Tuqiang NI

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma confinement apparatus, and method for confining a plasma
- Patent number 10,187,965
- Issue date Jan 22, 2019
- ADVANCED MICRO-FABRICATION EQUIPMENT, INC. CHINA
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for controlling plasma with an adjustable couplin...
- Patent number 9,190,302
- Issue date Nov 17, 2015
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ICP source design for plasma uniformity and efficiency enhancement
- Patent number 9,095,038
- Issue date Jul 28, 2015
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Shi Gang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for controlling plasma with an adjustable couplin...
- Patent number 8,518,211
- Issue date Aug 27, 2013
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus with control of plasma excit...
- Patent number 8,480,913
- Issue date Jul 9, 2013
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor having a chamber with electrodes and a coil...
- Patent number 8,114,246
- Issue date Feb 14, 2012
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection system for plasma processing
- Patent number 8,025,731
- Issue date Sep 27, 2011
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon carbide gas distribution plate and RF electrode for plasma...
- Patent number 7,992,518
- Issue date Aug 9, 2011
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Robert Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection system for plasma processing
- Patent number 7,785,417
- Issue date Aug 31, 2010
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor having a chamber with electrodes and a coil...
- Patent number 7,105,102
- Issue date Sep 12, 2006
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for detecting the endpoint of a photoresist stripping process
- Patent number 7,077,971
- Issue date Jul 18, 2006
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Small volume process chamber with hot inner surfaces
- Patent number 7,009,281
- Issue date Mar 7, 2006
- Lam Corporation
- Andrew D. Bailey, III
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor method
- Patent number 6,897,156
- Issue date May 24, 2005
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch endpoint detection
- Patent number 6,855,567
- Issue date Feb 15, 2005
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of dielectric layer with etch profile control
- Patent number 6,746,961
- Issue date Jun 8, 2004
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor having a chamber with electrodes and a coil...
- Patent number 6,716,303
- Issue date Apr 6, 2004
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Moveable barrier for multiple etch processes
- Patent number 6,709,547
- Issue date Mar 23, 2004
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma downstream strip module
- Patent number 6,692,649
- Issue date Feb 17, 2004
- Lam Research Corporation
- Wenli Z. Collison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated electronic hardware for wafer processing control and dia...
- Patent number 6,622,286
- Issue date Sep 16, 2003
- Lam Research Corporation
- Tuan Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching organic antireflective coating
- Patent number 6,617,257
- Issue date Sep 9, 2003
- Lam Research Corporation
- Tuqiang Ni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Vacuum plasma processor apparatus and method
- Patent number 6,531,029
- Issue date Mar 11, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable plasma volume etch chamber
- Patent number 6,527,911
- Issue date Mar 4, 2003
- Lam Research Corporation
- Bi-Ming Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated full wavelength spectrometer for wafer processing
- Patent number 6,526,355
- Issue date Feb 25, 2003
- Lam Research Corporation
- Tuqiang Ni
- G01 - MEASURING TESTING
Information Patent Grant
Method for improving uniformity and reducing etch rate variation of...
- Patent number 6,514,378
- Issue date Feb 4, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for detecting an exposure of a material on a semi...
- Patent number 6,503,766
- Issue date Jan 7, 2003
- LAM Research Corp.
- Tuqiang Ni
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for side wall passivation for organic etch
- Patent number 6,465,159
- Issue date Oct 15, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature tungsten etching process
- Patent number 6,461,974
- Issue date Oct 8, 2002
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for detecting the endpoint of a photoresist stripping pro...
- Patent number 6,451,158
- Issue date Sep 17, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of an apparatus for obtaining neutral dissociated gas atoms
- Patent number 6,388,383
- Issue date May 14, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elevated stationary uniformity ring design
- Patent number 6,257,168
- Issue date Jul 10, 2001
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
System and Method for Controlling Plasma With an Adjustable Couplin...
- Publication number 20130306240
- Publication date Nov 21, 2013
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT
- Publication number 20130102155
- Publication date Apr 25, 2013
- Shi GANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
- Publication number 20130048216
- Publication date Feb 28, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS WITH CONTROL OF PLASMA EXCIT...
- Publication number 20110253673
- Publication date Oct 20, 2011
- LAM RESEARCH CORPORATION
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas injection system for plasma processing
- Publication number 20100327085
- Publication date Dec 30, 2010
- Lam Research Corporation,
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Carbide Gas Distribution Plate and RF Electrode for Plasma...
- Publication number 20080202688
- Publication date Aug 28, 2008
- Robert Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PLASMA PROCESSOR HAVING A CHAMBER WITH ELECTRODES AND A COIL...
- Publication number 20070044915
- Publication date Mar 1, 2007
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Window protector for sputter etching of metal layers
- Publication number 20060137821
- Publication date Jun 29, 2006
- LAM RESEARCH COPORATION
- Arthur M. Howald
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for controlling plasma with an adjustable couplin...
- Publication number 20060112878
- Publication date Jun 1, 2006
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Small volume process chamber with hot inner surfaces
- Publication number 20060105575
- Publication date May 18, 2006
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Small volume process chamber with hot inner surfaces
- Publication number 20050070105
- Publication date Mar 31, 2005
- LAM RESEARCH CORPORATION
- Andrew D. Bailey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum plasma processor having a chamber with electrodes and a coil...
- Publication number 20040154747
- Publication date Aug 12, 2004
- Lam Research Corporation
- Tuqiang Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively coupled plasma downstream strip module
- Publication number 20040149223
- Publication date Aug 5, 2004
- Lam Research Corporation
- Wenli Z. Collison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Moveable barrier for multiple etch processes
- Publication number 20040144493
- Publication date Jul 29, 2004
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for controlling plasma with an adjustable couplin...
- Publication number 20040118344
- Publication date Jun 24, 2004
- LAM RESEARCH CORPORATION
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum plasma processor apparatus and method
- Publication number 20030106645
- Publication date Jun 12, 2003
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching of dielectric layer with etch profile control
- Publication number 20030045114
- Publication date Mar 6, 2003
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching organic antireflective coating
- Publication number 20020182881
- Publication date Dec 5, 2002
- Tuqiang Ni
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Methods for detecting the endpoint of a photoresist stripping process
- Publication number 20020148811
- Publication date Oct 17, 2002
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus with control of plasma excit...
- Publication number 20020139477
- Publication date Oct 3, 2002
- Lam Research Corporation
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively coupled plasma downstream strip module
- Publication number 20010023741
- Publication date Sep 27, 2001
- Wenli Z. Collison
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas injection system for plasma processing
- Publication number 20010010257
- Publication date Aug 2, 2001
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma confinement apparatus, and method for confining a plasma

