Ulrich Hofmann

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Muenchen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Process dose and process bias determination for beam lithography
- Patent number 10,401,737
- Issue date Sep 3, 2019
- GenISys GmbH
- Ulrich Hofmann
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DEFECT DETECTION IN A SEMICONDUCTOR SAMPLE IN SAMPLE IMA...
- Publication number 20240242334
- Publication date Jul 18, 2024
- Carl Zeiss MultiSEM GmbH
- Thomas Korb
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS DOSE AND PROCESS BIAS DETERMINATION FOR BEAM LITHOGRAPHY
- Publication number 20180173108
- Publication date Jun 21, 2018
- GenISys GmbH
- Ulrich Hofmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY