Tuqiang NI

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-zone temperature control plasma reactor
- Patent number 12,094,695
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a variable coupling of low frequency RF power...
- Patent number 12,062,524
- Issue date Aug 13, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power supply system, plasma processor, and frequenc...
- Patent number 11,682,541
- Issue date Jun 20, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner assembly for vacuum treatment apparatus, and vacuum treatment...
- Patent number 11,676,803
- Issue date Jun 13, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitively coupled plasma etching apparatus
- Patent number 11,670,515
- Issue date Jun 6, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lift pin assembly, an electrostatic chuck and a processing apparatu...
- Patent number 11,626,314
- Issue date Apr 11, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor and processing method
- Patent number 11,545,342
- Issue date Jan 3, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma etching apparatus
- Patent number 11,515,168
- Issue date Nov 29, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform pumping dual-station vacuum processor
- Patent number 11,387,084
- Issue date Jul 12, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yuejun Gong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma etching apparatus
- Patent number 11,373,843
- Issue date Jun 28, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus with low particle contamination and method...
- Patent number 11,371,141
- Issue date Jun 28, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor and heating apparatus therefor
- Patent number 11,363,680
- Issue date Jun 14, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion-resistant structure for a gas delivery system in a plasma...
- Patent number 11,348,763
- Issue date May 31, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Zengdi Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas showerhead, manufacturing method, and plasma apparatus includin...
- Patent number 11,309,165
- Issue date Apr 19, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for ultra-high aspect ratio etching and etching meth...
- Patent number 11,189,496
- Issue date Nov 30, 2021
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Switchable matching network and an inductively coupled plasma proce...
- Patent number 10,685,811
- Issue date Jun 16, 2020
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Processing chamber, combination of processing chamber and loadlock,...
- Patent number 10,685,814
- Issue date Jun 16, 2020
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Heng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device of changing gas flow pattern and a wafer processing method a...
- Patent number 10,529,577
- Issue date Jan 7, 2020
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- TuQiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performance enhancement of coating packaged ESC for semiconductor a...
- Patent number 9,633,884
- Issue date Apr 25, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming He
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ICP source design for plasma uniformity and efficiency enhancement
- Patent number 9,431,216
- Issue date Aug 30, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing device
- Patent number 9,275,870
- Issue date Mar 1, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Lei Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 9,208,998
- Issue date Dec 8, 2015
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 8,366,829
- Issue date Feb 5, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station plasma reactor with multiple plasma regions
- Patent number 8,336,488
- Issue date Dec 25, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Aihua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitive CVD reactor and methods for plasma CVD process
- Patent number 8,297,225
- Issue date Oct 30, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method of sensing and removing residual charge from a pr...
- Patent number 8,111,499
- Issue date Feb 7, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple frequency plasma chamber, switchable RF system, and proces...
- Patent number 7,503,996
- Issue date Mar 17, 2009
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA TREATMENT APPARATUS, LOWER ELECTRODE ASSEMBLY AND FORMING ME...
- Publication number 20220351933
- Publication date Nov 3, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD FOR MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL IN...
- Publication number 20220005677
- Publication date Jan 6, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...
- Publication number 20210118716
- Publication date Apr 22, 2021
- Advanced Micro-Fabrication Equipment Inc. China
- Rubin YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSOR AND PROCESSING METHOD
- Publication number 20210066043
- Publication date Mar 4, 2021
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIO FREQUENCY POWER SUPPLY SYSTEM, PLASMA PROCESSOR, AND FREQUENC...
- Publication number 20210057188
- Publication date Feb 25, 2021
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER ASSEMBLY FOR VACUUM TREATMENT APPARATUS, AND VACUUM TREATMENT...
- Publication number 20200388467
- Publication date Dec 10, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CORROSION-RESISTANT STRUCTURE FOR A GAS DELIVERY SYSTEM IN A PLASMA...
- Publication number 20200381213
- Publication date Dec 3, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Zengdi LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SHOWERHEAD, MANUFACTURING METHOD, AND PLASMA APPARATUS INCLUDIN...
- Publication number 20200321193
- Publication date Oct 8, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR FOR ULTRA-HIGH ASPECT RATIO ETCHING AND ETCHING METH...
- Publication number 20200251345
- Publication date Aug 6, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Reactor and Heating Apparatus Therefor
- Publication number 20200214087
- Publication date Jul 2, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature Control Apparatus for Semiconductor Processing Equipmen...
- Publication number 20200211873
- Publication date Jul 2, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitively Coupled Plasma Etching Apparatus
- Publication number 20200194276
- Publication date Jun 18, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitively Coupled Plasma Etching Apparatus
- Publication number 20200194230
- Publication date Jun 18, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitively Coupled Plasma Etching Apparatus
- Publication number 20200194275
- Publication date Jun 18, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE TEMPERATURE CONTROL PLASMA REACTOR
- Publication number 20200161104
- Publication date May 21, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SWITCHABLE MATCHING NETWORK AND AN INDUCTIVELY COUPLED PLASMA PROCE...
- Publication number 20200090908
- Publication date Mar 19, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Kui Zhao
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
LIFT PIN ASSEMBLY, AN ELECTROSTATIC CHUCK AND A PROCESSING APPARATU...
- Publication number 20200083087
- Publication date Mar 12, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS
- Publication number 20190338408
- Publication date Nov 7, 2019
- Advanced Micro-Fabrication Equipment Inc. China
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS APPARATUS WITH LOW PARTICLE CONTAMINATION AND METHOD...
- Publication number 20190194802
- Publication date Jun 27, 2019
- Advanced Micro-Fabrication Equipment Inc, China
- Tuqiang NI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNIFORM PUMPING DUAL-STATION VACUUM PROCESSOR
- Publication number 20190139745
- Publication date May 9, 2019
- Advanced Micro-Fabrication Equipment Inc, China
- Yuejun GONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR HAVING A FUNCTION OF TUNING LOW FREQUENCY RF POWER D...
- Publication number 20190006155
- Publication date Jan 3, 2019
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE FOR ICP ETCHER
- Publication number 20170186585
- Publication date Jun 29, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Rason Zuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE...
- Publication number 20170186592
- Publication date Jun 29, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER, COMBINATION OF PROCESSING CHAMBER AND LOADLOCK,...
- Publication number 20160351429
- Publication date Dec 1, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Heng Tao
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20160322205
- Publication date Nov 3, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF CHANGING GAS FLOW PATTERN AND A WAFER PROCESSING METHOD A...
- Publication number 20160172204
- Publication date Jun 16, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- TuQiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PERFORMANCE ENHANCEMENT OF COATING PACKAGED ESC FOR SEMICONDUCTOR A...
- Publication number 20140118880
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS
- Publication number 20140116338
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20140120731
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Songlin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING PACKAGED SHOWERHEAD PERFORMANCE ENHANCEMENT FOR SEMICONDUCT...
- Publication number 20140117120
- Publication date May 1, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Xiaoming HE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Multi-zone temperature control plasma reactor

Plasma reactor having a variable coupling of low frequency RF power...

Radio frequency power supply system, plasma processor, and frequenc...

Liner assembly for vacuum treatment apparatus, and vacuum treatment...

Capacitively coupled plasma etching apparatus

Lift pin assembly, an electrostatic chuck and a processing apparatu...

Plasma processor and processing method

Capacitively coupled plasma etching apparatus

Uniform pumping dual-station vacuum processor

Capacitively coupled plasma etching apparatus

Plasma process apparatus with low particle contamination and method...

Plasma reactor and heating apparatus therefor

Corrosion-resistant structure for a gas delivery system in a plasma...

Gas showerhead, manufacturing method, and plasma apparatus includin...

Plasma reactor for ultra-high aspect ratio etching and etching meth...

Switchable matching network and an inductively coupled plasma proce...

Processing chamber, combination of processing chamber and loadlock,...

Device of changing gas flow pattern and a wafer processing method a...

Performance enhancement of coating packaged ESC for semiconductor a...

ICP source design for plasma uniformity and efficiency enhancement

Plasma processing method and plasma processing device

Multi-station decoupled reactive ion etch chamber

Multi-station decoupled reactive ion etch chamber

Multi-station plasma reactor with multiple plasma regions

Capacitive CVD reactor and methods for plasma CVD process

System and method of sensing and removing residual charge from a pr...

Multiple frequency plasma chamber, switchable RF system, and proces...

Patents Applicationslast 30 patents

PLASMA TREATMENT APPARATUS, LOWER ELECTRODE ASSEMBLY AND FORMING ME...

CONTROL METHOD FOR MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL IN...

ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...

PLASMA PROCESSOR AND PROCESSING METHOD

RADIO FREQUENCY POWER SUPPLY SYSTEM, PLASMA PROCESSOR, AND FREQUENC...

LINER ASSEMBLY FOR VACUUM TREATMENT APPARATUS, AND VACUUM TREATMENT...

CORROSION-RESISTANT STRUCTURE FOR A GAS DELIVERY SYSTEM IN A PLASMA...

GAS SHOWERHEAD, MANUFACTURING METHOD, AND PLASMA APPARATUS INCLUDIN...

PLASMA REACTOR FOR ULTRA-HIGH ASPECT RATIO ETCHING AND ETCHING METH...

Plasma Reactor and Heating Apparatus Therefor

Temperature Control Apparatus for Semiconductor Processing Equipmen...

Capacitively Coupled Plasma Etching Apparatus

Capacitively Coupled Plasma Etching Apparatus

Capacitively Coupled Plasma Etching Apparatus

MULTI-ZONE TEMPERATURE CONTROL PLASMA REACTOR

SWITCHABLE MATCHING NETWORK AND AN INDUCTIVELY COUPLED PLASMA PROCE...

LIFT PIN ASSEMBLY, AN ELECTROSTATIC CHUCK AND A PROCESSING APPARATU...

COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS

PLASMA PROCESS APPARATUS WITH LOW PARTICLE CONTAMINATION AND METHOD...

UNIFORM PUMPING DUAL-STATION VACUUM PROCESSOR

PLASMA REACTOR HAVING A FUNCTION OF TUNING LOW FREQUENCY RF POWER D...

ELECTRODE STRUCTURE FOR ICP ETCHER

MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE...

PROCESSING CHAMBER, COMBINATION OF PROCESSING CHAMBER AND LOADLOCK,...

ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT

DEVICE OF CHANGING GAS FLOW PATTERN AND A WAFER PROCESSING METHOD A...

PERFORMANCE ENHANCEMENT OF COATING PACKAGED ESC FOR SEMICONDUCTOR A...

COATING FOR PERFORMANCE ENHANCEMENT OF SEMICONDUCTOR APPARATUS

ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT

COATING PACKAGED SHOWERHEAD PERFORMANCE ENHANCEMENT FOR SEMICONDUCT...