VAIBHAV SONI

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,932,934
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for particle removal from wafers through plasma modification...
- Patent number 11,473,189
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition (PVD) chamber with in situ chamber cleani...
- Patent number 11,289,312
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Adolph M. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Biased cover ring for a substrate processing system
- Patent number 11,049,701
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Adolph Miller Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...
- Publication number 20230002885
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...
- Publication number 20200395198
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- ADOLPH M. ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For Particle Removal From Wafers Through Plasma Modification...
- Publication number 20200255938
- Publication date Aug 13, 2020
- Applied Materials, Inc.
- Halbert Chong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF CLEANING AN OXIDE LAYER IN A FILM STACK TO ELIMINATE ARC...
- Publication number 20200203144
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- CHAO DU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...
- Publication number 20190127842
- Publication date May 2, 2019
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM
- Publication number 20180151325
- Publication date May 31, 2018
- ADOLPH MILLER ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

VAIBHAV SONI

Person

Patents Grantslast 30 patents

Method for particle removal from wafers through plasma modification...

Method for particle removal from wafers through plasma modification...

Physical vapor deposition (PVD) chamber with in situ chamber cleani...

Biased cover ring for a substrate processing system

Patents Applicationslast 30 patents

METHOD FOR PARTICLE REMOVAL FROM WAFERS THROUGH PLASMA MODIFICATION...

PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...

Method For Particle Removal From Wafers Through Plasma Modification...

METHODS OF CLEANING AN OXIDE LAYER IN A FILM STACK TO ELIMINATE ARC...

PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...

BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM