Vijayakumar C. Venugopal

Person

Hayward, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Eco-efficiency characterization tool
- Patent number 10,942,507
- Issue date Mar 9, 2021
- Applied Materials, Inc.
- Mark Robert Denome
- G05 - CONTROLLING REGULATING
Information Patent Grant
Processing chamber hardware fault detection using spectral radio fr...
- Patent number 10,553,397
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Sathyendra K. Ghantasala
- G01 - MEASURING TESTING
Information Patent Grant
Gas panel apparatus and method for reducing exhaust requirements
- Patent number 10,460,960
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Ashish Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber hardware fault detection using spectral radio fr...
- Patent number 10,283,320
- Issue date May 7, 2019
- Applied Materials, Inc.
- Sathyendra K. Ghantasala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eco-efficiency characterization tool
- Patent number 10,185,313
- Issue date Jan 22, 2019
- Applied Materials, Inc.
- Mark Robert Denome
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Apparatus and method for efficient materials use during substrate p...
- Patent number 9,589,769
- Issue date Mar 7, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Vijayakumar C. Venugopal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic fault detection and classification in a plasma processing...
- Patent number 8,989,888
- Issue date Mar 24, 2015
- Lam Research Corporation
- Gunsu Yun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Arrangement for identifying uncontrolled events at the process modu...
- Patent number 8,983,631
- Issue date Mar 17, 2015
- Lam Research Corporation
- Chung Ho Huang
- G05 - CONTROLLING REGULATING
Information Patent Grant
Determining plasma processing system readiness without generating p...
- Patent number 8,650,002
- Issue date Feb 11, 2014
- Lam Research Corporation
- Brian Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement for identifying uncontrolled events at the process modu...
- Patent number 8,618,807
- Issue date Dec 31, 2013
- Lam Research Corporation
- Luc Albarede
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods for constructing an optimal endpoint algorithm
- Patent number 8,538,572
- Issue date Sep 17, 2013
- Lam Research Corporation
- Jiangxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for predictive preventive maintenance of proc...
- Patent number 8,473,089
- Issue date Jun 25, 2013
- Lam Research Corporation
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for normalizing optical emission spectra
- Patent number 8,358,416
- Issue date Jan 22, 2013
- Lam Research Corporation
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus to predict etch rate uniformity for qualifica...
- Patent number 8,295,966
- Issue date Oct 23, 2012
- Lam Research Corporation
- Brian D Choi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and arrangements for in-situ process monitoring and control...
- Patent number 8,271,121
- Issue date Sep 18, 2012
- Lam Research Corporation
- Vijayakumar C. Venugopal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for normalizing optical emission spectra
- Patent number 8,144,328
- Issue date Mar 27, 2012
- Lam Research Corporation
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Grant
Collimator arrangements including multiple collimators and implemen...
- Patent number 7,907,260
- Issue date Mar 15, 2011
- Lam Research Corporation
- Vijayakumar C. Venugopal
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Process endpoint detection method using broadband reflectometry
- Patent number 7,531,369
- Issue date May 12, 2009
- Lam Research Corporation
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Grant
Method for controlling a recess etch process
- Patent number 7,399,711
- Issue date Jul 15, 2008
- Lam Research Corporation
- Andrew J. Perry
- G01 - MEASURING TESTING
Information Patent Grant
Method for in-situ monitoring of patterned substrate processing usi...
- Patent number 7,019,844
- Issue date Mar 28, 2006
- Lam Research Corporation
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Grant
Process endpoint detection method using broadband reflectometry
- Patent number 6,979,578
- Issue date Dec 27, 2005
- Lam Research Corporation
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for controlling etch depth
- Patent number 6,939,811
- Issue date Sep 6, 2005
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING CHAMBER HARDWARE FAULT DETECTION USING SPECTRAL RADIO FR...
- Publication number 20190221401
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- Sathyendra K. Ghantasala
- G01 - MEASURING TESTING
Information Patent Application
ECO-EFFICIENCY CHARACTERIZATION TOOL
- Publication number 20190155265
- Publication date May 23, 2019
- Applied Materials, Inc.
- Mark Robert DENOME
- G05 - CONTROLLING REGULATING
Information Patent Application
PROCESSING CHAMBER HARDWARE FAULT DETECTION USING SPECTRAL RADIO FR...
- Publication number 20180138015
- Publication date May 17, 2018
- Applied Materials, Inc.
- Sathyendra K. Ghantasala
- G01 - MEASURING TESTING
Information Patent Application
GAS PANEL APPARATUS AND METHOD FOR REDUCING EXHAUST REQUIREMENTS
- Publication number 20170322568
- Publication date Nov 9, 2017
- Applied Materials, Inc.
- ASHISH KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ECO-EFFICIENCY CHARACTERIZATION TOOL
- Publication number 20170308071
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Mark Robert DENOME
- G05 - CONTROLLING REGULATING
Information Patent Application
APPARATUS AND METHOD FOR EFFICIENT MATERIALS USE DURING SUBSTRATE P...
- Publication number 20160013030
- Publication date Jan 14, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Vijayakumar C. Venugopal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR NORMALIZING OPTICAL EMISSION SPECTRA
- Publication number 20120170039
- Publication date Jul 5, 2012
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Application
AUTOMATIC FAULT DETECTION AND CLASSIFICATION IN A PLASMA PROCESSING...
- Publication number 20120101622
- Publication date Apr 26, 2012
- Gunsu Yun
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND ARRANGEMENTS FOR IN-SITU PROCESS MONITORING AND CONTROL...
- Publication number 20100332011
- Publication date Dec 30, 2010
- Vijayakumar C. Venugopal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODU...
- Publication number 20100332012
- Publication date Dec 30, 2010
- Chung-Ho Huang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS TO PREDICT ETCH RATE UNIFORMITY FOR QUALIFICA...
- Publication number 20100332013
- Publication date Dec 30, 2010
- Brian D. Choi
- G05 - CONTROLLING REGULATING
Information Patent Application
ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODU...
- Publication number 20100332014
- Publication date Dec 30, 2010
- Luc Albarede
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS AND APPARATUS FOR PREDICTIVE PREVENTIVE MAINTENANCE OF PROC...
- Publication number 20100332201
- Publication date Dec 30, 2010
- Luc Albarede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING PLASMA PROCESSING SYSTEM READINESS WITHOUT GENERATING P...
- Publication number 20100332168
- Publication date Dec 30, 2010
- Brian Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR CONSTRUCTING AN OPTIMAL ENDPOINT ALGORITHM
- Publication number 20100330710
- Publication date Dec 30, 2010
- Jiangxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEASONING PLASMA PROCESSING SYSTEMS
- Publication number 20100332010
- Publication date Dec 30, 2010
- Brian Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR NORMALIZING OPTICAL EMISSION SPECTRA
- Publication number 20090251700
- Publication date Oct 8, 2009
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR A HIGHLY COLLIMATED LIGHT COLLECTION ARRA...
- Publication number 20090002836
- Publication date Jan 1, 2009
- Vijayakumar C. Venugopal
- G02 - OPTICS
Information Patent Application
Process endpoint detection method using broadband reflectometry
- Publication number 20060035395
- Publication date Feb 16, 2006
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Application
Method for controlling a recess etch process
- Publication number 20040087041
- Publication date May 6, 2004
- Andrew J. Perry
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for controlling etch depth
- Publication number 20040084406
- Publication date May 6, 2004
- Lam Research Corporation
- Tom A. Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for in-situ monitoring of patterned substrate processing usi...
- Publication number 20040032592
- Publication date Feb 19, 2004
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING
Information Patent Application
Process endpoint detection method using broadband reflectometry
- Publication number 20040032593
- Publication date Feb 19, 2004
- LAM RESEARCH CORPORATION
- Vijayakumar C. Venugopal
- G01 - MEASURING TESTING

Vijayakumar C. Venugopal

Person

Patents Grantslast 30 patents

Eco-efficiency characterization tool

Processing chamber hardware fault detection using spectral radio fr...

Gas panel apparatus and method for reducing exhaust requirements

Processing chamber hardware fault detection using spectral radio fr...

Eco-efficiency characterization tool

Apparatus and method for efficient materials use during substrate p...

Automatic fault detection and classification in a plasma processing...

Arrangement for identifying uncontrolled events at the process modu...

Determining plasma processing system readiness without generating p...

Arrangement for identifying uncontrolled events at the process modu...

Methods for constructing an optimal endpoint algorithm

Methods and apparatus for predictive preventive maintenance of proc...

Methods and apparatus for normalizing optical emission spectra

Methods and apparatus to predict etch rate uniformity for qualifica...

Methods and arrangements for in-situ process monitoring and control...

Methods and apparatus for normalizing optical emission spectra

Collimator arrangements including multiple collimators and implemen...

Process endpoint detection method using broadband reflectometry

Method for controlling a recess etch process

Method for in-situ monitoring of patterned substrate processing usi...

Process endpoint detection method using broadband reflectometry

Apparatus and method for controlling etch depth

Patents Applicationslast 30 patents

PROCESSING CHAMBER HARDWARE FAULT DETECTION USING SPECTRAL RADIO FR...

ECO-EFFICIENCY CHARACTERIZATION TOOL

PROCESSING CHAMBER HARDWARE FAULT DETECTION USING SPECTRAL RADIO FR...

GAS PANEL APPARATUS AND METHOD FOR REDUCING EXHAUST REQUIREMENTS

ECO-EFFICIENCY CHARACTERIZATION TOOL

APPARATUS AND METHOD FOR EFFICIENT MATERIALS USE DURING SUBSTRATE P...

METHODS AND APPARATUS FOR NORMALIZING OPTICAL EMISSION SPECTRA

AUTOMATIC FAULT DETECTION AND CLASSIFICATION IN A PLASMA PROCESSING...

METHODS AND ARRANGEMENTS FOR IN-SITU PROCESS MONITORING AND CONTROL...

ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODU...

METHODS AND APPARATUS TO PREDICT ETCH RATE UNIFORMITY FOR QUALIFICA...

ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODU...

METHODS AND APPARATUS FOR PREDICTIVE PREVENTIVE MAINTENANCE OF PROC...

DETERMINING PLASMA PROCESSING SYSTEM READINESS WITHOUT GENERATING P...

METHODS FOR CONSTRUCTING AN OPTIMAL ENDPOINT ALGORITHM

SEASONING PLASMA PROCESSING SYSTEMS

METHODS AND APPARATUS FOR NORMALIZING OPTICAL EMISSION SPECTRA

METHODS AND APPARATUS FOR A HIGHLY COLLIMATED LIGHT COLLECTION ARRA...

Process endpoint detection method using broadband reflectometry

Method for controlling a recess etch process

Apparatus and method for controlling etch depth

Method for in-situ monitoring of patterned substrate processing usi...

Process endpoint detection method using broadband reflectometry