Vi Vuong

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Synthetic wavelengths for endpoint detection in plasma etching
- Patent number 10,910,201
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Advanced optical sensor and method for detecting an optical event i...
- Patent number 10,692,705
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Mihail Mihaylov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of endpoint detection of plasma etching process using multiv...
- Patent number 10,002,804
- Issue date Jun 19, 2018
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Accurate and fast neural network training for library-based critica...
- Patent number 9,607,265
- Issue date Mar 28, 2017
- KLA-Tencor Corporation
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of endpoint detection of plasma etching process using multiv...
- Patent number 9,330,990
- Issue date May 3, 2016
- Tokyo Electron Limited
- Yan Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Accurate and fast neural network training for library-based critica...
- Patent number 8,577,820
- Issue date Nov 5, 2013
- Tokyo Electron Limited
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determination of training set size for a machine learning system
- Patent number 8,452,718
- Issue date May 28, 2013
- Tokyo Electron Limited
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Transforming metrology data from a semiconductor treatment system u...
- Patent number 8,346,506
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Transforming metrology data from a semiconductor treatment system u...
- Patent number 8,170,833
- Issue date May 1, 2012
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Data flow management in generating profile models used in optical m...
- Patent number 7,783,669
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Grant
Data flow management in generating different signal formats used in...
- Patent number 7,765,234
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Grant
Allocating processing units to processing clusters to generate simu...
- Patent number 7,765,076
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- Hemalatha Erva
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Allocating processing units to generate simulated diffraction signa...
- Patent number 7,742,888
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Hemalatha Erva
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology optimization for repetitive structures
- Patent number 7,616,325
- Issue date Nov 10, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology model optimization based on goals
- Patent number 7,588,949
- Issue date Sep 15, 2009
- Tokyo Electron Limited
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Managing and using metrology data for process and equipment control
- Patent number 7,526,354
- Issue date Apr 28, 2009
- Tokyo Electron Limited
- Manuel Madriaga
- G01 - MEASURING TESTING
Information Patent Grant
Optimizing selected variables of an optical metrology system
- Patent number 7,525,673
- Issue date Apr 28, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Consecutive measurement of structures formed on a semiconductor waf...
- Patent number 7,522,295
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Weighting function to enhance measured diffraction signals in optic...
- Patent number 7,523,021
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Measuring a process parameter of a semiconductor fabrication proces...
- Patent number 7,522,294
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Hanyou Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modeling and measuring structures with spatially varying properties...
- Patent number 7,515,282
- Issue date Apr 7, 2009
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Model and parameter selection for optical metrology
- Patent number 7,505,153
- Issue date Mar 17, 2009
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Matching optical metrology tools using spectra enhancement
- Patent number 7,505,148
- Issue date Mar 17, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Optimizing selected variables of an optical metrology model
- Patent number 7,495,781
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Selection of wavelengths for integrated circuit optical metrology
- Patent number 7,474,993
- Issue date Jan 6, 2009
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Grant
In-die optical metrology
- Patent number 7,474,420
- Issue date Jan 6, 2009
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Grant
Transforming metrology data from a semiconductor treatment system u...
- Patent number 7,467,064
- Issue date Dec 16, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Drift compensation for an optical metrology tool
- Patent number 7,428,044
- Issue date Sep 23, 2008
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Consecutive measurement of structures formed on a semiconductor waf...
- Patent number 7,417,750
- Issue date Aug 26, 2008
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Selecting a hypothetical profile to use in optical metrology
- Patent number 7,394,554
- Issue date Jul 1, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
HYBRID MODELING FOR FILM METROLOGY
- Publication number 20240419885
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Yan CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYNTHETIC WAVELENGTHS FOR ENDPOINT DETECTION IN PLASMA ETCHING
- Publication number 20210057195
- Publication date Feb 25, 2021
- TOKYO ELECTRON LIMITED
- Yan CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...
- Publication number 20180286643
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Holger TUITJE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ADVANCED OPTICAL SENSOR AND METHOD FOR PLASMA CHAMBER
- Publication number 20170140905
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Mihail Mihaylov
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ENDPOINT DETECTION OF PLASMA ETCHING PROCESS USING MULTIV...
- Publication number 20160172258
- Publication date Jun 16, 2016
- TOKYO ELECTRON LIMITED
- Yan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ENDPOINT DETECTION OF PLASMA ETCHING PROCESS USING MULTIV...
- Publication number 20140106477
- Publication date Apr 17, 2014
- TOKYO ELECTRON LIMITED
- Yan CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ACCURATE AND FAST NEURAL NETWORK TRAINING FOR LIBRARY-BASED CRITICA...
- Publication number 20140032463
- Publication date Jan 30, 2014
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Accurate and Fast Neural network Training for Library-Based Critica...
- Publication number 20120226644
- Publication date Sep 6, 2012
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM U...
- Publication number 20120199287
- Publication date Aug 9, 2012
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
DETERMINATION OF TRAINING SET SIZE FOR A MACHINE LEARNING SYSTEM
- Publication number 20110307424
- Publication date Dec 15, 2011
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM U...
- Publication number 20090094001
- Publication date Apr 9, 2009
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES
- Publication number 20080285054
- Publication date Nov 20, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
MEASURING A PROCESS PARAMETER OF A SEMICONDUCTOR FABRICATION PROCES...
- Publication number 20080212080
- Publication date Sep 4, 2008
- TOKYO ELECTRON LIMITED
- Hanyou Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY
- Publication number 20080151269
- Publication date Jun 26, 2008
- Timbre Technologies, Inc.
- Vi Vuong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Drift compensation for an optical metrology tool
- Publication number 20080117437
- Publication date May 22, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Matching optical metrology tools using spectra enhancement
- Publication number 20080117411
- Publication date May 22, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Allocating processing units to processing clusters to generate simu...
- Publication number 20080115140
- Publication date May 15, 2008
- TOKYO ELECTRON LIMITED
- Hemalatha Erva
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Consecutive measurement of structures formed on a semiconductor waf...
- Publication number 20080106728
- Publication date May 8, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
CONSECUTIVE MEASUREMENT OF STRUCTURES FORMED ON A SEMICONDUCTOR WAF...
- Publication number 20080106729
- Publication date May 8, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Data flow management in generating profile models used in optical m...
- Publication number 20080091724
- Publication date Apr 17, 2008
- TOKYO ELECTRON LIMITED
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Application
Data flow management in generating different signal formats used in...
- Publication number 20080089574
- Publication date Apr 17, 2008
- TOKYO ELECTRON LIMITED
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Application
Allocating processing units to generate simulated diffraction signa...
- Publication number 20080027565
- Publication date Jan 31, 2008
- TOKYO ELECTRON LIMITED
- Hemalatha Erva
- G01 - MEASURING TESTING
Information Patent Application
Generating a profile model to characterize a structure to be examin...
- Publication number 20080013107
- Publication date Jan 17, 2008
- TOKYO ELECTRON LIMITED
- Jeffrey A. Chard
- G01 - MEASURING TESTING
Information Patent Application
Optimizing selected variables of an optical metrology system
- Publication number 20080007739
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Optimizing selected variables of an optical metrology model
- Publication number 20080007740
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Managing and using metrology data for process and equipment control
- Publication number 20080009081
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Manuel Madriaga
- G01 - MEASURING TESTING
Information Patent Application
In-die optical metrology
- Publication number 20070229855
- Publication date Oct 4, 2007
- Timbre Technologies, Inc.
- Shifang Li
- G01 - MEASURING TESTING
Information Patent Application
Weighting function to enhance measured diffraction signals in optic...
- Publication number 20070211260
- Publication date Sep 13, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Selection of wavelengths for integrated circuit optical metrology
- Publication number 20070198211
- Publication date Aug 23, 2007
- Timbre Technologies, Inc.
- Srinivas Doddi
- G01 - MEASURING TESTING
Information Patent Application
Transforming metrology data from a semiconductor treatment system u...
- Publication number 20070185684
- Publication date Aug 9, 2007
- Timbre Technologies, Inc.
- Vi Vuong
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

Synthetic wavelengths for endpoint detection in plasma etching

Advanced optical sensor and method for detecting an optical event i...

Method of endpoint detection of plasma etching process using multiv...

Accurate and fast neural network training for library-based critica...

Method of endpoint detection of plasma etching process using multiv...

Accurate and fast neural network training for library-based critica...

Determination of training set size for a machine learning system

Transforming metrology data from a semiconductor treatment system u...

Transforming metrology data from a semiconductor treatment system u...

Data flow management in generating profile models used in optical m...

Data flow management in generating different signal formats used in...

Allocating processing units to processing clusters to generate simu...

Allocating processing units to generate simulated diffraction signa...

Optical metrology optimization for repetitive structures

Optical metrology model optimization based on goals

Managing and using metrology data for process and equipment control

Optimizing selected variables of an optical metrology system

Consecutive measurement of structures formed on a semiconductor waf...

Weighting function to enhance measured diffraction signals in optic...

Measuring a process parameter of a semiconductor fabrication proces...

Modeling and measuring structures with spatially varying properties...

Model and parameter selection for optical metrology

Matching optical metrology tools using spectra enhancement

Optimizing selected variables of an optical metrology model

Selection of wavelengths for integrated circuit optical metrology

In-die optical metrology

Transforming metrology data from a semiconductor treatment system u...

Drift compensation for an optical metrology tool

Consecutive measurement of structures formed on a semiconductor waf...

Selecting a hypothetical profile to use in optical metrology

Patents Applicationslast 30 patents

HYBRID MODELING FOR FILM METROLOGY

SYNTHETIC WAVELENGTHS FOR ENDPOINT DETECTION IN PLASMA ETCHING

ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...

ADVANCED OPTICAL SENSOR AND METHOD FOR PLASMA CHAMBER

METHOD OF ENDPOINT DETECTION OF PLASMA ETCHING PROCESS USING MULTIV...

METHOD OF ENDPOINT DETECTION OF PLASMA ETCHING PROCESS USING MULTIV...

ACCURATE AND FAST NEURAL NETWORK TRAINING FOR LIBRARY-BASED CRITICA...

Accurate and Fast Neural network Training for Library-Based Critica...

TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM U...

DETERMINATION OF TRAINING SET SIZE FOR A MACHINE LEARNING SYSTEM

TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM U...

OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES

MEASURING A PROCESS PARAMETER OF A SEMICONDUCTOR FABRICATION PROCES...

MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY

Drift compensation for an optical metrology tool

Matching optical metrology tools using spectra enhancement

Allocating processing units to processing clusters to generate simu...

Consecutive measurement of structures formed on a semiconductor waf...

CONSECUTIVE MEASUREMENT OF STRUCTURES FORMED ON A SEMICONDUCTOR WAF...

Data flow management in generating profile models used in optical m...

Data flow management in generating different signal formats used in...

Allocating processing units to generate simulated diffraction signa...

Generating a profile model to characterize a structure to be examin...

Optimizing selected variables of an optical metrology system

Optimizing selected variables of an optical metrology model

Managing and using metrology data for process and equipment control

In-die optical metrology

Weighting function to enhance measured diffraction signals in optic...

Selection of wavelengths for integrated circuit optical metrology

Transforming metrology data from a semiconductor treatment system u...