Uwe Dersch

Follow

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method and structure for process limiting yield testing
- Patent number 10,147,659
- Issue date Dec 4, 2018
- GLOBALFOUNDRIES Inc.
- Uwe Dersch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection of gate-to-source/drain shorts
- Patent number 10,048,311
- Issue date Aug 14, 2018
- GLOBALFOUNDRIES Inc.
- Hans-Peter Moll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure including a transistor including a gate ele...
- Patent number 9,786,657
- Issue date Oct 10, 2017
- GLOBALFOUNDRIES Inc.
- Uwe Dersch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuits with test structures including bi-directional p...
- Patent number 9,257,353
- Issue date Feb 9, 2016
- GLOBALFOUNDRIES, INC.
- Ricardo Pablo Mikalo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Test pattern and method of evaluating the transfer properties of a...
- Patent number 7,354,684
- Issue date Apr 8, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR STRUCTURE INCLUDING A TRANSISTOR INCLUDING A GATE ELE...
- Publication number 20170287901
- Publication date Oct 5, 2017
- GLOBALFOUNDRIES INC.
- Uwe Dersch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION OF GATE-TO-SOURCE/DRAIN SHORTS
- Publication number 20170067955
- Publication date Mar 9, 2017
- GLOBALFOUNDRIES INC.
- Hans-Peter Moll
- G01 - MEASURING TESTING
Information Patent Application
Mask Blank, Photomask and Method of Manufacturing a Photomask
- Publication number 20080318139
- Publication date Dec 25, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- B82 - NANO-TECHNOLOGY
Information Patent Application
Test pattern and method of evaluating the transfer properties of a...
- Publication number 20070207394
- Publication date Sep 6, 2007
- Advantage Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY