Ute Buttgereit

Person

Zella-Mehlis, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Attenuating phase shift mask blank and photomask
- Patent number 7,029,803
- Issue date Apr 18, 2006
- Schott AG
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Mask blank and photomask having antireflective properties
- Publication number 20070128528
- Publication date Jun 7, 2007
- Gunter Hess
- B82 - NANO-TECHNOLOGY
Information Patent Application
Attenuated phase shift mask blank and photomask
- Publication number 20070076833
- Publication date Apr 5, 2007
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask blank having a protection layer
- Publication number 20050260504
- Publication date Nov 24, 2005
- Hans Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ultra high transmission phase shift mask blanks
- Publication number 20050190450
- Publication date Sep 1, 2005
- Hans Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Attenuating phase shift mask blank and photomask
- Publication number 20050053845
- Publication date Mar 10, 2005
- SCHOTT GLAS
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photo mask blank, photo mask, method and apparatus for manufacturin...
- Publication number 20040231971
- Publication date Nov 25, 2004
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photo mask blank, photo mask, method and apparatus for manufacturin...
- Publication number 20040159538
- Publication date Aug 19, 2004
- Hans Becker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Ute Buttgereit

Person

Patents Grantslast 30 patents

Attenuating phase shift mask blank and photomask

Patents Applicationslast 30 patents

Mask blank and photomask having antireflective properties

Attenuated phase shift mask blank and photomask

Mask blank having a protection layer

Ultra high transmission phase shift mask blanks

Attenuating phase shift mask blank and photomask

Photo mask blank, photo mask, method and apparatus for manufacturin...

Photo mask blank, photo mask, method and apparatus for manufacturin...