Tzo-Hung Luo

Person

Taichung City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposition based process for contact barrier layer
- Patent number 10,679,859
- Issue date Jun 9, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition based process for contact barrier layer
- Patent number 10,170,322
- Issue date Jan 1, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanisms for forming image sensor with lateral doping gradient
- Patent number 9,748,290
- Issue date Aug 29, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh-Chuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of sensing integrated circuit
- Patent number 9,653,497
- Issue date May 16, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzo-Hung Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light sensing integrated circuit and manufacturing method of sensin...
- Patent number 9,171,873
- Issue date Oct 27, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzo-Hung Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment at film layer to reduce sheet resistance and to im...
- Patent number 7,378,744
- Issue date May 27, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jian-Shin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment at film layer to reduce sheet resistance and to im...
- Patent number 7,358,612
- Issue date Apr 15, 2008
- Taiwan Semiconductor Manufacturing Company
- Jian-Shin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment at film layer to reduce sheet resistance and to im...
- Patent number 7,067,409
- Issue date Jun 27, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jian Shin Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Atomic Layer Deposition Based Process for Contact Barrier Layer
- Publication number 20190148153
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SENSING INTEGRATED CIRCUIT
- Publication number 20150380446
- Publication date Dec 31, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzo-Hung Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MECHANISMS FOR FORMING IMAGE SENSOR WITH LATERAL DOPING GRADIENT
- Publication number 20150221689
- Publication date Aug 6, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Yueh-Chuan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Light Sensing Integrated Circuit and Manufacturing Method of Sensin...
- Publication number 20150200215
- Publication date Jul 16, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzo-Hung Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment at Film Layer to Reduce Sheet Resistance and to Im...
- Publication number 20070010080
- Publication date Jan 11, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jian-Shin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment at Film Layer to Reduce Sheet Resistance and to Im...
- Publication number 20060216916
- Publication date Sep 28, 2006
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jian-Shin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment at film layer to reduce sheet resistance and to im...
- Publication number 20050250320
- Publication date Nov 10, 2005
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Jian Shin Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Tzo-Hung Luo

Person

Patents Grantslast 30 patents

Atomic layer deposition based process for contact barrier layer

Atomic layer deposition based process for contact barrier layer

Mechanisms for forming image sensor with lateral doping gradient

Manufacturing method of sensing integrated circuit

Light sensing integrated circuit and manufacturing method of sensin...

Plasma treatment at film layer to reduce sheet resistance and to im...

Plasma treatment at film layer to reduce sheet resistance and to im...

Plasma treatment at film layer to reduce sheet resistance and to im...

Patents Applicationslast 30 patents

Atomic Layer Deposition Based Process for Contact Barrier Layer

MANUFACTURING METHOD OF SENSING INTEGRATED CIRCUIT

MECHANISMS FOR FORMING IMAGE SENSOR WITH LATERAL DOPING GRADIENT

Light Sensing Integrated Circuit and Manufacturing Method of Sensin...

Plasma Treatment at Film Layer to Reduce Sheet Resistance and to Im...

Plasma Treatment at Film Layer to Reduce Sheet Resistance and to Im...

Plasma treatment at film layer to reduce sheet resistance and to im...