Vijay Ramachandrarao

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Hillsboro, OR, US

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Patents Grantslast 30 patents

Information Patent Grant
Transistor, method of manufacturing same, etchant for use during ma...
- Patent number 7,776,729
- Issue date Aug 17, 2010
- Intel Corporation
- Willy Rachmady
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a porous dielectric layer and structures formed thereby
- Patent number 7,544,896
- Issue date Jun 9, 2009
- Intel Corporation
- Boyan Boyanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming a porous dielectric layer and structures formed thereby
- Patent number 7,179,755
- Issue date Feb 20, 2007
- Intel Corporation
- Boyan Boyanov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LGA SUBSTRATE AND METHOD OF MAKING SAME
- Publication number 20100276763
- Publication date Nov 4, 2010
- Willy Rachmady
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transistor, method of manufacturing same, etchant for use during ma...
- Publication number 20080128763
- Publication date Jun 5, 2008
- Willy Rachmady
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming a porous dielectric layer and structures formed thereby
- Publication number 20060145304
- Publication date Jul 6, 2006
- Boyan Boyanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming a porous dielectric layer and structures formed thereby
- Publication number 20060145305
- Publication date Jul 6, 2006
- Intel Corporation
- Boyan Boyanov
- H01 - BASIC ELECTRIC ELEMENTS