Vadim Yevgenyevich BANINE

Person

Deurne, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus comprising an object with an upper layer hav...
- Patent number 11,143,975
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Andrey Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Component for use in a patterning device environment
- Patent number 11,048,180
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Andrey Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor mark and a method of manufacturing a sensor mark
- Patent number 10,976,196
- Issue date Apr 13, 2021
- ASML Netherlands B.V.
- Joost André Klugkist
- G01 - MEASURING TESTING
Information Patent Grant
Radiation sensor apparatus
- Patent number 10,900,829
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic method
- Patent number 10,884,339
- Issue date Jan 5, 2021
- ASML Netherlands B.V.
- Wouter Joep Engelen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Imprint lithography apparatus and method
- Patent number 10,712,678
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Yvonne Wendela Kruijt-Stegeman
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Membranes for use within a lithographic apparatus and a lithographi...
- Patent number 10,698,312
- Issue date Jun 30, 2020
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Suppression filter, radiation collector and radiation source for a...
- Patent number 10,678,140
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam delivery apparatus and method
- Patent number 10,580,545
- Issue date Mar 3, 2020
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Metrology methods, radiation source, metrology apparatus and device...
- Patent number 10,555,407
- Issue date Feb 4, 2020
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Graphene spectral purity filter
- Patent number 10,481,510
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation sensor apparatus
- Patent number 10,422,691
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for optical metrology
- Patent number 10,362,665
- Issue date Jul 23, 2019
- ASML Netherlands B.V.
- Petrus Wilhelmus Smorenburg
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Metrology methods, radiation source, metrology apparatus and device...
- Patent number 10,342,108
- Issue date Jul 2, 2019
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membranes for use within a lithographic apparatus and a lithographi...
- Patent number 10,228,615
- Issue date Mar 12, 2019
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- G02 - OPTICS
Information Patent Grant
Electron injector and free electron laser
- Patent number 10,103,508
- Issue date Oct 16, 2018
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus
- Patent number 10,031,422
- Issue date Jul 24, 2018
- ASML Netherlands B.V.
- Andrey Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 10,001,709
- Issue date Jun 19, 2018
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,989,844
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for generating radiation
- Patent number 9,986,628
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,964,858
- Issue date May 8, 2018
- ASML Netherlands B.V.
- Joannes Theodoor De Smit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint lithography
- Patent number 9,927,699
- Issue date Mar 27, 2018
- ASML Netherlands B.V.
- Sander Frederik Wuister
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element comprising oriented carbon nanotube sheet and litho...
- Patent number 9,897,930
- Issue date Feb 20, 2018
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 9,823,572
- Issue date Nov 21, 2017
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron injector and free electron laser
- Patent number 9,728,931
- Issue date Aug 8, 2017
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spectral purity filter
- Patent number 9,726,989
- Issue date Aug 8, 2017
- ASML Netherlands B.V.
- Wouter Anthon Soer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 9,645,502
- Issue date May 9, 2017
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,632,419
- Issue date Apr 25, 2017
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method of manufacturing a device
- Patent number 9,606,445
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 9,594,306
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR PROCESSING A RETICLE AND PELLICLE ASSEMBLY
- Publication number 20230314930
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...
- Publication number 20230063156
- Publication date Mar 2, 2023
- ASML Holding N.V.
- Ronald Peter ALBRIGHT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A LITHOGRAPHIC APPARATUS
- Publication number 20220342315
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
- Publication number 20220276553
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- B82 - NANO-TECHNOLOGY
Information Patent Application
A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER H...
- Publication number 20210132517
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Component for Use in a Patterning Device Environment
- Publication number 20200096880
- Publication date Mar 26, 2020
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK
- Publication number 20200064183
- Publication date Feb 27, 2020
- ASML NETHERLANDS B.V.
- Joost André KLUGKIST
- G01 - MEASURING TESTING
Information Patent Application
RADIATION SENSOR APPARATUS
- Publication number 20190353521
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20190302625
- Publication date Oct 3, 2019
- ASML NETHERLANDS B.V.
- Wouter Joep ENGELEN
- G01 - MEASURING TESTING
Information Patent Application
Metrology Methods, Radiation Source, Metrology Apparatus and Device...
- Publication number 20190246480
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Alexey Olegovich POLYAKOV
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...
- Publication number 20190146332
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G02 - OPTICS
Information Patent Application
Methods and Apparatus for Optical Metrology
- Publication number 20180368243
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G01 - MEASURING TESTING
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20180259846
- Publication date Sep 13, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A...
- Publication number 20180246414
- Publication date Aug 30, 2018
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Metrology Methods, Radiation Source, Metrology Apparatus and Device...
- Publication number 20180220518
- Publication date Aug 2, 2018
- ASML NETHERLANDS B.V.
- Alexey Olegovich POLYAKOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20180081278
- Publication date Mar 22, 2018
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G01 - MEASURING TESTING
Information Patent Application
RADIATION SENSOR APPARATUS
- Publication number 20180058928
- Publication date Mar 1, 2018
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G01 - MEASURING TESTING
Information Patent Application
Electron Injector and Free Electron Laser
- Publication number 20170264071
- Publication date Sep 14, 2017
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...
- Publication number 20170205704
- Publication date Jul 20, 2017
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20170160646
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G02 - OPTICS
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20170017150
- Publication date Jan 19, 2017
- ASML Netherlands B.V.
- Andrei Mikhailovich YAKUNIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON INJECTOR AND FREE ELECTRON LASER
- Publication number 20160301180
- Publication date Oct 13, 2016
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM DELIVERY APPARATUS AND METHOD
- Publication number 20160225477
- Publication date Aug 4, 2016
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
IMPRINT LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20160195823
- Publication date Jul 7, 2016
- ASML NETHERLANDS B.V.
- Yvonne Wendela KRUIJT-STEGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20160147161
- Publication date May 26, 2016
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20150331334
- Publication date Nov 19, 2015
- ASML NETHERLANDS B.V.
- Joannes Theodoor DE SMIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150296602
- Publication date Oct 15, 2015
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus
- Publication number 20150286145
- Publication date Oct 8, 2015
- ASML NETHERLANDS B.V.
- Andrey Nikipelov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150268559
- Publication date Sep 24, 2015
- ASML NETHERLANDS B.V.
- Ramin Badie
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus and Method of Manufacturing a Device
- Publication number 20150192861
- Publication date Jul 9, 2015
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Vadim Yevgenyevich BANINE

Person

Patents Grantslast 30 patents

Lithographic apparatus comprising an object with an upper layer hav...

Component for use in a patterning device environment

Sensor mark and a method of manufacturing a sensor mark

Radiation sensor apparatus

Lithographic method

Imprint lithography apparatus and method

Membranes for use within a lithographic apparatus and a lithographi...

Suppression filter, radiation collector and radiation source for a...

Beam delivery apparatus and method

Metrology methods, radiation source, metrology apparatus and device...

Graphene spectral purity filter

Radiation sensor apparatus

Methods and apparatus for optical metrology

Metrology methods, radiation source, metrology apparatus and device...

Membranes for use within a lithographic apparatus and a lithographi...

Electron injector and free electron laser

Lithographic apparatus

Lithographic apparatus, spectral purity filter and device manufactu...

Pellicle for reticle and multilayer mirror

Method and apparatus for generating radiation

Lithographic apparatus and device manufacturing method

Imprint lithography

Optical element comprising oriented carbon nanotube sheet and litho...

Lithographic method

Electron injector and free electron laser

Spectral purity filter

Lithographic apparatus, programmable patterning device and lithogra...

Radiation source

Lithographic apparatus and method of manufacturing a device

Lithographic apparatus, spectral purity filter and device manufactu...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR PROCESSING A RETICLE AND PELLICLE ASSEMBLY

LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGI...

A LITHOGRAPHIC APPARATUS

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

A LITHOGRAPHIC APPARATUS COMPRISING AN OBJECT WITH AN UPPER LAYER H...

Component for Use in a Patterning Device Environment

SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK

RADIATION SENSOR APPARATUS

LITHOGRAPHIC METHOD

Metrology Methods, Radiation Source, Metrology Apparatus and Device...

MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...

Methods and Apparatus for Optical Metrology

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A...

Metrology Methods, Radiation Source, Metrology Apparatus and Device...

LITHOGRAPHIC METHOD

RADIATION SENSOR APPARATUS

Electron Injector and Free Electron Laser

MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

ELECTRON INJECTOR AND FREE ELECTRON LASER

BEAM DELIVERY APPARATUS AND METHOD

IMPRINT LITHOGRAPHY APPARATUS AND METHOD

LITHOGRAPHIC METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Method and Apparatus for Generating Radiation

Lithographic Apparatus

Method and Apparatus for Generating Radiation

Lithographic Apparatus and Method of Manufacturing a Device