Venkateswara R. PALLEM

Person

Hockessin, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon-based self-assembling monolayer compositions and surface pr...
- Patent number 12,187,853
- Issue date Jan 7, 2025
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Venkateswara R. Pallem
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 11,837,474
- Issue date Dec 5, 2023
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reagents to remove oxygen from metal oxyhalide precursors in thin f...
- Patent number 11,821,080
- Issue date Nov 21, 2023
- L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Geo...
- Yumin Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Preparation of lanthanide-containing precursors and deposition of l...
- Patent number 11,784,041
- Issue date Oct 10, 2023
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Daehyeon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 11,469,110
- Issue date Oct 11, 2022
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodine-containing compounds for etching semiconductor structures
- Patent number 11,430,663
- Issue date Aug 30, 2022
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 10,629,451
- Issue date Apr 21, 2020
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodine-containing compounds for etching semiconductor structures
- Patent number 10,607,850
- Issue date Mar 31, 2020
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen-containing compounds for etching semiconductor structures
- Patent number 10,256,109
- Issue date Apr 9, 2019
- American Air Liquide, Inc.
- Vijay Surla
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Gases for low damage selective silicon nitride etching
- Patent number 10,217,681
- Issue date Feb 26, 2019
- American Air Liquide, Inc.
- James Royer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching semiconductor structures with etch gas
- Patent number 10,115,600
- Issue date Oct 30, 2018
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Rahul Gupta
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Methods of using amino(bromo)silane precursors for ALD/CVD silicon-...
- Patent number 10,053,775
- Issue date Aug 21, 2018
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Glenn Kuchenbeiser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organodisilane precursors for ALD/CVD silicon-containing film appli...
- Patent number 10,006,122
- Issue date Jun 26, 2018
- American Air Liquide, Inc.
- Guillaume Husson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbosilane substituted amine precursors for deposition of Si-conta...
- Patent number 9,969,756
- Issue date May 15, 2018
- L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Ge...
- Claudia Fafard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organosilane precursors for ALD/CVD silicon-containing film applica...
- Patent number 9,938,303
- Issue date Apr 10, 2018
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hexacoordinate silicon-containing precursors for ALD/CVD silicon-co...
- Patent number 9,822,132
- Issue date Nov 21, 2017
- American Air Liquide, Inc.
- Glenn Kuchenbeiser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching semiconductor structures with etch gas
- Patent number 9,773,679
- Issue date Sep 26, 2017
- American Air Liquide, Inc.
- Rahul Gupta
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Atomic layer or cyclic plasma etching chemistries and processes
- Patent number 9,773,683
- Issue date Sep 26, 2017
- American Air Liquide, Inc.
- Rahul Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Synthesis methods for amino(halo)silanes
- Patent number 9,701,695
- Issue date Jul 11, 2017
- American Air Liquide, Inc.
- Glenn Kuchenbeiser
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Nitrogen-containing compounds for etching semiconductor structures
- Patent number 9,659,788
- Issue date May 23, 2017
- American Air Liquide, Inc.
- Vijay Surla
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organosilane precursors for ALD/CVD silicon-containing film applica...
- Patent number 9,593,133
- Issue date Mar 14, 2017
- America Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sulfur containing organosilane precursors for ALD/CVD silicon-conta...
- Patent number 9,382,268
- Issue date Jul 5, 2016
- American Air Liquide, Inc.
- Glenn Kuchenbeiser
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Preparation of cerium-containing precursor and deposition of cerium...
- Patent number 9,384,963
- Issue date Jul 5, 2016
- American Air Liquide, Inc.
- Venkateswara R. Pallem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organosilane precursors for ALD/CVD silicon-containing film applica...
- Patent number 9,371,338
- Issue date Jun 21, 2016
- American Air Liquide, Inc.
- Christian Dussarrat
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Hafnium-containing and zirconium-containing precursors for vapor de...
- Patent number 9,087,690
- Issue date Jul 21, 2015
- American Air Liquide, Inc.
- Venkateswara R. Pallem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium- and zirconium-containing precursors and methods of using t...
- Patent number 9,045,509
- Issue date Jun 2, 2015
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Preparation of cerium-containing precursors and deposition of ceriu...
- Patent number 8,809,849
- Issue date Aug 19, 2014
- American Air Liquide, Inc.
- Venkateswara R. Pallem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of making and deposition methods using hafnium- or zirconiu...
- Patent number 8,765,220
- Issue date Jul 1, 2014
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Synthesis method for copper compounds
- Patent number 8,692,010
- Issue date Apr 8, 2014
- American Air Liquide, Inc.
- Andrey V. Korolev
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Titanium-containing precursors for vapor deposition
- Patent number 8,633,329
- Issue date Jan 21, 2014
- American Air Liquide, Inc.
