Tyler Rockwell

Person

Wakefield, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compact low angle ion beam extraction assembly and processing appar...
- Patent number 12,191,117
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate halo arrangement for improved process uniformity
- Patent number 12,106,943
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and system having extraction assembly for wide angle ion...
- Patent number 11,056,319
- Issue date Jul 6, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low particle capacitively coupled components for workpiece processing
- Patent number 10,276,340
- Issue date Apr 30, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency extraction system for charge neutralized ion beam
- Patent number 10,224,181
- Issue date Mar 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for anisotropic substrate etching
- Patent number 10,193,066
- Issue date Jan 29, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection system for ion beam device
- Patent number 9,865,433
- Issue date Jan 9, 2018
- Varian Semiconductor Equipment Associats, Inc.
- Jay Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of ion angular distribution of ion beams with hidden deflec...
- Patent number 9,514,912
- Issue date Dec 6, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for plasma control using boundary electrode
- Patent number 8,907,300
- Issue date Dec 9, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam measurement system and method
- Patent number 8,698,108
- Issue date Apr 15, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Joseph P. Dzengeleski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for optical ion beam metrology
- Patent number 7,723,697
- Issue date May 25, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for shaping a ribbon-shaped ion beam
- Patent number 7,675,047
- Issue date Mar 9, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
- Publication number 20240194438
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FASTENING ASSEMBLY FOR BEAM BLOCKER IN ION PROCESSING APPARATUS
- Publication number 20230197422
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kevin T. Ryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...
- Publication number 20230124509
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20220384156
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND SYSTEM HAVING EXTRACTION ASSEMBLY FOR WIDE ANGLE ION...
- Publication number 20210035779
- Publication date Feb 4, 2021
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20190272983
- Publication date Sep 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Jay Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR ANISOTROPIC SUBSTRATE ETCHING
- Publication number 20190006587
- Publication date Jan 3, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY EXTRACTION SYSTEM FOR CHARGE NEUTRALIZED ION BEAM
- Publication number 20170309453
- Publication date Oct 26, 2017
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF ION ANGULAR DISTRIBUTION OF ION BEAMS WITH HIDDEN DEFLEC...
- Publication number 20160071693
- Publication date Mar 10, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR PLASMA CONTROL USING BOUNDARY ELECTRODE
- Publication number 20140265853
- Publication date Sep 18, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR OPTICAL ION BEAM METROLOGY
- Publication number 20090078883
- Publication date Mar 26, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for Shaping a Ribbon-Shaped Ion Beam
- Publication number 20070108390
- Publication date May 17, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS

Tyler Rockwell

Person

Patents Grantslast 30 patents

Compact low angle ion beam extraction assembly and processing appar...

Substrate halo arrangement for improved process uniformity

Apparatus and system having extraction assembly for wide angle ion...

Low particle capacitively coupled components for workpiece processing

Radio frequency extraction system for charge neutralized ion beam

Apparatus and techniques for anisotropic substrate etching

Gas injection system for ion beam device

Control of ion angular distribution of ion beams with hidden deflec...

System and method for plasma control using boundary electrode

Ion beam measurement system and method

Techniques for optical ion beam metrology

Technique for shaping a ribbon-shaped ion beam

Patents Applicationslast 30 patents

ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION

FASTENING ASSEMBLY FOR BEAM BLOCKER IN ION PROCESSING APPARATUS

COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

APPARATUS AND SYSTEM HAVING EXTRACTION ASSEMBLY FOR WIDE ANGLE ION...

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

APPARATUS AND TECHNIQUES FOR ANISOTROPIC SUBSTRATE ETCHING

RADIO FREQUENCY EXTRACTION SYSTEM FOR CHARGE NEUTRALIZED ION BEAM

CONTROL OF ION ANGULAR DISTRIBUTION OF ION BEAMS WITH HIDDEN DEFLEC...

SYSTEM AND METHOD FOR PLASMA CONTROL USING BOUNDARY ELECTRODE

TECHNIQUES FOR OPTICAL ION BEAM METROLOGY

Technique for Shaping a Ribbon-Shaped Ion Beam