Unryu Ogawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, gas nozzle and method of manufactur...
- Patent number 12,188,124
- Issue date Jan 7, 2025
- Kokusai Electric Corporation
- Yuji Takebayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,192,735
- Issue date Jan 29, 2019
- Kokusai Electric Corporation
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, exhaust system and method of manufa...
- Patent number 10,163,663
- Issue date Dec 25, 2018
- Kokusai Electric Corporation
- Toshihiko Yonejima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,754,780
- Issue date Sep 5, 2017
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,236,242
- Issue date Jan 12, 2016
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus having rotatable slot-type antenna a...
- Patent number 8,987,645
- Issue date Mar 24, 2015
- Hitachi Kokusai Electric Inc.
- Unryu Ogawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing apparatus and method of manufacturing a semico...
- Patent number 8,557,720
- Issue date Oct 15, 2013
- Hitachi Kokusai Electric, Inc.
- Tokunobu Akao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing a semico...
- Patent number 8,486,222
- Issue date Jul 16, 2013
- Hitachi Kokusai Electric Inc.
- Tokunobu Akao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,334,215
- Issue date Dec 18, 2012
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,066,894
- Issue date Nov 29, 2011
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Producing method of semiconductor device
- Patent number 7,795,156
- Issue date Sep 14, 2010
- Hitachi Kokusai Electric Inc.
- Tadashi Terasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device producing method and semiconductor device prod...
- Patent number 7,045,447
- Issue date May 16, 2006
- Hitachi Kokusai Electric Inc.
- Unryu Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,727,654
- Issue date Apr 27, 2004
- Hitachi Kokusai Electric Inc.
- Unryu Ogawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing system
- Patent number 6,376,796
- Issue date Apr 23, 2002
- Anelva Corporation
- Noriyoshi Sato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Substrate Processing Apparatus, Gas Nozzle and Method of Manufactur...
- Publication number 20200392625
- Publication date Dec 17, 2020
- Kokusai Electric Corporation
- Yuji TAKEBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, EXHAUST SYSTEM AND METHOD OF MANUFA...
- Publication number 20180144953
- Publication date May 24, 2018
- Hitachi Kokusai Electric Inc.
- Toshihiko YONEJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20170338106
- Publication date Nov 23, 2017
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160086797
- Publication date Mar 24, 2016
- Hitachi Kokusai Electric Inc.
- Tatsushi UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST GAS PROCESSING DEVICE, EXHAUST GAS PROCESSING SYSTEM, METHO...
- Publication number 20150089924
- Publication date Apr 2, 2015
- Hitachi Kokusai Electric Inc.
- Unryu Ogawa
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20130095669
- Publication date Apr 18, 2013
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20120129358
- Publication date May 24, 2012
- Hitachi Kokusai Electric Inc.
- Unryu OGAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICO...
- Publication number 20120108080
- Publication date May 3, 2012
- Hitachi Kokusai Electric Inc.
- Tokunobu AKAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICO...
- Publication number 20120108061
- Publication date May 3, 2012
- Hitachi Kokusai Electric, Inc.
- Tokunobu AKAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20090169768
- Publication date Jul 2, 2009
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING METH...
- Publication number 20090050056
- Publication date Feb 26, 2009
- Unryu OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20080206968
- Publication date Aug 28, 2008
- Hitachi Kokusai Electric Inc.
- Unryu Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20080138994
- Publication date Jun 12, 2008
- Hitachi Kokusai Electric Inc.
- Tatsushi Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Producing Method of Semiconductor Device
- Publication number 20080096395
- Publication date Apr 24, 2008
- Tadashi Terasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Producing Method of Semiconductor Device
- Publication number 20070298622
- Publication date Dec 27, 2007
- HITACHI KOKUSAI ELECTRIC INC,
- Tadashi Terasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing substrates
- Publication number 20070062646
- Publication date Mar 22, 2007
- Hitachi Kokusai Electric Inc.
- Unryu Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device producing method and semiconductor device prod...
- Publication number 20030224616
- Publication date Dec 4, 2003
- Unryu Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20020047536
- Publication date Apr 25, 2002
- Unryu Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing substrates
- Publication number 20020036066
- Publication date Mar 28, 2002
- Hitachi Kokusai Electric Inc.,
- Unryu Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system
- Publication number 20010026575
- Publication date Oct 4, 2001
- Noriyoshi Sato
- H01 - BASIC ELECTRIC ELEMENTS

Unryu Ogawa

Person

Patents Grantslast 30 patents

Substrate processing apparatus, gas nozzle and method of manufactur...

Substrate processing method and substrate processing apparatus

Substrate processing apparatus, exhaust system and method of manufa...

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Substrate processing apparatus having rotatable slot-type antenna a...

Substrate processing apparatus and method of manufacturing a semico...

Substrate processing apparatus and method of manufacturing a semico...

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Producing method of semiconductor device

Semiconductor device producing method and semiconductor device prod...

Plasma processing apparatus

Plasma processing system

Patents Applicationslast 30 patents

Substrate Processing Apparatus, Gas Nozzle and Method of Manufactur...

SUBSTRATE PROCESSING APPARATUS, EXHAUST SYSTEM AND METHOD OF MANUFA...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

EXHAUST GAS PROCESSING DEVICE, EXHAUST GAS PROCESSING SYSTEM, METHO...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICOND...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICO...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICO...

Substrate processing method and substrate processing apparatus

SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING METH...

Manufacturing method of semiconductor device

Substrate Processing Method and Substrate Processing Apparatus

Producing Method of Semiconductor Device

Producing Method of Semiconductor Device

Method and apparatus for processing substrates

Semiconductor device producing method and semiconductor device prod...

Plasma processing apparatus

Method and apparatus for processing substrates

Plasma processing system