Ulrich Loering

Person

Schwaebisch Gmuend, DE

People

Patents Grantslast 30 patents

Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Microlithographic projection exposure apparatus and measuring devic...
- Patent number 10,345,710
- Issue date Jul 9, 2019
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of operating a projection exposure tool for microlithography
- Patent number 10,241,423
- Issue date Mar 26, 2019
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 9,964,859
- Issue date May 8, 2018
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface correction of mirrors with decoupling coating
- Patent number 9,921,483
- Issue date Mar 20, 2018
- Carl Zeiss SMT GmbH
- Oliver Dier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical arrangement, EUV lithography apparatus and method for confi...
- Patent number 9,671,703
- Issue date Jun 6, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a projection exposure tool for microlithography
- Patent number 9,442,381
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 9,436,095
- Issue date Sep 6, 2016
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 9,316,922
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imaging optics
- Patent number 9,201,226
- Issue date Dec 1, 2015
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G02 - OPTICS
Information Patent Grant
Optical system of microlithographic projection exposure apparatus a...
- Patent number 9,081,310
- Issue date Jul 14, 2015
- Carl Zeiss SMT GmbH
- Matthias Exler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 8,879,159
- Issue date Nov 4, 2014
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,542,346
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Projection objective with diaphragms
- Patent number 8,488,104
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,339,576
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G02 - OPTICS
Information Patent Grant
Exposure apparatus and measuring device for a projection lens
- Patent number 8,330,935
- Issue date Dec 11, 2012
- Carl Zeiss SMT GmbH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for microlithography, projection exposure appa...
- Patent number 8,228,483
- Issue date Jul 24, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 8,054,557
- Issue date Nov 8, 2011
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetrical objective having four lens groups for microlithography
- Patent number 7,697,211
- Issue date Apr 13, 2010
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 7,692,868
- Issue date Apr 6, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 7,570,343
- Issue date Aug 4, 2009
- Carl Zeis SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography projection objective, and a method for correcting image...
- Patent number 7,463,423
- Issue date Dec 9, 2008
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for immersion lithography
- Patent number 7,460,206
- Issue date Dec 2, 2008
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PRODUCTION METHOD AND MEASUREMENT METHOD
- Publication number 20230243644
- Publication date Aug 3, 2023
- Carl Zeiss SMT GMBH
- Hans Michael STIEPAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH A THERMAL MANIPULATOR
- Publication number 20220373899
- Publication date Nov 24, 2022
- Carl Zeiss SMT GMBH
- Stephanus Fengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20220107567
- Publication date Apr 7, 2022
- Carl Zeiss SMT GMBH
- Benjahman Julius Modeste
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20190072861
- Publication date Mar 7, 2019
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20170082930
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20160370709
- Publication date Dec 22, 2016
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY
- Publication number 20160342097
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING
- Publication number 20160209750
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Oliver DIER
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20140327891
- Publication date Nov 6, 2014
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT, EUV LITHOGRAPHY APPARATUS AND METHOD FOR CONFI...
- Publication number 20140300876
- Publication date Oct 9, 2014
- Norman Baer
- G02 - OPTICS
Information Patent Application
METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY
- Publication number 20130301024
- Publication date Nov 14, 2013
- Olaf Conradi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20130278911
- Publication date Oct 24, 2013
- Guido Limbach
- G02 - OPTICS
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20130120723
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS A...
- Publication number 20130016331
- Publication date Jan 17, 2013
- Carl Zeiss SMT GMBH
- Matthias Exler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20120281196
- Publication date Nov 8, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS
Information Patent Application
IMAGING OPTICS
- Publication number 20120208115
- Publication date Aug 16, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20120019800
- Publication date Jan 26, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE WITH DIAPHRAGMS
- Publication number 20110285979
- Publication date Nov 24, 2011
- Carl Zeiss SMT GMBH
- Nils Dieckmann
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...
- Publication number 20100195070
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20100157435
- Publication date Jun 24, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
- Publication number 20100141912
- Publication date Jun 10, 2010
- Carl Zeiss SMT AG
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20090244509
- Publication date Oct 1, 2009
- Carl Zeiss SMT AG
- Guido Limbach
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...
- Publication number 20090103184
- Publication date Apr 23, 2009
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY
- Publication number 20090080086
- Publication date Mar 26, 2009
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...
- Publication number 20080309894
- Publication date Dec 18, 2008
- Carl Zeiss SMT AG
- Albrecht Ehrmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ulrich Loering

Person

Patents Grantslast 30 patents

EUV exposure apparatus with reflective elements having reduced infl...

Microlithographic projection exposure apparatus and measuring devic...

EUV exposure apparatus with reflective elements having reduced infl...

Method of operating a projection exposure tool for microlithography

EUV exposure apparatus with reflective elements having reduced infl...

Lithography projection objective, and a method for correcting image...

Surface correction of mirrors with decoupling coating

EUV exposure apparatus with reflective elements having reduced infl...

Optical arrangement, EUV lithography apparatus and method for confi...

Method of operating a projection exposure tool for microlithography

Exposure apparatus and measuring device for a projection lens

Lithography projection objective, and a method for correcting image...

EUV exposure apparatus with reflective elements having reduced infl...

Imaging optics

Optical system of microlithographic projection exposure apparatus a...

Lithography projection objective, and a method for correcting image...

Optical system with an exchangeable, manipulable correction arrange...

Projection objective with diaphragms

Projection objective of a microlithographic projection exposure app...

Exposure apparatus and measuring device for a projection lens

Projection objective for microlithography, projection exposure appa...

Lithography projection objective, and a method for correcting image...

Symmetrical objective having four lens groups for microlithography

Lithography projection objective, and a method for correcting image...

Microlithographic projection exposure apparatus

Lithography projection objective, and a method for correcting image...

Projection objective for immersion lithography

Patents Applicationslast 30 patents

PRODUCTION METHOD AND MEASUREMENT METHOD

PROJECTION EXPOSURE APPARATUS WITH A THERMAL MANIPULATOR

STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

OPTICAL ARRANGEMENT, EUV LITHOGRAPHY APPARATUS AND METHOD FOR CONFI...

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

EUV Exposure Apparatus

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

OPTICAL SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS A...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

IMAGING OPTICS

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

PROJECTION OBJECTIVE WITH DIAPHRAGMS

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE...

SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVIC...