Ulrich MUELLER

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for generating a mathematical model for positioning individu...
- Patent number 12,164,102
- Issue date Dec 10, 2024
- Carl Zeiss SMT GmbH
- Norman Kretzschmar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for replacing a mirror in a projection exposure apparatus, a...
- Patent number 11,500,294
- Issue date Nov 15, 2022
- Carl Zeiss SMT GmbH
- Christoph Petri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining properties of an EUV source
- Patent number 11,187,989
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Timo Laufer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an illumination system for an EUV projection e...
- Patent number 11,048,172
- Issue date Jun 29, 2021
- Carl Zeiss SMT GmbH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intensity adaptation filter for EUV microlithography, method for pr...
- Patent number 10,809,625
- Issue date Oct 20, 2020
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for producing an illumination system for an EUV projection e...
- Patent number 10,514,608
- Issue date Dec 24, 2019
- Carl Zeiss SMT GmbH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical membrane element having a longitudinally adjustable connect...
- Patent number 10,254,655
- Issue date Apr 9, 2019
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system and projection objective of a mask inspection a...
- Patent number 10,114,293
- Issue date Oct 30, 2018
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 10,042,271
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography and method of monit...
- Patent number 9,720,328
- Issue date Aug 1, 2017
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,696,639
- Issue date Jul 4, 2017
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography and method of monit...
- Patent number 9,235,142
- Issue date Jan 12, 2016
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical membrane element having a longitudinally adjustable connect...
- Patent number 9,075,321
- Issue date Jul 7, 2015
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system for microlithography with a measurement...
- Patent number 9,001,304
- Issue date Apr 7, 2015
- Carl Zeiss SMT GmbH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam regulating apparatus for an EUV illumination beam
- Patent number 8,853,642
- Issue date Oct 7, 2014
- Carl Zeiss SMT GmbH
- Ralf Arnold
- G02 - OPTICS
Information Patent Grant
Method for arranging an optical module in a measuring apparatus and...
- Patent number 8,400,618
- Issue date Mar 19, 2013
- Carl Zeiss SMT GmbH
- Martin Rath
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR GENERATING A MATHEMATICAL MODEL FOR POSITIONING INDIVIDU...
- Publication number 20220066196
- Publication date Mar 3, 2022
- Carl Zeiss SMT GMBH
- Norman KRETZSCHMAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REPLACING A MIRROR IN A PROJECTION EXPOSURE APPARATUS, A...
- Publication number 20210294222
- Publication date Sep 23, 2021
- Carl Zeiss SMT GMBH
- Christoph PETRI
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETERMINING PROPERTIES OF AN EUV SOURCE
- Publication number 20200218159
- Publication date Jul 9, 2020
- Carl Zeiss SMT GMBH
- Timo Laufer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...
- Publication number 20200110340
- Publication date Apr 9, 2020
- Carl Zeiss SMT GMBH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTENSITY ADAPTATION FILTER FOR EUV MICROLITHOGRAPHY, METHOD FOR PR...
- Publication number 20190285989
- Publication date Sep 19, 2019
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20190129318
- Publication date May 2, 2019
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...
- Publication number 20180373158
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONIT...
- Publication number 20180039184
- Publication date Feb 8, 2018
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20180024445
- Publication date Jan 25, 2018
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONIT...
- Publication number 20160266501
- Publication date Sep 15, 2016
- Carl Zeiss SMT GMBH
- Matthias MANGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHO...
- Publication number 20160207078
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Moritz BECKER
- B08 - CLEANING
Information Patent Application
OPTICAL MEMBRANE ELEMENT HAVING A LONGITUDINALLY ADJUSTABLE CONNECT...
- Publication number 20150277230
- Publication date Oct 1, 2015
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20150212431
- Publication date Jul 30, 2015
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAM REGULATING APPARATUS FOR AN EUV ILLUMINATION BEAM
- Publication number 20130248728
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Ralf Arnold
- G02 - OPTICS
Information Patent Application
SUBSTRATE HOLDER
- Publication number 20130083308
- Publication date Apr 4, 2013
- Carl Zeiss SMT GMBH
- Ulrich Mueller
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...
- Publication number 20130038850
- Publication date Feb 14, 2013
- CARL ZEISS SMT GMBH
- Heiko Feldmann
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONIT...
- Publication number 20110157571
- Publication date Jun 30, 2011
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...
- Publication number 20110013171
- Publication date Jan 20, 2011
- Carl Zeiss SMT AG
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ARRANGING AN OPTICAL MODULE IN A MEASURING APPARATUS AND...
- Publication number 20100208230
- Publication date Aug 19, 2010
- Carl Zeiss SMT AG
- Martin Rath
- G02 - OPTICS
Information Patent Application
OPTICAL MEMBRANE ELEMENT
- Publication number 20100195076
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Ulrich Mueller
- G02 - OPTICS
Information Patent Application
DETECTOR FOR REGISTERING A LIGHT INTENSITY, AND ILLUMINATION SYSTE...
- Publication number 20090015814
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Ulrich Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A RADIATION DE...
- Publication number 20080128643
- Publication date Jun 5, 2008
- Carl Zeiss SMT AG
- Ulrich Mueller
- B82 - NANO-TECHNOLOGY

Ulrich MUELLER

Person

Patents Grantslast 30 patents

Method for generating a mathematical model for positioning individu...

Method for replacing a mirror in a projection exposure apparatus, a...

Method for determining properties of an EUV source

Method for producing an illumination system for an EUV projection e...

Intensity adaptation filter for EUV microlithography, method for pr...

Method for producing an illumination system for an EUV projection e...

Optical membrane element having a longitudinally adjustable connect...

Illumination system and projection objective of a mask inspection a...

Projection exposure system for microlithography with a measurement...

Projection exposure system for microlithography and method of monit...

Projection exposure system for microlithography with a measurement...

Projection exposure system for microlithography and method of monit...

Optical membrane element having a longitudinally adjustable connect...

Projection exposure system for microlithography with a measurement...

Beam regulating apparatus for an EUV illumination beam

Method for arranging an optical module in a measuring apparatus and...

Patents Applicationslast 30 patents

METHOD FOR GENERATING A MATHEMATICAL MODEL FOR POSITIONING INDIVIDU...

METHOD FOR REPLACING A MIRROR IN A PROJECTION EXPOSURE APPARATUS, A...

METHOD FOR DETERMINING PROPERTIES OF AN EUV SOURCE

METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...

INTENSITY ADAPTATION FILTER FOR EUV MICROLITHOGRAPHY, METHOD FOR PR...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONIT...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONIT...

OPTICAL ARRANGEMENT, IN PARTICULAR PLASMA LIGHT SOURCE OR EUV LITHO...

OPTICAL MEMBRANE ELEMENT HAVING A LONGITUDINALLY ADJUSTABLE CONNECT...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

BEAM REGULATING APPARATUS FOR AN EUV ILLUMINATION BEAM

SUBSTRATE HOLDER

ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION A...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY AND METHOD OF MONIT...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT...

METHOD FOR ARRANGING AN OPTICAL MODULE IN A MEASURING APPARATUS AND...

OPTICAL MEMBRANE ELEMENT

DETECTOR FOR REGISTERING A LIGHT INTENSITY, AND ILLUMINATION SYSTE...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A RADIATION DE...