Vipul Jain

Person

North Grafton, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 10,365,562
- Issue date Jul 30, 2019
- Rohm and Haas Electronic Materials LLC
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern treatment methods
- Patent number 10,133,179
- Issue date Nov 20, 2018
- Rohm and Haas Electronic Materials LLC
- Jin Wuk Sung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Block copolymers and pattern treatment compositions and methods
- Patent number 10,042,255
- Issue date Aug 7, 2018
- Dow Global Technologies LLC
- Huaxing Zhou
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of negative tone development using a copolymer multilayer el...
- Patent number 9,910,353
- Issue date Mar 6, 2018
- Dow Global Technologies LLC
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of negative tone development using a copolymer multilayer el...
- Patent number 9,910,355
- Issue date Mar 6, 2018
- Rohm and Haas Electronic Materials LLC
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions and methods for pattern treatment
- Patent number 9,703,203
- Issue date Jul 11, 2017
- Dow Global Technologies LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions and methods for pattern treatment
- Patent number 9,684,241
- Issue date Jun 20, 2017
- Dow Global Technologies LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern treatment methods
- Patent number 9,671,697
- Issue date Jun 6, 2017
- Dow Global Technologies LLC
- Huaxing Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern treatment methods
- Patent number 9,665,005
- Issue date May 30, 2017
- Dow Global Technologies LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,606,434
- Issue date Mar 28, 2017
- Rohm and Haas Electronic Materials, LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid-generating copolymer and associated photoresist compositi...
- Patent number 9,581,901
- Issue date Feb 28, 2017
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,557,642
- Issue date Jan 31, 2017
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,551,930
- Issue date Jan 24, 2017
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,527,936
- Issue date Dec 27, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators and photoresists comprising same
- Patent number 9,499,513
- Issue date Nov 22, 2016
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generator compounds and photoresists comprising same
- Patent number 9,500,947
- Issue date Nov 22, 2016
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,469,705
- Issue date Oct 18, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,470,976
- Issue date Oct 18, 2016
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 9,244,352
- Issue date Jan 26, 2016
- Rohm and Haas Electronic Materials, LLC
- Anthony Zampini
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoacid-generating copolymer and associated photoresist compositi...
- Patent number 9,229,319
- Issue date Jan 5, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer with acid-labile group, photoresist composition, coated s...
- Patent number 9,182,669
- Issue date Nov 10, 2015
- Rohm and Haas Electronic Materials LLC
- Owendi Ongayi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition, coated substrate, and method of forming el...
- Patent number 9,063,420
- Issue date Jun 23, 2015
- Rohm and Haas Electronic Materials LLC
- Matthias S. Ober
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 8,968,981
- Issue date Mar 3, 2015
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators and photoresists comprising same
- Patent number 8,945,814
- Issue date Feb 3, 2015
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Calixarene and photoresist composition comprising same
- Patent number 8,936,900
- Issue date Jan 20, 2015
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generators
- Patent number 8,932,797
- Issue date Jan 13, 2015
- Dow Global Technologies LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymerizable photoacid generators
- Patent number 8,900,792
- Issue date Dec 2, 2014
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Calixarene compound and photoresist composition comprising same
- Patent number 8,765,356
- Issue date Jul 1, 2014
- Dow Global Technologies LLC
- D. Patrick Green
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions for use with an overcoated photoresist
- Patent number 8,501,383
- Issue date Aug 6, 2013
- Rohm and Haas Electronic Materials LLC
- Anthony Zampini
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions for photolithography
- Patent number 8,455,178
- Issue date Jun 4, 2013
- Rohm and Haas Electronic Materials LLP
- Anthony Zampini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20190354015
- Publication date Nov 21, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...
- Publication number 20180031971
- Publication date Feb 1, 2018
- DOW GLOBAL TECHNOLOGIES LLC
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...
- Publication number 20180031972
- Publication date Feb 1, 2018
- DOW GLOBAL TECHNOLOGIES LLC
- Phillip D. Hustad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN TREATMENT METHODS
- Publication number 20180031975
- Publication date Feb 1, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Jin Wuk Sung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BLOCK COPOLYMERS AND PATTERN TREATMENT COMPOSITIONS AND METHODS
- Publication number 20170123316
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Huaxing Zhou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN TREATMENT METHODS
- Publication number 20160357109
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN TREATMENT METHODS
- Publication number 20160357110
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Huaxing Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS AND METHODS FOR PATTERN TREATMENT
- Publication number 20160357111
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS AND METHODS FOR PATTERN TREATMENT
- Publication number 20160357112
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
- Publication number 20160102158
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
- Publication number 20160103392
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
- Publication number 20160102157
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
- Publication number 20160103391
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20160002199
- Publication date Jan 7, 2016
- Rohm and Haas Electronic Materials, L.L.C.
- James F. Cameron
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...
- Publication number 20150177615
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...
- Publication number 20150177613
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED S...
- Publication number 20150177614
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING EL...
- Publication number 20150021289
- Publication date Jan 22, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Matthias S. OBER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS
- Publication number 20140080062
- Publication date Mar 20, 2014
- James W. THACKERAY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME
- Publication number 20140080059
- Publication date Mar 20, 2014
- Paul J. LaBEAUME
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20140080058
- Publication date Mar 20, 2014
- James F. CAMERON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY
- Publication number 20140030653
- Publication date Jan 30, 2014
- Anthony ZAMPINI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIXARENE COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME
- Publication number 20130157195
- Publication date Jun 20, 2013
- Rohm and Haas Electronic Materials L.L.C.
- D. Patrick Green
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CALIXARENE AND PHOTORESIST COMPOSITION COMPRISING SAME
- Publication number 20130078569
- Publication date Mar 28, 2013
- DOW GLOBAL TECHNOLOGIES LLC
- Vipul Jain
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20130004901
- Publication date Jan 3, 2013
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20130004893
- Publication date Jan 3, 2013
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POLYMERIZABLE PHOTOACID GENERATORS
- Publication number 20120171616
- Publication date Jul 5, 2012
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID GENERATORS
- Publication number 20120141939
- Publication date Jun 7, 2012
- James W. Thackeray
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20110033801
- Publication date Feb 10, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Anthony Zampini
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20110033800
- Publication date Feb 10, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Anthony ZAMPINI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Person

