Victor Nguyen

Person

Novato, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-aligned double patterning with spatial atomic layer deposition
- Patent number 11,164,753
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of films comprising silicon, carbon and nit...
- Patent number 11,028,478
- Issue date Jun 8, 2021
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature silicon oxide atomic layer deposition technology
- Patent number 10,170,298
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Wenbo Yan
- G05 - CONTROLLING REGULATING
Information Patent Grant
Atomic layer deposition of films comprising silicon, carbon and nit...
- Patent number 10,023,958
- Issue date Jul 17, 2018
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PEALD of films comprising silicon nitride
- Patent number 9,984,868
- Issue date May 29, 2018
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature silicon oxide atomic layer deposition technology
- Patent number 9,875,888
- Issue date Jan 23, 2018
- Applied Materials, Inc.
- Wenbo Yan
- G05 - CONTROLLING REGULATING
Information Patent Grant
Accurate film thickness control in gap-fill technology
- Patent number 9,297,073
- Issue date Mar 29, 2016
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper oxide removal techniques
- Patent number 8,758,638
- Issue date Jun 24, 2014
- Applied Materials, Inc.
- Weifeng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-enhanced chemical vapor deposition of crystalline germanium
- Patent number 8,598,020
- Issue date Dec 3, 2013
- Applied Materials, Inc.
- Victor Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature plasma enhanced chemical vapor deposition of confor...
- Patent number 8,586,487
- Issue date Nov 19, 2013
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing boron-rich films for lithographic mask applic...
- Patent number 8,337,950
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron nitride and boron-nitride derived materials deposition method
- Patent number 8,148,269
- Issue date Apr 3, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase silicon nitride tensile stress using nitrogen pl...
- Patent number 8,138,104
- Issue date Mar 20, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing boron nitride and boron nitride-derived materials
- Patent number 8,084,105
- Issue date Dec 27, 2011
- Applied Materials, Inc.
- Jeong-Uk Huh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for forming at least one dielectric layer
- Patent number 7,871,926
- Issue date Jan 18, 2011
- Applied Materials, Inc.
- Li-Qun Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase the compressive stress of PECVD dielectric films
- Patent number 7,790,635
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Self-Aligned Double Patterning With Spatial Atomic Layer Deposition
- Publication number 20220059362
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic Layer Deposition Of Films Comprising Silicon, Carbon And Nit...
- Publication number 20180291505
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature Silicon Oxide Atomic Layer Deposition Technology
- Publication number 20180076023
- Publication date Mar 15, 2018
- Applied Materials, Inc.
- Wenbo Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Temperature Silicon Oxide Atomic Layer Deposition Technology
- Publication number 20160099143
- Publication date Apr 7, 2016
- Applied Materials, Inc.
- Wenbo Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACCURATE FILM THICKNESS CONTROL IN GAP-FILL TECHNOLOGY
- Publication number 20150299856
- Publication date Oct 22, 2015
- Applied Materials, Inc.
- Ning LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU CARBON AND OXIDE DOPING OF ATOMIC LAYER DEPOSITION SILICON...
- Publication number 20150252477
- Publication date Sep 10, 2015
- Applied Materials, Inc.
- Victor NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAMLESS GAP-FILL WITH SPATIAL ATOMIC LAYER DEPOSITION
- Publication number 20150255324
- Publication date Sep 10, 2015
- Applied Materials, Inc.
- Ning LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned Double Patterning With Spatial Atomic Layer Deposition
- Publication number 20150200110
- Publication date Jul 16, 2015
- Applied Materials, Inc.
- Ning Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Deposition Of Films Comprising Silicon, Carbon And Nit...
- Publication number 20150147484
- Publication date May 28, 2015
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post-Deposition Treatment Methods For Silicon Nitride
- Publication number 20140273530
- Publication date Sep 18, 2014
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VBD AND TDDB IMPROVEMENT THRU INTERFACE ENGINEERING
- Publication number 20140273516
- Publication date Sep 18, 2014
- Li-Qun XIA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Of Silicon-Containing Films
- Publication number 20140273524
- Publication date Sep 18, 2014
- Victor Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEALD of Films Comprising Silicon Nitride
- Publication number 20140273529
- Publication date Sep 18, 2014
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method And Apparatus For Low Temperature ALD Deposition
- Publication number 20140023794
- Publication date Jan 23, 2014
- Maitreyee Mahajani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CONFOR...
- Publication number 20130183835
- Publication date Jul 18, 2013
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COPPER OXIDE REMOVAL TECHNIQUES
- Publication number 20120289049
- Publication date Nov 15, 2012
- Applied Materials, Inc.
- WEIFENG YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...
- Publication number 20120196450
- Publication date Aug 2, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CRYSTALLINE GERMANIUM
- Publication number 20110315992
- Publication date Dec 29, 2011
- Applied Materials, Inc.
- Victor T. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENGINEERING BORON-RICH FILMS FOR LITHOGRAPHIC MASK APPLICATIONS
- Publication number 20100233633
- Publication date Sep 16, 2010
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BORON NITRIDE AND BORON-NITRIDE DERIVED MATERIALS DEPOSITION METHOD
- Publication number 20090263972
- Publication date Oct 22, 2009
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Forming at Least One Dielectric Layer
- Publication number 20090104764
- Publication date Apr 23, 2009
- Applied Materials, Inc.
- Li-Qun Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON NITRIDE AND BORON NITRIDE-DERIVED MATERIALS DEPOSITION METHOD
- Publication number 20080292798
- Publication date Nov 27, 2008
- Jeong-Uk Huh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO INCREASE THE COMPRESSIVE STRESS OF PECVD DIELECTRIC FILMS
- Publication number 20080146007
- Publication date Jun 19, 2008
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...
- Publication number 20080020591
- Publication date Jan 24, 2008
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Victor Nguyen

Person

Patents Grantslast 30 patents

Self-aligned double patterning with spatial atomic layer deposition

Atomic layer deposition of films comprising silicon, carbon and nit...

High temperature silicon oxide atomic layer deposition technology

Atomic layer deposition of films comprising silicon, carbon and nit...

PEALD of films comprising silicon nitride

High temperature silicon oxide atomic layer deposition technology

Accurate film thickness control in gap-fill technology

Copper oxide removal techniques

Plasma-enhanced chemical vapor deposition of crystalline germanium

Low temperature plasma enhanced chemical vapor deposition of confor...

Method for depositing boron-rich films for lithographic mask applic...

Boron nitride and boron-nitride derived materials deposition method

Method to increase silicon nitride tensile stress using nitrogen pl...

Method of depositing boron nitride and boron nitride-derived materials

Methods and systems for forming at least one dielectric layer

Method to increase the compressive stress of PECVD dielectric films

Patents Applicationslast 30 patents

Self-Aligned Double Patterning With Spatial Atomic Layer Deposition

Atomic Layer Deposition Of Films Comprising Silicon, Carbon And Nit...

High Temperature Silicon Oxide Atomic Layer Deposition Technology

High Temperature Silicon Oxide Atomic Layer Deposition Technology

ACCURATE FILM THICKNESS CONTROL IN GAP-FILL TECHNOLOGY

IN-SITU CARBON AND OXIDE DOPING OF ATOMIC LAYER DEPOSITION SILICON...

SEAMLESS GAP-FILL WITH SPATIAL ATOMIC LAYER DEPOSITION

Self-Aligned Double Patterning With Spatial Atomic Layer Deposition

Atomic Layer Deposition Of Films Comprising Silicon, Carbon And Nit...

Post-Deposition Treatment Methods For Silicon Nitride

VBD AND TDDB IMPROVEMENT THRU INTERFACE ENGINEERING

Plasma Doping Of Silicon-Containing Films

PEALD of Films Comprising Silicon Nitride

Method And Apparatus For Low Temperature ALD Deposition

LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CONFOR...

COPPER OXIDE REMOVAL TECHNIQUES

METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CRYSTALLINE GERMANIUM

ENGINEERING BORON-RICH FILMS FOR LITHOGRAPHIC MASK APPLICATIONS

BORON NITRIDE AND BORON-NITRIDE DERIVED MATERIALS DEPOSITION METHOD

Methods and Systems for Forming at Least One Dielectric Layer

BORON NITRIDE AND BORON NITRIDE-DERIVED MATERIALS DEPOSITION METHOD

METHOD TO INCREASE THE COMPRESSIVE STRESS OF PECVD DIELECTRIC FILMS

METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...