System and method for controlling plasma with an adjustable couplin...

ICP source design for plasma uniformity and efficiency enhancement

System and method for controlling plasma with an adjustable couplin...

Plasma processing method and apparatus with control of plasma excit...

Vacuum plasma processor having a chamber with electrodes and a coil...

Gas injection system for plasma processing

Silicon carbide gas distribution plate and RF electrode for plasma...

Gas injection system for plasma processing

Vacuum plasma processor having a chamber with electrodes and a coil...

Methods for detecting the endpoint of a photoresist stripping process

Small volume process chamber with hot inner surfaces

Vacuum plasma processor method

Etch endpoint detection

Plasma etching of dielectric layer with etch profile control

Vacuum plasma processor having a chamber with electrodes and a coil...

Moveable barrier for multiple etch processes

Inductively coupled plasma downstream strip module

Integrated electronic hardware for wafer processing control and dia...

Method of plasma etching organic antireflective coating

Vacuum plasma processor apparatus and method

Configurable plasma volume etch chamber

Integrated full wavelength spectrometer for wafer processing

Method for improving uniformity and reducing etch rate variation of...

Method and system for detecting an exposure of a material on a semi...

Method and apparatus for side wall passivation for organic etch

High temperature tungsten etching process

Apparatus for detecting the endpoint of a photoresist stripping pro...

Method of an apparatus for obtaining neutral dissociated gas atoms

Elevated stationary uniformity ring design

Patents Applicationslast 30 patents

System and Method for Controlling Plasma With an Adjustable Couplin...

ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT

CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS

PLASMA PROCESSING METHOD AND APPARATUS WITH CONTROL OF PLASMA EXCIT...

Gas injection system for plasma processing

Silicon Carbide Gas Distribution Plate and RF Electrode for Plasma...

VACUUM PLASMA PROCESSOR HAVING A CHAMBER WITH ELECTRODES AND A COIL...

Window protector for sputter etching of metal layers

System and method for controlling plasma with an adjustable couplin...

Small volume process chamber with hot inner surfaces

Small volume process chamber with hot inner surfaces

Vacuum plasma processor having a chamber with electrodes and a coil...

Inductively coupled plasma downstream strip module

Moveable barrier for multiple etch processes

System and method for controlling plasma with an adjustable couplin...

Vacuum plasma processor apparatus and method

Plasma etching of dielectric layer with etch profile control

Method of plasma etching organic antireflective coating

Methods for detecting the endpoint of a photoresist stripping process

Plasma processing method and apparatus with control of plasma excit...

Inductively coupled plasma downstream strip module

Gas injection system for plasma processing