Ulrich Stroessner

Person

Jena, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microscope for reticle inspection with variable illumination settings
- Patent number 9,116,447
- Issue date Aug 25, 2015
- Carl Zeiss SMS GmbH
- Ulrich Stroessner
- G02 - OPTICS
Information Patent Grant
Method and apparatus for measuring structures on photolithography m...
- Patent number 8,736,849
- Issue date May 27, 2014
- Carl Zeiss SMS GmbH
- Ulrich Stroessner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for analyzing masks for photolithography
- Patent number 8,718,354
- Issue date May 6, 2014
- Carl Zeiss SMS GmbH
- Ulrich Stroessner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining intensity distribution in the image plane of...
- Patent number 7,961,297
- Issue date Jun 14, 2011
- Carl Zeiss SMS GmbH
- Joern Greif-Wuestenbecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for analysing the imaging behavior of an optical...
- Patent number 7,626,689
- Issue date Dec 1, 2009
- Carl Zeiss SMS GmbH
- Ulrich Stroessner
- G01 - MEASURING TESTING
Information Patent Grant
Imaging system for emulation of a high aperture scanning system
- Patent number 7,535,640
- Issue date May 19, 2009
- Carl Zeiss SMS GmbH
- Michael Totzeck
- G02 - OPTICS
Information Patent Grant
Microscope imaging system and method for emulating a high aperture...
- Patent number 7,286,284
- Issue date Oct 23, 2007
- Carl Zeiss SMS GmbH
- Michael Totzeck
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MASK INSPECTION MICROSCOPE WITH VARIABLE ILLUMINATION SETTING
- Publication number 20120162755
- Publication date Jun 28, 2012
- CARL ZEISS SMS GMBH
- Ulrich Stroessner
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR MEASURING STRUCTURES ON PHOTOLITHOGRAPHY M...
- Publication number 20110242544
- Publication date Oct 6, 2011
- CARL ZEISS SMS GMBH
- Ulrich Stroessner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ANALYZING MASKS FOR PHOTOLITHOGRAPHY
- Publication number 20110188732
- Publication date Aug 4, 2011
- CARL ZEISS SMS GMBH
- Ulrich Stroessner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROSCOPE FOR RETICLE INSPECTION WITH VARIABLE ILLUMINATION SETTINGS
- Publication number 20110164313
- Publication date Jul 7, 2011
- CARL ZEISS SMS GMBH
- Ulrich Stroessner
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR MEASURING THE POSITIONS OF MARKS ON A MASK
- Publication number 20100153059
- Publication date Jun 17, 2010
- Gerd Klose
- G01 - MEASURING TESTING
Information Patent Application
Method for Determining Intensity Distribution in the Image Plane of...
- Publication number 20080212060
- Publication date Sep 4, 2008
- CARL ZEISS SMS GMBH
- Joern Greif-Wuestenbecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarizer device for generating a defined spatial distribution of p...
- Publication number 20060028706
- Publication date Feb 9, 2006
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
Microscope imaging system and method for emulating a high aperture...
- Publication number 20060012873
- Publication date Jan 19, 2006
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
Imaging system for emulation of a high aperture scanning system
- Publication number 20060007541
- Publication date Jan 12, 2006
- Michael Totzeck
- G02 - OPTICS

Ulrich Stroessner

Person

Patents Grantslast 30 patents

Microscope for reticle inspection with variable illumination settings

Method and apparatus for measuring structures on photolithography m...

Method for analyzing masks for photolithography

Method for determining intensity distribution in the image plane of...

Method and device for analysing the imaging behavior of an optical...

Imaging system for emulation of a high aperture scanning system

Microscope imaging system and method for emulating a high aperture...

Patents Applicationslast 30 patents

MASK INSPECTION MICROSCOPE WITH VARIABLE ILLUMINATION SETTING

METHOD AND APPARATUS FOR MEASURING STRUCTURES ON PHOTOLITHOGRAPHY M...

METHOD FOR ANALYZING MASKS FOR PHOTOLITHOGRAPHY

MICROSCOPE FOR RETICLE INSPECTION WITH VARIABLE ILLUMINATION SETTINGS

APPARATUS AND METHOD FOR MEASURING THE POSITIONS OF MARKS ON A MASK

Method for Determining Intensity Distribution in the Image Plane of...

Polarizer device for generating a defined spatial distribution of p...

Microscope imaging system and method for emulating a high aperture...

Imaging system for emulation of a high aperture scanning system