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Valentin Todorov
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Fremont, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
High AC current high RF power AC-RF decoupling filter for plasma re...
Patent number
7,777,152
Issue date
Aug 17, 2010
Applied Materials, Inc.
Valentin N. Todorov
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Pulsed-plasma system with pulsed sample bias for etching semiconduc...
Patent number
7,718,538
Issue date
May 18, 2010
Applied Materials, Inc.
Tae Won Kim
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for fabricating a high dielectric constant tra...
Patent number
7,678,710
Issue date
Mar 16, 2010
Applied Materials, Inc.
Thai Cheng Chua
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma process for inductively coupling power through a gas distrib...
Patent number
7,674,394
Issue date
Mar 9, 2010
Applied Materials, Inc.
Alexander Paterson
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process for wafer backside polymer removal with a ring of plasma un...
Patent number
7,552,736
Issue date
Jun 30, 2009
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Tandem etch chamber plasma processing system
Patent number
6,962,644
Issue date
Nov 8, 2005
Applied Materials, Inc.
Alexander Paterson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Adjustable dual frequency voltage dividing plasma reactor
Patent number
6,706,138
Issue date
Mar 16, 2004
Applied Materials Inc.
Michael S. Barnes
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for plasma etching at a constant etch rate
Patent number
6,660,127
Issue date
Dec 9, 2003
Applied Materials, Inc.
Padmapani Nallan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for controlling etch uniformity
Patent number
6,617,794
Issue date
Sep 9, 2003
Applied Materials Inc.
Michael Barnes
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inductively coupled plasma source with controllable power deposition
Patent number
6,507,155
Issue date
Jan 14, 2003
Applied Materials Inc.
Michael Barnes
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with dynamic RF inductive and capacitive coupling co...
Patent number
6,447,636
Issue date
Sep 10, 2002
Applied Materials, Inc.
Xue-Yu Qian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process chamber having a voltage distribution electrode
Patent number
6,447,637
Issue date
Sep 10, 2002
Applied Materials Inc.
Valentin N. Todorov
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Stable plasma process for etching of films
Patent number
6,399,507
Issue date
Jun 4, 2002
Applied Materials, Inc.
Padmapani Nallan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Capacitive probe for in situ measurement of wafer DC bias voltage
Patent number
6,356,097
Issue date
Mar 12, 2002
Applied Materials, Inc.
Peter K. Loewenhardt
B24 - GRINDING POLISHING
Information
Patent Grant
Capacitive probe for in situ measurement of wafer DC bias voltage
Patent number
5,942,889
Issue date
Aug 24, 1999
Applied Materials, Inc.
Peter K. Loewenhardt
B24 - GRINDING POLISHING
Information
Patent Grant
Apparatus for measuring plasma characteristics within a semiconduct...
Patent number
5,801,386
Issue date
Sep 1, 1998
Applied Materials, Inc.
Valentin N. Todorov
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION
Publication number
20080230008
Publication date
Sep 25, 2008
Alexander Paterson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS...
Publication number
20080206483
Publication date
Aug 28, 2008
ALEXANDER PATERSON
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PULSED-PLASMA SYSTEM WITH PULSED SAMPLE BIAS FOR ETCHING SEMICONDUC...
Publication number
20080197110
Publication date
Aug 21, 2008
Tae Won Kim
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PROCESS FOR WAFER BACKSIDE POLYMER REMOVAL WITH A PLASMA STREAM
Publication number
20080179289
Publication date
Jul 31, 2008
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
REACTOR FOR WAFER BACKSIDE POLYMER REMOVAL USING AN ETCH PLASMA FEE...
Publication number
20080179008
Publication date
Jul 31, 2008
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA RE...
Publication number
20070284344
Publication date
Dec 13, 2007
Valentin N. Todorov
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
METHOD AND APPARATUS FOR FABRICATING A HIGH DIELECTRIC CONSTANT TRA...
Publication number
20070212896
Publication date
Sep 13, 2007
APPLIED MATERIALS, INC.
Christopher Sean Olsen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Tandem etch chamber plasma processing system
Publication number
20030176074
Publication date
Sep 18, 2003
APPLIED MATERIALS, INC.
Alexander Paterson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Adjustable dual frequency voltage dividing plasma reactor
Publication number
20030037881
Publication date
Feb 27, 2003
APPLIED MATERIALS, INC.
Michael S. Barnes
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Process chamber having a voltage distribution electrode
Publication number
20030006009
Publication date
Jan 9, 2003
APPLIED MATERIALS, INC.
Valentin N. Todorov
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etching at a constant etch rate
Publication number
20020137352
Publication date
Sep 26, 2002
Padmapani Nallan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ICP window heater integrated with faraday shield or floating electr...
Publication number
20020100557
Publication date
Aug 1, 2002
APPLIED MATERIALS, INC.
Maocheng Li
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for controlling etch uniformity
Publication number
20020041160
Publication date
Apr 11, 2002
APPLIED MATERIALS, INC.
Michael Barnes
H01 - BASIC ELECTRIC ELEMENTS