Patents Grantslast 30 patents

Coating compositions for use with an overcoated photoresist

Pattern treatment methods

Block copolymers and pattern treatment compositions and methods

Method of negative tone development using a copolymer multilayer el...

Method of negative tone development using a copolymer multilayer el...

Compositions and methods for pattern treatment

Compositions and methods for pattern treatment

Pattern treatment methods

Pattern treatment methods

Polymer comprising repeat units with photoacid-generating functiona...

Photoacid-generating copolymer and associated photoresist compositi...

Photoresist composition and associated method of forming an electro...

Photoresist composition and associated method of forming an electro...

Polymer comprising repeat units with photoacid-generating functiona...

Acid generators and photoresists comprising same

Acid generator compounds and photoresists comprising same

Polymer comprising repeat units with photoacid-generating functiona...

Photoresist composition and associated method of forming an electro...

Coating compositions for use with an overcoated photoresist

Photoacid-generating copolymer and associated photoresist compositi...

Copolymer with acid-labile group, photoresist composition, coated s...

Photoresist composition, coated substrate, and method of forming el...

Coating compositions for use with an overcoated photoresist

Acid generators and photoresists comprising same

Calixarene and photoresist composition comprising same

Photoacid generators

Polymerizable photoacid generators

Calixarene compound and photoresist composition comprising same

Coating compositions for use with an overcoated photoresist

Coating compositions for photolithography

Patents Applicationslast 30 patents

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...

METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...

PATTERN TREATMENT METHODS

BLOCK COPOLYMERS AND PATTERN TREATMENT COMPOSITIONS AND METHODS

PATTERN TREATMENT METHODS

PATTERN TREATMENT METHODS

COMPOSITIONS AND METHODS FOR PATTERN TREATMENT

COMPOSITIONS AND METHODS FOR PATTERN TREATMENT

POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...

PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...

POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...

PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...

PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...

COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED S...

PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING EL...

PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS

ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

CALIXARENE COMPOUND AND PHOTORESIST COMPOSITION COMPRISING SAME

CALIXARENE AND PHOTORESIST COMPOSITION COMPRISING SAME

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

POLYMERIZABLE PHOTOACID GENERATORS

PHOTOACID GENERATORS

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST