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Uwe Leucke
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Dresden, DE
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last 30 patents
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Patent Grant
Etch methods to form anisotropic features for high aspect ratio app...
Patent number
7,368,394
Issue date
May 6, 2008
Applied Materials, Inc.
Meihua Shen
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES
Publication number
20100099266
Publication date
Apr 22, 2010
Applied Materials, Inc.
Manfred Oswald
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCH METHODS TO FORM ANISOTROPIC FEATURES FOR HIGH ASPECT RATIO APP...
Publication number
20080057729
Publication date
Mar 6, 2008
Meihua Shen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Etch methods to form anisotropic features for high aspect ratio app...
Publication number
20070202700
Publication date
Aug 30, 2007
APPLIED MATERIALS, INC.
Uwe Leucke
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Application
Etch methods to form anisotropic features for high aspect ratio app...
Publication number
20070199922
Publication date
Aug 30, 2007
APPLIED MATERIALS, INC.
Meihua Shen
H01 - BASIC ELECTRIC ELEMENTS