- Venkateswara R. Pallem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING A RUTHENIUM-CONTAINING LAYER AND LAMINATE
- Publication number 20240384400
- Publication date Nov 21, 2024
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Rocio Alejandra ARTEAGA MULLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A CONFORMAL AND CONTINUOUS CRYSTALLINE SILICON NA...
- Publication number 20240222114
- Publication date Jul 4, 2024
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Claudia Fafard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20240112920
- Publication date Apr 4, 2024
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDIUM PRECURSORS FOR VAPOR DEPOSITIONS
- Publication number 20230357281
- Publication date Nov 9, 2023
- American Air Liquide, Inc.
- Kayla DIEMOZ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON-BASED SELF-ASSEMBLING MONOLAYER COMPOSITIONS AND SURFACE PR...
- Publication number 20230331926
- Publication date Oct 19, 2023
- American Air Liquide, Inc.
- Venkateswara R. PALLEM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NIOBIUM, VANADIUM, TANTALUM FILM FORMING COMPOSITIONS AND DEPOSITIO...
- Publication number 20230323530
- Publication date Oct 12, 2023
- L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitatation des Procédés...
- Daehyeon KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE THERMAL ETCHING METHODS OF METAL OR METAL-CONTAINING MATE...
- Publication number 20230274947
- Publication date Aug 31, 2023
- American Air Liquide, Inc.
- Rocio Alejandra ARTEAGA MULLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURABLE FORMULATIONS FOR FORMING LOW-k DIELECTRIC SILICON-CONTAININ...
- Publication number 20230095074
- Publication date Mar 30, 2023
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Yumin LIU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20230026743
- Publication date Jan 26, 2023
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDIUM PRECURSORS FOR VAPOR DEPOSITIONS
- Publication number 20220106333
- Publication date Apr 7, 2022
- American Air Liquide, Inc.
- Kayla DIEMOZ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REAGENTS TO REMOVE OXYGEN FROM METAL OXYHALIDE PRECURSORS IN THIN F...
- Publication number 20210277517
- Publication date Sep 9, 2021
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Yumin Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...
- Publication number 20200251346
- Publication date Aug 6, 2020
- American Air Liquide, Inc.
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20200203174
- Publication date Jun 25, 2020
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS
- Publication number 20190256532
- Publication date Aug 22, 2019
- American Air Liquide, Inc.
- Claudia FAFARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GASES FOR LOW DAMAGE SELECTIVE SILICON NITRIDE ETCHING
- Publication number 20180277387
- Publication date Sep 27, 2018
- American Air Liquide, Inc.
- James ROYER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALKYLAMINO-SUBSTITUTED HALOCARBOSILANE PRECURSORS
- Publication number 20180202042
- Publication date Jul 19, 2018
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Claudia FAFARD
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS
- Publication number 20170352546
- Publication date Dec 7, 2017
- American Air Liquide, Inc.
- Rahul GUPTA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANODISILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLI...
- Publication number 20170298510
- Publication date Oct 19, 2017
- American Air Liquide, Inc.
- Guillaume HUSSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBOSILANE SUBSTITUTED AMINE PRECURSORS FOR DEPOSITION OF Si-CONTA...
- Publication number 20170291915
- Publication date Oct 12, 2017
- American Air Liquide, Inc.
- Claudia FAFARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS
- Publication number 20170190720
- Publication date Jul 6, 2017
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Claudia FAFARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20170178923
- Publication date Jun 22, 2017
- American Air Liquide, Inc.
- Vijay SURLA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS
- Publication number 20160307764
- Publication date Oct 20, 2016
- American Air Liquide, Inc.
- Rahul GUPTA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PREPARATION OF LANTHANIDE-CONTAINING PRECURSORS AND DEPOSITION OF L...
- Publication number 20160293409
- Publication date Oct 6, 2016
- American Air Liquide, Inc.
- Venkateswara R. PALLEM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEXACOORDINATE SILICON-CONTAINING PRECURSORS FOR ALD/CVD SILICON-CO...
- Publication number 20160152640
- Publication date Jun 2, 2016
- Glenn KUCHENBEISER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMINO(BROMO)SILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM A...
- Publication number 20160108064
- Publication date Apr 21, 2016
- American Air Liquide, Inc.
- Glenn KUCHENBEISER
- C07 - ORGANIC CHEMISTRY
Information Patent Application
INTERNALLY COATED VESSEL FOR HOUSING A METAL HALIDE
- Publication number 20160046408
- Publication date Feb 18, 2016
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Jean-Marc Girard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER OR CYCLIC PLASMA ETCHING CHEMISTRIES AND PROCESSES
- Publication number 20150270140
- Publication date Sep 24, 2015
- American Air Liquide, Inc.
- Rahul GUPTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICA...
- Publication number 20150166577
- Publication date Jun 18, 2015
- American Air Liquide, Inc.
- Christian Dussarrat
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICA...
- Publication number 20150166576
- Publication date Jun 18, 2015
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLIC...
- Publication number 20150004317
- Publication date Jan 1, 2015
- American Air Liquide, Inc.
- Christian Dussarrat
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Venkateswara R. PALLEM

