Vibhu Jindal

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multicathode deposition system and methods
- Patent number 12,051,576
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Sanjay Bhat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle processing system
- Patent number 11,940,724
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Sanjay Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,860,533
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-chamber substrate processing platform
- Patent number 11,860,528
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Ribhu Gautam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,815,809
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer extreme ultraviolet reflector materials
- Patent number 11,815,803
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank defect reduction
- Patent number 11,789,358
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer extreme ultraviolet reflectors
- Patent number 11,782,337
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer extreme ultraviolet reflectors
- Patent number 11,762,278
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank with multilayer absorber and method...
- Patent number 11,754,917
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded interface in Bragg reflector
- Patent number 11,720,013
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Wen Xiao
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,675,263
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank defect reduction methods
- Patent number 11,669,008
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with a multi-cathode
- Patent number 11,668,003
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,644,741
- Issue date May 9, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,640,109
- Issue date May 2, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Physical vapor deposition system and processes
- Patent number 11,639,544
- Issue date May 2, 2023
- Applied Materials, Inc.
- Sanjay Bhat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,630,385
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,609,490
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface topography measurement apparatus and method
- Patent number 11,604,151
- Issue date Mar 14, 2023
- Applied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Grant
Physical vapor deposition system and processes
- Patent number 11,599,016
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,592,738
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,556,053
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to control PVD deposition uniformity
- Patent number 11,557,473
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Wen Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition system and processes
- Patent number 11,542,595
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Wen Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask blank hard mask materials
- Patent number 11,537,040
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Physical vapor deposition processing systems target cooling
- Patent number 11,515,132
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,513,437
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to improve EUV mask blank flatness
- Patent number 11,480,865
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to anneal EUV mask blank
- Patent number 11,480,866
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20230176468
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTORS
- Publication number 20230075471
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTOR MATERIALS
- Publication number 20230067566
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTORS
- Publication number 20220404692
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220350233
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Surface Topography Measurement Apparatus And Method
- Publication number 20220283100
- Publication date Sep 8, 2022
- Aplied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Application
Extreme Ultraviolet Mask Blank Structure
- Publication number 20220252971
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220236634
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded Interface In Bragg Reflector
- Publication number 20220221786
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20220221783
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Shiyu Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multi-Chamber Substrate Processing Platform
- Publication number 20220197128
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Ribhu Gautam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS TO IMPROVE EUV MASK BLANK FLATNESS
- Publication number 20220187698
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process Kit Conditioning Chamber
- Publication number 20220189749
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Ribhu Gautam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EUV Mask Blank Absorber Defect Reduction
- Publication number 20220187696
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Binni Varghese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO ANNEAL EUV MASK BLANK
- Publication number 20220187697
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Surface Topography Measurement Apparatus And Method
- Publication number 20220170866
- Publication date Jun 2, 2022
- Applied Materials, Inc.
- Weimin Li
- G01 - MEASURING TESTING
Information Patent Application
Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Ma...
- Publication number 20220163882
- Publication date May 26, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEPOSITION SYSTEM WITH A MULTI-CATHODE
- Publication number 20220106679
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220107556
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Shuwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION SYSTEM AND PROCESSES
- Publication number 20220107558
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method...
- Publication number 20220082925
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20220011663
- Publication date Jan 13, 2022
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method to Measure Refractive Index at Specific Wavelengths
- Publication number 20210381967
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G01 - MEASURING TESTING
Information Patent Application
System and Method of Measuring Refractive Index of EUV Mask Absorber
- Publication number 20210382398
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20210341828
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank Defect Reduction
- Publication number 20210333703
- Publication date Oct 28, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20210325771
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Shuwei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210302826
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Physical Vapor Deposition Processing Systems Target Cooling
- Publication number 20210272785
- Publication date Sep 2, 2021
- Applied Materials, Inc.
- Sanjay Bhat
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Extreme Ultraviolet Mask Blank Hard Mask Materials
- Publication number 20210232040
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Vibhu Jindal

Person

Patents Grantslast 30 patents

Multicathode deposition system and methods

Reticle processing system

Extreme ultraviolet mask absorber materials

Multi-chamber substrate processing platform

Extreme ultraviolet mask absorber materials

Multilayer extreme ultraviolet reflector materials

Extreme ultraviolet mask blank defect reduction

Multilayer extreme ultraviolet reflectors

Multilayer extreme ultraviolet reflectors

Extreme ultraviolet mask blank with multilayer absorber and method...

Graded interface in Bragg reflector

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask blank defect reduction methods

Deposition system with a multi-cathode

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Physical vapor deposition system and processes

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask absorber materials

Surface topography measurement apparatus and method

Physical vapor deposition system and processes

Extreme ultraviolet mask absorber materials

Extreme ultraviolet mask blank hard mask materials

System and method to control PVD deposition uniformity

Physical vapor deposition system and processes

Extreme ultraviolet mask blank hard mask materials

Physical vapor deposition processing systems target cooling

Extreme ultraviolet mask absorber materials

Method and apparatus to improve EUV mask blank flatness

Method and apparatus to anneal EUV mask blank

Patents Applicationslast 30 patents

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

MULTILAYER EXTREME ULTRAVIOLET REFLECTORS

MULTILAYER EXTREME ULTRAVIOLET REFLECTOR MATERIALS

MULTILAYER EXTREME ULTRAVIOLET REFLECTORS

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Surface Topography Measurement Apparatus And Method

Extreme Ultraviolet Mask Blank Structure

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Graded Interface In Bragg Reflector

Extreme Ultraviolet Mask Absorber Materials

Multi-Chamber Substrate Processing Platform

METHOD AND APPARATUS TO IMPROVE EUV MASK BLANK FLATNESS

Process Kit Conditioning Chamber

EUV Mask Blank Absorber Defect Reduction

METHOD AND APPARATUS TO ANNEAL EUV MASK BLANK

Surface Topography Measurement Apparatus And Method

Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Ma...

DEPOSITION SYSTEM WITH A MULTI-CATHODE

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

PHYSICAL VAPOR DEPOSITION SYSTEM AND PROCESSES

Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method...

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

System and Method to Measure Refractive Index at Specific Wavelengths

System and Method of Measuring Refractive Index of EUV Mask Absorber

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Extreme Ultraviolet Mask Blank Defect Reduction

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Extreme Ultraviolet Mask Absorber Materials

Physical Vapor Deposition Processing Systems Target Cooling

Extreme Ultraviolet Mask Blank Hard Mask Materials