Viachslav Babayan

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective etch using material modification and RF pulsing
- Patent number 12,057,329
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,899,366
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for post exposure bake
- Patent number 11,550,224
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post exposure processing apparatus
- Patent number 11,262,662
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,112,697
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for thin wafer carrier
- Patent number 11,094,573
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Jingyu Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Biased cover ring for a substrate processing system
- Patent number 11,049,701
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Adolph Miller Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature vapor delivery system and method
- Patent number 10,954,594
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Viachslav Babayan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density, low stress amorphous carbon film, and process and equ...
- Patent number 10,858,727
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post exposure processing apparatus
- Patent number 10,845,715
- Issue date Nov 24, 2020
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for post exposure bake
- Patent number 10,754,252
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for field guided acid profile control in a photoresist layer
- Patent number 10,615,058
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse shape controller for sputter sources
- Patent number 10,566,177
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Michael Stowell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 10,474,033
- Issue date Nov 12, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post exposure processing apparatus
- Patent number 10,401,742
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 10,203,604
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post exposure processing apparatus
- Patent number 9,964,863
- Issue date May 8, 2018
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for post exposure bake
- Patent number 9,958,782
- Issue date May 1, 2018
- Applied Materials, Inc.
- Kyle M. Hanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etch using material modification and RF pulsing
- Patent number 9,865,484
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion field guided exposure and post-exposure bake process
- Patent number 9,829,790
- Issue date Nov 28, 2017
- Applied Materials, Inc.
- Douglas A. Buchberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20220004104
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST EXPOSURE PROCESSING APPARATUS
- Publication number 20210026257
- Publication date Jan 28, 2021
- Applied Materials, Inc.
- Viachslav BABAYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20200387074
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Kyle M. HANSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR THIN WAFER CARRIER
- Publication number 20200161156
- Publication date May 21, 2020
- Applied Materials, Inc.
- Jingyu QIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSICAL VAPOR DEPOSITION O...
- Publication number 20200048760
- Publication date Feb 13, 2020
- KISHOR KALATHIPARAMBIL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST EXPOSURE PROCESSING APPARATUS
- Publication number 20190377272
- Publication date Dec 12, 2019
- Applied Materials, Inc.
- Viachslav BABAYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20190187563
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...
- Publication number 20190127842
- Publication date May 2, 2019
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING
- Publication number 20190088457
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POST EXPOSURE PROCESSING APPARATUS
- Publication number 20180224754
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Viachslav BABAYAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20180217504
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Kyle M. HANSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR FIELD GUIDED ACID PROFILE CONTROL IN A PHOTORESIST LAYER
- Publication number 20180190518
- Publication date Jul 5, 2018
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM
- Publication number 20180151325
- Publication date May 31, 2018
- ADOLPH MILLER ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20180107119
- Publication date Apr 19, 2018
- Applied Materials, Inc.
- Kyle M. HANSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)
- Publication number 20180108519
- Publication date Apr 19, 2018
- Applied Materials, Inc.
- VIACHSLAV BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING
- Publication number 20180082861
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...
- Publication number 20180051368
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSE SHAPE CONTROLLER FOR SPUTTER SOURCES
- Publication number 20180044781
- Publication date Feb 15, 2018
- Applied Materials, Inc.
- Michael STOWELL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH IN SITU WAFER ROTATION
- Publication number 20180033673
- Publication date Feb 1, 2018
- Applied Materials, Inc.
- Srinivas D. Nemani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE
- Publication number 20180004094
- Publication date Jan 4, 2018
- Applied Materials, Inc.
- Kyle M. HANSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING
- Publication number 20180005850
- Publication date Jan 4, 2018
- Applied Materials, Inc.
- Bhargav Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20170363960
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20170154797
- Publication date Jun 1, 2017
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE VAPOR DELIVERY SYSTEM AND METHOD
- Publication number 20170088949
- Publication date Mar 30, 2017
- Applied Materials, Inc.
- Viachslav BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMMERSION FIELD GUIDED EXPOSURE AND POST-EXPOSURE BAKE PROCESS
- Publication number 20160357107
- Publication date Dec 8, 2016
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Viachslav Babayan

Person

Patents Grantslast 30 patents

Selective etch using material modification and RF pulsing

Method and apparatus for post exposure processing of photoresist wa...

Apparatus for post exposure bake

Post exposure processing apparatus

Method and apparatus for post exposure processing of photoresist wa...

Method and apparatus for thin wafer carrier

Biased cover ring for a substrate processing system

High temperature vapor delivery system and method

High density, low stress amorphous carbon film, and process and equ...

Post exposure processing apparatus

Apparatus for post exposure bake

Apparatus for field guided acid profile control in a photoresist layer

Pulse shape controller for sputter sources

Method and apparatus for post exposure processing of photoresist wa...

Post exposure processing apparatus

Method and apparatus for post exposure processing of photoresist wa...

Post exposure processing apparatus

Apparatus for post exposure bake

Selective etch using material modification and RF pulsing

Immersion field guided exposure and post-exposure bake process

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

POST EXPOSURE PROCESSING APPARATUS

APPARATUS FOR POST EXPOSURE BAKE

METHOD AND APPARATUS FOR THIN WAFER CARRIER

HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSICAL VAPOR DEPOSITION O...

POST EXPOSURE PROCESSING APPARATUS

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

PULSED DC SOURCE FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSIC...

SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING

POST EXPOSURE PROCESSING APPARATUS

APPARATUS FOR POST EXPOSURE BAKE

APPARATUS FOR FIELD GUIDED ACID PROFILE CONTROL IN A PHOTORESIST LAYER

BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM

APPARATUS FOR POST EXPOSURE BAKE

POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)

SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING

HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...

PULSE SHAPE CONTROLLER FOR SPUTTER SOURCES

SUBSTRATE SUPPORT WITH IN SITU WAFER ROTATION

APPARATUS FOR POST EXPOSURE BAKE

SELECTIVE ETCH USING MATERIAL MODIFICATION AND RF PULSING

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

HIGH TEMPERATURE VAPOR DELIVERY SYSTEM AND METHOD

IMMERSION FIELD GUIDED EXPOSURE AND POST-EXPOSURE BAKE PROCESS