Person

Patents Grantslast 30 patents

Silicon-based self-assembling monolayer compositions and surface pr...

Method to improve profile control during selective etching of silic...

Reagents to remove oxygen from metal oxyhalide precursors in thin f...

Preparation of lanthanide-containing precursors and deposition of l...

Method to improve profile control during selective etching of silic...

Iodine-containing compounds for etching semiconductor structures

Method to improve profile control during selective etching of silic...

Iodine-containing compounds for etching semiconductor structures

Nitrogen-containing compounds for etching semiconductor structures

Gases for low damage selective silicon nitride etching

Method of etching semiconductor structures with etch gas

Methods of using amino(bromo)silane precursors for ALD/CVD silicon-...

Organodisilane precursors for ALD/CVD silicon-containing film appli...

Carbosilane substituted amine precursors for deposition of Si-conta...

Organosilane precursors for ALD/CVD silicon-containing film applica...

Hexacoordinate silicon-containing precursors for ALD/CVD silicon-co...

Method of etching semiconductor structures with etch gas

Atomic layer or cyclic plasma etching chemistries and processes

Synthesis methods for amino(halo)silanes

Nitrogen-containing compounds for etching semiconductor structures

Organosilane precursors for ALD/CVD silicon-containing film applica...

Sulfur containing organosilane precursors for ALD/CVD silicon-conta...

Preparation of cerium-containing precursor and deposition of cerium...

Organosilane precursors for ALD/CVD silicon-containing film applica...

Hafnium-containing and zirconium-containing precursors for vapor de...

Hafnium- and zirconium-containing precursors and methods of using t...

Preparation of cerium-containing precursors and deposition of ceriu...

Methods of making and deposition methods using hafnium- or zirconiu...

Synthesis method for copper compounds

Titanium-containing precursors for vapor deposition

Patents Applicationslast 30 patents

METHOD OF FORMING A RUTHENIUM-CONTAINING LAYER AND LAMINATE

METHOD OF FORMING A CONFORMAL AND CONTINUOUS CRYSTALLINE SILICON NA...

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

INDIUM PRECURSORS FOR VAPOR DEPOSITIONS

SILICON-BASED SELF-ASSEMBLING MONOLAYER COMPOSITIONS AND SURFACE PR...

NIOBIUM, VANADIUM, TANTALUM FILM FORMING COMPOSITIONS AND DEPOSITIO...

SELECTIVE THERMAL ETCHING METHODS OF METAL OR METAL-CONTAINING MATE...

CURABLE FORMULATIONS FOR FORMING LOW-k DIELECTRIC SILICON-CONTAININ...

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

INDIUM PRECURSORS FOR VAPOR DEPOSITIONS

REAGENTS TO REMOVE OXYGEN FROM METAL OXYHALIDE PRECURSORS IN THIN F...

METHOD TO IMPROVE PROFILE CONTROL DURING SELECTIVE ETCHING OF SILIC...

IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES

ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS

GASES FOR LOW DAMAGE SELECTIVE SILICON NITRIDE ETCHING

ALKYLAMINO-SUBSTITUTED HALOCARBOSILANE PRECURSORS

METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS

ORGANODISILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLI...

CARBOSILANE SUBSTITUTED AMINE PRECURSORS FOR DEPOSITION OF Si-CONTA...

ALKYLAMINO-SUBSTITUTED CARBOSILANE PRECURSORS

IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES

METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GAS

PREPARATION OF LANTHANIDE-CONTAINING PRECURSORS AND DEPOSITION OF L...

HEXACOORDINATE SILICON-CONTAINING PRECURSORS FOR ALD/CVD SILICON-CO...

AMINO(BROMO)SILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM A...

INTERNALLY COATED VESSEL FOR HOUSING A METAL HALIDE

ATOMIC LAYER OR CYCLIC PLASMA ETCHING CHEMISTRIES AND PROCESSES

ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICA...

ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICA...

ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLIC...