Vinayak Vishwanath Hassan

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Stress treatments for cover wafers
- Patent number 12,142,468
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- B24 - GRINDING POLISHING
Information Patent Grant
Methods of seasoning process chambers
- Patent number 11,996,273
- Issue date May 28, 2024
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 11,721,545
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote capacitively coupled plasma source with improved ion blocker
- Patent number 11,069,514
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Vivek B Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask blank production system with thin absorber...
- Patent number 10,551,732
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask blank production system with thin absorber...
- Patent number 10,197,907
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Planarized extreme ultraviolet lithography blank with absorber and...
- Patent number 10,012,897
- Issue date Jul 3, 2018
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet reflective element with multilayer stack and me...
- Patent number 10,012,908
- Issue date Jul 3, 2018
- Applied Materials, Inc.
- Ralf Hofmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet reflective element with amorphous layers and me...
- Patent number 9,690,016
- Issue date Jun 27, 2017
- Applied Materials, Inc.
- Ralf Hofmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet mask blank production system with thin absorber...
- Patent number 9,612,522
- Issue date Apr 4, 2017
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extreme ultraviolet reflective element with multilayer stack and me...
- Patent number 9,581,890
- Issue date Feb 28, 2017
- Applied Materials, Inc.
- Ralf Hofmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Planarized extreme ultraviolet lithography blank with absorber and...
- Patent number 9,581,889
- Issue date Feb 28, 2017
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
STRESS TREATMENTS FOR COVER WAFERS
- Publication number 20230069395
- Publication date Mar 2, 2023
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CFX LAYER TO PROTECT ALUMINUM SURFACE FROM OVER-OXIDATION
- Publication number 20220178017
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Anup Kumar SINGH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON CVD DEPOSITION METHODS TO MITIGATE STRESS INDUCED DEFECTS
- Publication number 20220178026
- Publication date Jun 9, 2022
- Applied Materials, Inc.
- Vinayak Vishwanath HASSAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF SEASONING PROCESS CHAMBERS
- Publication number 20220122821
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Vinayak Vishwanath HASSAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER
- Publication number 20220102141
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Anup Kumar SINGH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION
- Publication number 20220064797
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Akshay DHANAKSHIRUR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Remote Capacitively Coupled Plasma Source with Improved Ion Blocker
- Publication number 20210351020
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Vivek B. Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask Blank Production System With Thin Absorber...
- Publication number 20200058213
- Publication date Feb 20, 2020
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Remote Capacitively Coupled Plasma Source With Improved Ion Blocker
- Publication number 20200035467
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Vivek B. Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask Blank Production System With Thin Absorber...
- Publication number 20190130731
- Publication date May 2, 2019
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Extreme Ultraviolet Mask Blank Production System With Thin Absorber...
- Publication number 20170160632
- Publication date Jun 8, 2017
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Reflective Element With Multilayer Stack And Me...
- Publication number 20170131637
- Publication date May 11, 2017
- Applied Materials, Inc.
- Ralf Hofmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Planarized Extreme Ultraviolet Lithography Blank With Absorber And...
- Publication number 20170131627
- Publication date May 11, 2017
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH AMORPHOUS LAYERS AND ME...
- Publication number 20160011345
- Publication date Jan 14, 2016
- Applied Materials, Inc.
- Ralf Hofmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET MASK BLANK PRODUCTION SYSTEM WITH THIN ABSORBER...
- Publication number 20160011499
- Publication date Jan 14, 2016
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLANARIZED EXTREME ULTRAVIOLET LITHOGRAPHY BLANK WITH ABSORBER AND...
- Publication number 20160011500
- Publication date Jan 14, 2016
- Applied Materials, Inc.
- Vinayak Vishwanath Hassan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH MULTILAYER STACK AND ME...
- Publication number 20160011502
- Publication date Jan 14, 2016
- Applied Materials, Inc.
- Ralf Hofmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Vinayak Vishwanath Hassan

Person

Patents Grantslast 30 patents

Stress treatments for cover wafers

Methods of seasoning process chambers

Method of using dual frequency RF power in a process chamber

Remote capacitively coupled plasma source with improved ion blocker

Extreme ultraviolet mask blank production system with thin absorber...

Extreme ultraviolet mask blank production system with thin absorber...

Planarized extreme ultraviolet lithography blank with absorber and...

Extreme ultraviolet reflective element with multilayer stack and me...

Extreme ultraviolet reflective element with amorphous layers and me...

Extreme ultraviolet mask blank production system with thin absorber...

Extreme ultraviolet reflective element with multilayer stack and me...

Planarized extreme ultraviolet lithography blank with absorber and...

Patents Applicationslast 30 patents

STRESS TREATMENTS FOR COVER WAFERS

CFX LAYER TO PROTECT ALUMINUM SURFACE FROM OVER-OXIDATION

CARBON CVD DEPOSITION METHODS TO MITIGATE STRESS INDUCED DEFECTS

METHODS OF SEASONING PROCESS CHAMBERS

METHOD OF USING DUAL FREQUENCY RF POWER IN A PROCESS CHAMBER

SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION

Remote Capacitively Coupled Plasma Source with Improved Ion Blocker

Extreme Ultraviolet Mask Blank Production System With Thin Absorber...

Remote Capacitively Coupled Plasma Source With Improved Ion Blocker

Extreme Ultraviolet Mask Blank Production System With Thin Absorber...

Extreme Ultraviolet Mask Blank Production System With Thin Absorber...

Extreme Ultraviolet Reflective Element With Multilayer Stack And Me...

Planarized Extreme Ultraviolet Lithography Blank With Absorber And...

EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH AMORPHOUS LAYERS AND ME...

EXTREME ULTRAVIOLET MASK BLANK PRODUCTION SYSTEM WITH THIN ABSORBER...

PLANARIZED EXTREME ULTRAVIOLET LITHOGRAPHY BLANK WITH ABSORBER AND...

EXTREME ULTRAVIOLET REFLECTIVE ELEMENT WITH MULTILAYER STACK AND ME...