Vijay Matthew Vaniapura

Person

Tracy, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Post etch defluorination process
- Patent number 12,148,608
- Issue date Nov 19, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Vijay Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high aspect ratio photoresist removal in pure reducing p...
- Patent number 11,107,693
- Issue date Aug 31, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment of substrates using passivation layers
- Patent number 11,094,528
- Issue date Aug 17, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Tongchuan Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strip process for high aspect ratio structure
- Patent number 10,901,321
- Issue date Jan 26, 2021
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post etch defluorination process
- Patent number 10,872,761
- Issue date Dec 22, 2020
- Mattson Technology Inc.
- Vijay Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strip process for high aspect ratio structure
- Patent number 10,599,039
- Issue date Mar 24, 2020
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Grant
Method for high aspect ratio photoresist removal in pure reducing p...
- Patent number 10,431,469
- Issue date Oct 1, 2019
- Mattson Technology, Inc.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment of substrates using passivation layers
- Patent number 10,217,626
- Issue date Feb 26, 2019
- Mattson Technology, Inc.
- Tongchuan Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Implanted photoresist stripping process
- Patent number 10,078,266
- Issue date Sep 18, 2018
- Mattson Technology, Inc.
- Wei-Hua Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask removal process strategy for vertical NAND device
- Patent number 9,396,963
- Issue date Jul 19, 2016
- Mattson Technology
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Post Etch Defluorination Process
- Publication number 20210111017
- Publication date Apr 15, 2021
- Mattson Technology, Inc.
- Vijay Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Strip Process for High Aspect Ratio Structure
- Publication number 20200218158
- Publication date Jul 9, 2020
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Application
Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask
- Publication number 20200135554
- Publication date Apr 30, 2020
- Mattson Technology, Inc.
- Li Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for High Aspect Ratio Photoresist Removal in Pure Reducing P...
- Publication number 20200098576
- Publication date Mar 26, 2020
- Mattson Technology, Inc.
- Li Diao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post Etch Defluorination Process
- Publication number 20190393027
- Publication date Dec 26, 2019
- Mattson Technology, Inc.
- Vijay Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Treatment of Substrates Using Passivation Layers
- Publication number 20190189420
- Publication date Jun 20, 2019
- Mattson Technology, Inc.
- Tongchuan Gao
- B08 - CLEANING
Information Patent Application
Strip Process for High Aspect Ratio Structure
- Publication number 20180074409
- Publication date Mar 15, 2018
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING
Information Patent Application
Separation Grid for Plasma Chamber
- Publication number 20180053628
- Publication date Feb 22, 2018
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Implanted Photoresist Stripping Process
- Publication number 20170248849
- Publication date Aug 31, 2017
- Mattson Technology, Inc.
- Wei-Hua Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Pattern Separation Grid for Plasma Chamber
- Publication number 20170207077
- Publication date Jul 20, 2017
- Mattson Technology, Inc.
- Vladimir Nagorny
- B08 - CLEANING
Information Patent Application
Method for High Aspect Ratio Photoresist Removal in Pure Reducing P...
- Publication number 20150144155
- Publication date May 28, 2015
- Mattson Technology, Inc.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel Mask Removal Process Strategy for Vertical NAND Device
- Publication number 20150126035
- Publication date May 7, 2015
- Mattson Technology, Inc.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS

Vijay Matthew Vaniapura

Person

Patents Grantslast 30 patents

Post etch defluorination process

Method for high aspect ratio photoresist removal in pure reducing p...

Surface treatment of substrates using passivation layers

Strip process for high aspect ratio structure

Post etch defluorination process

Strip process for high aspect ratio structure

Method for high aspect ratio photoresist removal in pure reducing p...

Surface treatment of substrates using passivation layers

Implanted photoresist stripping process

Mask removal process strategy for vertical NAND device

Patents Applicationslast 30 patents

Post Etch Defluorination Process

Strip Process for High Aspect Ratio Structure

Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask

Method for High Aspect Ratio Photoresist Removal in Pure Reducing P...

Post Etch Defluorination Process

Surface Treatment of Substrates Using Passivation Layers

Strip Process for High Aspect Ratio Structure

Separation Grid for Plasma Chamber

Implanted Photoresist Stripping Process

Variable Pattern Separation Grid for Plasma Chamber

Method for High Aspect Ratio Photoresist Removal in Pure Reducing P...

Novel Mask Removal Process Strategy for Vertical NAND Device