Vasily Pashkovskiy

Person

Osan-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Device for measuring density of plasma, plasma processing system, a...
- Patent number 12,087,550
- Issue date Sep 10, 2024
- Samsung Electronics Co., Ltd.
- Vladimir Vsevolodovich Protopopov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode, an apparatus including a hollow cathode for manufac...
- Patent number 11,798,788
- Issue date Oct 24, 2023
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of manufacturing semiconduct...
- Patent number 10,950,414
- Issue date Mar 16, 2021
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave probe, plasma monitoring system including the microwave p...
- Patent number 10,566,176
- Issue date Feb 18, 2020
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method, and method of manufacturing...
- Patent number 10,410,874
- Issue date Sep 10, 2019
- Samsung Electronics Co., Ltd.
- Beom Jin Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave probe, plasma monitoring system including the microwave p...
- Patent number 9,601,397
- Issue date Mar 21, 2017
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma processing and apparatuses using the method
- Patent number 9,136,094
- Issue date Sep 15, 2015
- Samsung Electronics Co., Ltd.
- Jung Hyun Cho
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method to generate plasma
- Patent number 7,804,250
- Issue date Sep 28, 2010
- Samsung Electronics Co., Ltd.
- Andrey Ushakov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEVICE FOR MEASURING DENSITY OF PLASMA, PLASMA PROCESSING SYSTEM, A...
- Publication number 20230102201
- Publication date Mar 30, 2023
- Samsung Electronics Co., Ltd.
- Vladimir Vsevolodovich PROTOPOPOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...
- Publication number 20210057193
- Publication date Feb 25, 2021
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Method of Manufacturing Semiconduct...
- Publication number 20190122866
- Publication date Apr 25, 2019
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...
- Publication number 20190122867
- Publication date Apr 25, 2019
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Method, and Method of Manufacturing...
- Publication number 20190035606
- Publication date Jan 31, 2019
- Samsung Electronics Co., Ltd.
- Beom Jin Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...
- Publication number 20170148613
- Publication date May 25, 2017
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- G01 - MEASURING TESTING
Information Patent Application
MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...
- Publication number 20170069553
- Publication date Mar 9, 2017
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS
- Publication number 20150206716
- Publication date Jul 23, 2015
- Samsung Electronics Co., Ltd.
- HYUNGJOON KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PLASMA PROCESSING AND APPARATUSES USING THE METHOD
- Publication number 20140193978
- Publication date Jul 10, 2014
- Jung Hyun CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Generating Apparatus
- Publication number 20120007503
- Publication date Jan 12, 2012
- Samsung Electronics Co., Ltd.
- Hyungjoon Kim
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma generating apparatus
- Publication number 20100065215
- Publication date Mar 18, 2010
- SAMSUNG ELECTRONICS CO., LTD.
- Sang Jean Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method thereof
- Publication number 20080314318
- Publication date Dec 25, 2008
- Samsung Electronics Co., Ltd.
- Kyung Hyun Han
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma based ion implantation system
- Publication number 20080289576
- Publication date Nov 27, 2008
- Samsung Electronics Co., Ltd.
- Young dong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD TO GENERATE PLASMA
- Publication number 20080061702
- Publication date Mar 13, 2008
- Samsung Electronics Co., Ltd.
- Andrey Ushakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION ANALYSIS SYSTEM BASED ON ANALYZER OF ION ENERGY DISTRIBUTION US...
- Publication number 20080032427
- Publication date Feb 7, 2008
- Samsung Electronics Co., Ltd.
- Yung Hee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma based ion implantation apparatus
- Publication number 20080023653
- Publication date Jan 31, 2008
- Samsung Electronics Co., Ltd.
- Young dong Lee
- H01 - BASIC ELECTRIC ELEMENTS

Vasily Pashkovskiy

Person

Patents Grantslast 30 patents

Device for measuring density of plasma, plasma processing system, a...

Hollow cathode, an apparatus including a hollow cathode for manufac...

Plasma processing apparatus and method of manufacturing semiconduct...

Microwave probe, plasma monitoring system including the microwave p...

Plasma processing apparatus and method, and method of manufacturing...

Microwave probe, plasma monitoring system including the microwave p...

Method of plasma processing and apparatuses using the method

Apparatus and method to generate plasma

Patents Applicationslast 30 patents

DEVICE FOR MEASURING DENSITY OF PLASMA, PLASMA PROCESSING SYSTEM, A...

HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...

Plasma Processing Apparatus and Method of Manufacturing Semiconduct...

HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...

Plasma Processing Apparatus and Method, and Method of Manufacturing...

MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...

MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...

PLASMA GENERATING APPARATUS

METHOD OF PLASMA PROCESSING AND APPARATUSES USING THE METHOD

Plasma Generating Apparatus

Plasma generating apparatus

Plasma processing apparatus and method thereof

Plasma based ion implantation system

APPARATUS AND METHOD TO GENERATE PLASMA

ION ANALYSIS SYSTEM BASED ON ANALYZER OF ION ENERGY DISTRIBUTION US...

Plasma based ion implantation apparatus