Vincent M. OMARJEE

Person

Grenoble, FR

People

Patents Grantslast 30 patents

Information Patent Grant
Use of stable isotopes to prove authentication of manufacturing loc...
- Patent number 11,679,156
- Issue date Jun 20, 2023
- American Air Liquide, Inc.
- Tracey Jacksier
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Iodine-containing compounds for etching semiconductor structures
- Patent number 11,430,663
- Issue date Aug 30, 2022
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorocarbon molecules for high aspect ratio oxide etch
- Patent number 11,152,223
- Issue date Oct 19, 2021
- American Air Liquide, Inc.
- Curtis Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemistries for TSV/MEMS/power device etching
- Patent number 10,720,335
- Issue date Jul 21, 2020
- American Air Liquide, Inc.
- Peng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodine-containing compounds for etching semiconductor structures
- Patent number 10,607,850
- Issue date Mar 31, 2020
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorocarbon molecules for high aspect ratio oxide etch
- Patent number 10,381,240
- Issue date Aug 13, 2019
- American Air Liquide, Inc.
- Curtis Anderson
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemistries for TSV/MEMS/power device etching
- Patent number 10,103,031
- Issue date Oct 16, 2018
- L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude
- Peng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemistries for TSV/MEMS/power device etching
- Patent number 9,892,932
- Issue date Feb 13, 2018
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Peng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bis-ketoiminate copper precursors for deposition of copper-containi...
- Patent number 9,121,093
- Issue date Sep 1, 2015
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitridation of atomic layer deposited high-k dielectrics using tris...
- Patent number 9,064,694
- Issue date Jun 23, 2015
- Tokyo Electron Limited
- Steven P Consiglio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hafnium- and zirconium-containing precursors and methods of using t...
- Patent number 9,045,509
- Issue date Jun 2, 2015
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of making and deposition methods using hafnium- or zirconiu...
- Patent number 8,765,220
- Issue date Jul 1, 2014
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
THE USE OF STABLE ISOTOPES TO PROVE AUTHENTICATION OF MANUFACTURING...
- Publication number 20220296717
- Publication date Sep 22, 2022
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Tracey JACKSIER
- G01 - MEASURING TESTING
Information Patent Application
IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20200203174
- Publication date Jun 25, 2020
- American Air Liquide, Inc.
- Vijay Surla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH
- Publication number 20190326129
- Publication date Oct 24, 2019
- American Air Liquide, Inc.
- Curtis ANDERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING
- Publication number 20180366336
- Publication date Dec 20, 2018
- American Air Liquide, Inc.
- Peng SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING
- Publication number 20180076046
- Publication date Mar 15, 2018
- American Air Liquide, Inc.
- Peng SHEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING
- Publication number 20170103901
- Publication date Apr 13, 2017
- American Air Liquide, Inc.
- Peng SHEN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH
- Publication number 20170032976
- Publication date Feb 2, 2017
- American Air Liquide, Inc.
- Curtis ANDERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDATION OF ATOMIC LAYER DEPOSITED HIGH-K DIELECTRICS USING TRIS...
- Publication number 20140017907
- Publication date Jan 16, 2014
- Steven P. Consiglio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL FILM DEPOSITION
- Publication number 20130202794
- Publication date Aug 8, 2013
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH CARBON CONTENT MOLECULES FOR AMORPHOUS CARBON DEPOSITION
- Publication number 20130109198
- Publication date May 2, 2013
- American Air Liquide, Inc.
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED DEPOSITION OF MANGANESE-CONTAINING FILMS FOR VARIOU...
- Publication number 20130089679
- Publication date Apr 11, 2013
- L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEO...
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED DEPOSITION OF NICKEL-CONTAINING FILMS FOR VARIOUS A...
- Publication number 20130089678
- Publication date Apr 11, 2013
- American Air Liquide, Inc.
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED DEPOSITION OF TITANIUM-CONTAINING FILMS FOR VARIOUS...
- Publication number 20130089681
- Publication date Apr 11, 2013
- American Air Liquide, Inc.
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED DEPOSITION OF RUTHENIUM-CONTAINING FILMS FOR VARIOU...
- Publication number 20130089680
- Publication date Apr 11, 2013
- American Air Liquide, Inc.
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILANE BLEND FOR THIN FILM VAPOR DEPOSITION
- Publication number 20130022745
- Publication date Jan 24, 2013
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIS-KETOIMINATE COPPER PRECURSORS FOR DEPOSITION OF COPPER-CONTAINI...
- Publication number 20120321817
- Publication date Dec 20, 2012
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ASHING COMPOUNDS AND METHODS OF USE
- Publication number 20120227762
- Publication date Sep 13, 2012
- American Air Liquide, Inc.
- Christian Dussarrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF MAKING AND DEPOSITION METHODS USING HAFNIUM- OR ZIRCONIU...
- Publication number 20120207928
- Publication date Aug 16, 2012
- American Air Liquide, Inc.
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HAFNIUM- AND ZIRCONIUM-CONTAINING PRECURSORS AND METHODS OF USING T...
- Publication number 20120207927
- Publication date Aug 16, 2012
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Vincent M. OMARJEE

Person

Patents Grantslast 30 patents

Use of stable isotopes to prove authentication of manufacturing loc...

Iodine-containing compounds for etching semiconductor structures

Fluorocarbon molecules for high aspect ratio oxide etch

Chemistries for TSV/MEMS/power device etching

Iodine-containing compounds for etching semiconductor structures

Fluorocarbon molecules for high aspect ratio oxide etch

Chemistries for TSV/MEMS/power device etching

Chemistries for TSV/MEMS/power device etching

Bis-ketoiminate copper precursors for deposition of copper-containi...

Nitridation of atomic layer deposited high-k dielectrics using tris...

Hafnium- and zirconium-containing precursors and methods of using t...

Methods of making and deposition methods using hafnium- or zirconiu...

Patents Applicationslast 30 patents

THE USE OF STABLE ISOTOPES TO PROVE AUTHENTICATION OF MANUFACTURING...

IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES

FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH

CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING

CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING

CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING

FLUOROCARBON MOLECULES FOR HIGH ASPECT RATIO OXIDE ETCH

NITRIDATION OF ATOMIC LAYER DEPOSITED HIGH-K DIELECTRICS USING TRIS...

METAL FILM DEPOSITION

HIGH CARBON CONTENT MOLECULES FOR AMORPHOUS CARBON DEPOSITION

PLASMA-ENHANCED DEPOSITION OF MANGANESE-CONTAINING FILMS FOR VARIOU...

PLASMA-ENHANCED DEPOSITION OF NICKEL-CONTAINING FILMS FOR VARIOUS A...

PLASMA-ENHANCED DEPOSITION OF TITANIUM-CONTAINING FILMS FOR VARIOUS...

PLASMA-ENHANCED DEPOSITION OF RUTHENIUM-CONTAINING FILMS FOR VARIOU...

SILANE BLEND FOR THIN FILM VAPOR DEPOSITION

BIS-KETOIMINATE COPPER PRECURSORS FOR DEPOSITION OF COPPER-CONTAINI...

PLASMA ASHING COMPOUNDS AND METHODS OF USE

METHODS OF MAKING AND DEPOSITION METHODS USING HAFNIUM- OR ZIRCONIU...

HAFNIUM- AND ZIRCONIUM-CONTAINING PRECURSORS AND METHODS OF USING T...