Uwe Paul Schroeder

Person

Langebrueck, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Capacitors including amorphous dielectric layers and methods of for...
- Patent number 9,437,420
- Issue date Sep 6, 2016
- Samsung Electronics Co., Ltd.
- Kyu-Ho Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode of an integrated circuit
- Patent number 8,344,438
- Issue date Jan 1, 2013
- Qimonda AG
- Uwe Schroeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Zirconium oxide based capacitor and process to manufacture the same
- Patent number 7,723,771
- Issue date May 25, 2010
- Qimonda AG
- Tim Boescke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method for a transition-metal-containing dielectric
- Patent number 7,666,752
- Issue date Feb 23, 2010
- Qimonda AG
- Stephan Kudelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an electrical component
- Patent number 7,531,406
- Issue date May 12, 2009
- Infineon Technologies AG
- Alejandro Avellan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier layer and a method for suppressing diffusion processes duri...
- Patent number 7,157,371
- Issue date Jan 2, 2007
- Infineon Technologies AG
- Thomas Hecht
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Effective assist pattern for nested and isolated contacts
- Patent number 7,074,528
- Issue date Jul 11, 2006
- Infineon Technologies AG
- Jochen Schacht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for aerial image improvement in projection lit...
- Patent number 6,897,943
- Issue date May 24, 2005
- Infineon Technologies AG
- Uwe Paul Schroeder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch process for recessing polysilicon in trench structures
- Patent number 6,740,595
- Issue date May 25, 2004
- Infineon Technologies AG
- Stephan Kudelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistivity deep trench fill for DRAM and EDRAM applications
- Patent number 6,620,724
- Issue date Sep 16, 2003
- Infineon Technologies AG
- Uwe Schroeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process flow for thick isolation collar with reduced length
- Patent number 6,605,838
- Issue date Aug 12, 2003
- International Business Machines Corporation
- Jack A. Mandelman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resolution enhancement for alternating phase shift masks
- Patent number 6,605,396
- Issue date Aug 12, 2003
- Infineon Technologies, AG
- Uwe Paul Schroeder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing buried LOCOS collar in trench DRAMS
- Patent number 6,599,798
- Issue date Jul 29, 2003
- Infineon Technologies AG
- Helmut Tews
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
‘Via first’ dual damascene process for copper metal...
- Patent number 6,576,550
- Issue date Jun 10, 2003
- Infineon, AG
- Gabriela Brase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rough oxide hard mask for DT surface area enhancement for DT DRAM
- Patent number 6,559,002
- Issue date May 6, 2003
- Infineon Technologies North America Corp.
- Stephan Kudelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modified gate processing for optimized definition of array and logi...
- Patent number 6,548,357
- Issue date Apr 15, 2003
- International Business Machines Corporation
- Mary E. Weybright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative ion implant mask formation for self-aligned, sublithograph...
- Patent number 6,498,061
- Issue date Dec 24, 2002
- International Business Machines Corporation
- Rama Divakaruni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modified gate processing for optimized definition of array and logi...
- Patent number 6,403,423
- Issue date Jun 11, 2002
- International Business Machines Corporation
- Mary E. Weybright
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CAPACITORS INCLUDING AMORPHOUS DIELECTRIC LAYERS AND METHODS OF FOR...
- Publication number 20150357399
- Publication date Dec 10, 2015
- Samsung Electronics Co., Ltd.
- Kyu-Ho Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode of an Integrated Circuit
- Publication number 20090194410
- Publication date Aug 6, 2009
- Uwe Schroeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Zirconium oxide based capacitor and process to manufacture the same
- Publication number 20080237791
- Publication date Oct 2, 2008
- Tim Boescke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition method for transition-metal oxide based dielectric
- Publication number 20080182427
- Publication date Jul 31, 2008
- Lars Oberbeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition method for a transition-metal-containing dielectric
- Publication number 20080173919
- Publication date Jul 24, 2008
- Stephan Kudelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating an electrical component
- Publication number 20060234463
- Publication date Oct 19, 2006
- Alejandro Avellan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Storage capacitor, array of storage capacitors and memory cell array
- Publication number 20060202250
- Publication date Sep 14, 2006
- Thomas Hecht
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Effective assist pattern for nested and isolated contacts
- Publication number 20050136336
- Publication date Jun 23, 2005
- Jochen Schacht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of preparing buried LOCOS collar in trench DRAMS
- Publication number 20040115895
- Publication date Jun 17, 2004
- Helmut Tews
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and etching signal layer for processing semiconducto...
- Publication number 20040087045
- Publication date May 6, 2004
- Thomas Hecht
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrrier layer and a method for suppressing diffusion processes dur...
- Publication number 20040082166
- Publication date Apr 29, 2004
- Thomas Hecht
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch process for recessing polysilicon in trench structures
- Publication number 20030194867
- Publication date Oct 16, 2003
- Infineon Technologies North America Corp.
- Stephan Kudelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SURFACE ROUGHNESS ENHANCEMENT IN SEMICONDUCTOR CAPACITOR...
- Publication number 20030114005
- Publication date Jun 19, 2003
- International Business Machines Corporation
- Stephen Rahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a semiconductor component
- Publication number 20030114018
- Publication date Jun 19, 2003
- Martin Gutsche
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Resolution enhancement for alternating phase shift masks
- Publication number 20030027057
- Publication date Feb 6, 2003
- Uwe Paul Schroeder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of preparing buried LOCOS collar in trench DRAMS
- Publication number 20030020112
- Publication date Jan 30, 2003
- Helmut Tews
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PREPARING BURIED LOCOS COLLAR IN TRENCH DRAMS
- Publication number 20030020110
- Publication date Jan 30, 2003
- Helmut Tews
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High contrast lithography alignment marks for semiconductor manufac...
- Publication number 20020192926
- Publication date Dec 19, 2002
- Uwe Paul Schroeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for determining photoresist pattern linearity
- Publication number 20020117620
- Publication date Aug 29, 2002
- Tobias Mono
- G01 - MEASURING TESTING
Information Patent Application
Modified gate processing for optimized difinition of array and logi...
- Publication number 20020111025
- Publication date Aug 15, 2002
- International Business Machines Corporation
- Mary E. Weybright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative Ion implant mask formation for self-aligned, sublithograph...
- Publication number 20020068399
- Publication date Jun 6, 2002
- Rama Divakaruni
- H01 - BASIC ELECTRIC ELEMENTS

Uwe Paul Schroeder

Person

Patents Grantslast 30 patents

Capacitors including amorphous dielectric layers and methods of for...

Electrode of an integrated circuit

Zirconium oxide based capacitor and process to manufacture the same

Deposition method for a transition-metal-containing dielectric

Method for fabricating an electrical component

Barrier layer and a method for suppressing diffusion processes duri...

Effective assist pattern for nested and isolated contacts

Method and apparatus for aerial image improvement in projection lit...

Etch process for recessing polysilicon in trench structures

Low resistivity deep trench fill for DRAM and EDRAM applications

Process flow for thick isolation collar with reduced length

Resolution enhancement for alternating phase shift masks

Method of preparing buried LOCOS collar in trench DRAMS

&#x02018;Via first&#x02019; dual damascene process for copper metal...

Rough oxide hard mask for DT surface area enhancement for DT DRAM

Modified gate processing for optimized definition of array and logi...

Negative ion implant mask formation for self-aligned, sublithograph...

Modified gate processing for optimized definition of array and logi...

Patents Applicationslast 30 patents

CAPACITORS INCLUDING AMORPHOUS DIELECTRIC LAYERS AND METHODS OF FOR...

Electrode of an Integrated Circuit

Zirconium oxide based capacitor and process to manufacture the same

Deposition method for transition-metal oxide based dielectric

Deposition method for a transition-metal-containing dielectric

Method for fabricating an electrical component

Storage capacitor, array of storage capacitors and memory cell array

Effective assist pattern for nested and isolated contacts

Method of preparing buried LOCOS collar in trench DRAMS

Etching method and etching signal layer for processing semiconducto...

Barrrier layer and a method for suppressing diffusion processes dur...

Etch process for recessing polysilicon in trench structures

METHOD FOR SURFACE ROUGHNESS ENHANCEMENT IN SEMICONDUCTOR CAPACITOR...

Method for fabricating a semiconductor component

Resolution enhancement for alternating phase shift masks

Method of preparing buried LOCOS collar in trench DRAMS

METHOD OF PREPARING BURIED LOCOS COLLAR IN TRENCH DRAMS

High contrast lithography alignment marks for semiconductor manufac...

Method and apparatus for determining photoresist pattern linearity

Modified gate processing for optimized difinition of array and logi...

Negative Ion implant mask formation for self-aligned, sublithograph...

‘Via first’ dual damascene process for copper metal...