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Veit Klee
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Pleasant Valley, NY, US
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Patents Grants
last 30 patents
Information
Patent Grant
Method of making a contact in a semiconductor device
Patent number
7,985,676
Issue date
Jul 26, 2011
Infineon Technologies AG
Veit Klee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of making a contact in a semiconductor device
Patent number
7,678,704
Issue date
Mar 16, 2010
Infineon Technologies AG
Veit Klee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of making fully silicided gate electrode
Patent number
7,235,472
Issue date
Jun 26, 2007
Infineon Technologies AG
Veit Klee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Resolution enhancement for alternating phase shift masks
Patent number
6,605,396
Issue date
Aug 12, 2003
Infineon Technologies, AG
Uwe Paul Schroeder
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Strap resistance using selective oxidation to cap DT poly before ST...
Patent number
6,566,227
Issue date
May 20, 2003
Infineon Technologies AG
Paul Wensley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Self-aligned STI process using nitride hard mask
Patent number
6,551,874
Issue date
Apr 22, 2003
Infineon Technologies, AG
John Pohl
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Method of Making a Contact in a Semiconductor Device
Publication number
20100124820
Publication date
May 20, 2010
Veit Klee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of making a contact in a semiconductor device
Publication number
20070134909
Publication date
Jun 14, 2007
Veit Klee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of making fully silicided gate electrode
Publication number
20060105557
Publication date
May 18, 2006
Veit Klee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dummy patterns for reducing proximity effects and method of using same
Publication number
20040058550
Publication date
Mar 25, 2004
Infineon Technologies North America Corp.
Tobias Mono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Self-aligned STI process using nitride hard mask
Publication number
20030045051
Publication date
Mar 6, 2003
Infineon Technologies North America Corp.
John Pohl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Strap resistance using selective oxidation to cap DT poly before ST...
Publication number
20030032257
Publication date
Feb 13, 2003
Paul Wensley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Resolution enhancement for alternating phase shift masks
Publication number
20030027057
Publication date
Feb 6, 2003
Uwe Paul Schroeder
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY