Vishwas Hardikar

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for cleaning and removing liquids from front a...
- Patent number 8,261,758
- Issue date Sep 11, 2012
- Novellus Systems, Inc.
- Vishwas Hardikar
- B08 - CLEANING
Information Patent Grant
Methods of multi-step electrochemical mechanical planarization of Cu
- Patent number 7,468,322
- Issue date Dec 23, 2008
- Novellus Systems, Inc.
- Vishwas Hardikar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and methods of electrochemical removal of material fro...
- Patent number 7,422,700
- Issue date Sep 9, 2008
- Novellus Systems, Inc.
- Vishwas Hardikar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing copper on a noble metal layer of a work piece
- Patent number 7,335,288
- Issue date Feb 26, 2008
- Novellus Systems, Inc.
- Vishwas V. Hardikar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post-CMP cleaning of a semiconductor work...
- Patent number 7,195,548
- Issue date Mar 27, 2007
- Novellus Systems, Inc.
- Vishwas V. Hardikar
- B08 - CLEANING
Information Patent Grant
Method and apparatus for post-CMP cleaning of a semiconductor work...
- Patent number 7,182,673
- Issue date Feb 27, 2007
- Novellus Systems, Inc.
- Vishwas V. Hardikar
- B08 - CLEANING
Information Patent Grant
Composition and method for electrodeposition of metal on a work piece
- Patent number 7,105,082
- Issue date Sep 12, 2006
- Novellus Systems, Inc.
- Vishwas Hardikar
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Methods and compositions for chemical mechanical planarization of r...
- Patent number 6,869,336
- Issue date Mar 22, 2005
- Novellus Systems, Inc.
- Vishwas V. Hardikar
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING PROCESS AND SLURRY CONTAINING SILICON...
- Publication number 20140199842
- Publication date Jul 17, 2014
- Vishwas V. Hardikar
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Apparatus and method for cleaning and removing liquids from front a...
- Publication number 20080041423
- Publication date Feb 21, 2008
- Novellus Systems, Inc.
- Vishwas Hardikar
- B08 - CLEANING
Information Patent Application
Apparatus and method for removing a liquid from a rotating substrat...
- Publication number 20060042664
- Publication date Mar 2, 2006
- Vishwas Hardikar
- B08 - CLEANING
Information Patent Application
Method and apparatus for post-CMP cleaning of a semiconductor work...
- Publication number 20050287928
- Publication date Dec 29, 2005
- Vishwas V. Hardikar
- B08 - CLEANING
Information Patent Application
Method and composition of post-CMP wetting of thin films
- Publication number 20050230354
- Publication date Oct 20, 2005
- Vishwas V. Hardikar
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND COMPOSITIONS FOR CHEMICAL MECHANICAL PLANARIZATION OF R...
- Publication number 20050064798
- Publication date Mar 24, 2005
- Vishwas V. Hardikar
- B24 - GRINDING POLISHING
Information Patent Application
Methods for depositing copper on a noble metal layer of a work piece
- Publication number 20050061679
- Publication date Mar 24, 2005
- Vishwas V. Hardikar
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for planarizing a work piece
- Publication number 20050016861
- Publication date Jan 27, 2005
- Thomas Laursen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Composition and method for electrodeposition of metal on a work piece
- Publication number 20040168928
- Publication date Sep 2, 2004
- Vishwas Hardikar
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Vishwas Hardikar

Person

Patents Grantslast 30 patents

Apparatus and method for cleaning and removing liquids from front a...

Methods of multi-step electrochemical mechanical planarization of Cu

Compositions and methods of electrochemical removal of material fro...

Methods for depositing copper on a noble metal layer of a work piece

Method and apparatus for post-CMP cleaning of a semiconductor work...

Method and apparatus for post-CMP cleaning of a semiconductor work...

Composition and method for electrodeposition of metal on a work piece

Methods and compositions for chemical mechanical planarization of r...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING PROCESS AND SLURRY CONTAINING SILICON...

Apparatus and method for cleaning and removing liquids from front a...

Apparatus and method for removing a liquid from a rotating substrat...

Method and apparatus for post-CMP cleaning of a semiconductor work...

Method and composition of post-CMP wetting of thin films

METHODS AND COMPOSITIONS FOR CHEMICAL MECHANICAL PLANARIZATION OF R...

Methods for depositing copper on a noble metal layer of a work piece

Method for planarizing a work piece

Composition and method for electrodeposition of metal on a work piece