064
- Publication date Dec 16, 2010
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Measuring and controlling wafer potential in pulsed RF bias processing

Measuring and controlling wafer potential in pulsed RF bias processing

Methods of and apparatus for measuring and controlling wafer potent...

Integrated electronic hardware for wafer processing control and dia...

Integrated full wavelength spectrometer for wafer processing

Method and device for compensating wafer bias in a plasma processin...

Method of and apparatus for minimizing plasma instability in an rf...

Method of and apparatus for igniting a plasma in an r.f. plasma pro...

Method of and apparatus for minimizing plasma instability in an RF...

Method of and apparatus for controlling reactive impedances of a ma...

Wafer handling apparatus and method

Patents Applicationslast 30 patents

MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING

MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING

Methods of and apparatus for measuring and controlling wafer potent...