Tung-Ching Tseng

Person

Taipei, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical vapor deposition apparatus with cleaning gas flow guiding...
- Patent number 11,532,459
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hung Yeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for wafer processing
- Patent number 11,315,810
- Issue date Apr 26, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tung-Ching Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 10,121,698
- Issue date Nov 6, 2018
- Taiwan Semiconductor Manufacturing Company
- Hsiang-Huan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device metallization systems and methods
- Patent number 9,548,241
- Issue date Jan 17, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Huan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS image sensor with epitaxial passivation layer
- Patent number 9,349,768
- Issue date May 24, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Hung Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device metallization systems and methods
- Patent number 9,318,364
- Issue date Apr 19, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Huan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scratch reduction for chemical mechanical polishing
- Patent number 7,297,632
- Issue date Nov 20, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chuang-Ping Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for chemical mechanical polishing of a shallow trench isolat...
- Patent number 7,109,117
- Issue date Sep 19, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tung-Ching Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-line hot-wire sensor for slurry monitoring
- Patent number 7,016,790
- Issue date Mar 21, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Ching Tseng
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming a contact on a silicon-on-insulator wafer
- Patent number 6,930,040
- Issue date Aug 16, 2005
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chuan-Ping Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving semiconductor process wafer CMP uniformity whi...
- Patent number 6,812,069
- Issue date Nov 2, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Ching Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polisher equipped with chilled retaining ring a...
- Patent number 6,686,284
- Issue date Feb 3, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Wei Chung
- B24 - GRINDING POLISHING
Information Patent Grant
Dual detection method for end point in chemical mechanical polishing
- Patent number 6,579,150
- Issue date Jun 17, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Ching Tseng
- B24 - GRINDING POLISHING
Information Patent Grant
Retaining ring with active edge-profile control by piezoelectric ac...
- Patent number 6,579,151
- Issue date Jun 17, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Ching Tseng
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...
- Publication number 20230098570
- Publication date Mar 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hung YEH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR WAFER PROCESSING
- Publication number 20200365428
- Publication date Nov 19, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- TUNG-CHING TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDING...
- Publication number 20190136373
- Publication date May 9, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hung YEH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING EQUIPMENT AND METHOD FOR TREATING WAFER
- Publication number 20170194162
- Publication date Jul 6, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Chih LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Metallization Systems and Methods
- Publication number 20170125290
- Publication date May 4, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Huan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Metallization Systems and Methods
- Publication number 20160181152
- Publication date Jun 23, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Huan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS Image Sensor with Epitaxial Passivation Layer
- Publication number 20150279894
- Publication date Oct 1, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Hung Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Metallization Systems and Methods
- Publication number 20150197849
- Publication date Jul 16, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Huan Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Scratch reduction for chemical mechanical polishing
- Publication number 20060211250
- Publication date Sep 21, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chuang-Ping Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for chemical mechanical polishing of a shallow trench isolat...
- Publication number 20050153555
- Publication date Jul 14, 2005
- Taiwan Semiconductor Manufacturing Co.
- Tung-Ching Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a contact on a silicon-on-insulator wafer
- Publication number 20050090096
- Publication date Apr 28, 2005
- Chuan-Ping Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for improving semiconductor process wafer CMP uniformity whi...
- Publication number 20040115925
- Publication date Jun 17, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Ching Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-line hot-wire sensor for slurry monitoring
- Publication number 20040083068
- Publication date Apr 29, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Ching Tseng
- G01 - MEASURING TESTING
Information Patent Application
Chemical mechanical polisher equipped with chilled retaining ring a...
- Publication number 20030148615
- Publication date Aug 7, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Wei Chung
- B24 - GRINDING POLISHING
Information Patent Application
Retaining ring with active edge-profile control by piezoelectric ac...
- Publication number 20030027498
- Publication date Feb 6, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Ching Tseng
- B24 - GRINDING POLISHING
Information Patent Application
Dual detection method for end point in chemical mechanical polishing
- Publication number 20030008597
- Publication date Jan 9, 2003
- Taiwan Semiconductor Manufacturing Co.,Ltd.
- Tung-Ching Tseng
- B24 - GRINDING POLISHING

Tung-Ching Tseng

Person

Patents Grantslast 30 patents

Chemical vapor deposition apparatus with cleaning gas flow guiding...

Apparatus for wafer processing

Method of manufacturing a semiconductor device

Semiconductor device metallization systems and methods

CMOS image sensor with epitaxial passivation layer

Semiconductor device metallization systems and methods

Scratch reduction for chemical mechanical polishing

Method for chemical mechanical polishing of a shallow trench isolat...

In-line hot-wire sensor for slurry monitoring

Method of forming a contact on a silicon-on-insulator wafer

Method for improving semiconductor process wafer CMP uniformity whi...

Chemical mechanical polisher equipped with chilled retaining ring a...

Dual detection method for end point in chemical mechanical polishing

Retaining ring with active edge-profile control by piezoelectric ac...

Patents Applicationslast 30 patents

GACHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDIN...

APPARATUS FOR WAFER PROCESSING

CHEMICAL VAPOR DEPOSITION APPARATUS WITH CLEANING GAS FLOW GUIDING...

SEMICONDUCTOR MANUFACTURING EQUIPMENT AND METHOD FOR TREATING WAFER

Semiconductor Device Metallization Systems and Methods

Semiconductor Device Metallization Systems and Methods

CMOS Image Sensor with Epitaxial Passivation Layer

Semiconductor Device Metallization Systems and Methods

Scratch reduction for chemical mechanical polishing

Method for chemical mechanical polishing of a shallow trench isolat...

Method of forming a contact on a silicon-on-insulator wafer

Method for improving semiconductor process wafer CMP uniformity whi...

In-line hot-wire sensor for slurry monitoring

Chemical mechanical polisher equipped with chilled retaining ring a...

Retaining ring with active edge-profile control by piezoelectric ac...

Dual detection method for end point in chemical mechanical polishing