Vladimir Kamenov

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Microlithography projection objective
- Patent number 10,281,824
- Issue date May 7, 2019
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective
- Patent number 10,042,146
- Issue date Aug 7, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface correction of mirrors with decoupling coating
- Patent number 9,921,483
- Issue date Mar 20, 2018
- Carl Zeiss SMT GmbH
- Oliver Dier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,733,395
- Issue date Aug 15, 2017
- Carl Zeiss SMT GmbH
- Vladimir Kamenov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective
- Patent number 9,726,870
- Issue date Aug 8, 2017
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective
- Patent number 9,279,969
- Issue date Mar 8, 2016
- Carl Zeiss SMT GmbH
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Microlithography projection objective
- Patent number 9,097,984
- Issue date Aug 4, 2015
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Projection objective for microlithography with stray light compensa...
- Patent number 9,063,439
- Issue date Jun 23, 2015
- Carl Zeiss SMT GmbH
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective
- Patent number 8,873,137
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Reflective mask for EUV lithography
- Patent number 8,486,590
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Vladimir Kamenov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Catadioptric projection objective
- Patent number 8,446,665
- Issue date May 21, 2013
- Carl Zeiss SMT GmbH
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 8,339,576
- Issue date Dec 25, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- G02 - OPTICS
Information Patent Grant
Method for determining intensity distribution in the image plane of...
- Patent number 7,961,297
- Issue date Jun 14, 2011
- Carl Zeiss SMS GmbH
- Joern Greif-Wuestenbecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus and method for operating the same
- Patent number 7,808,615
- Issue date Oct 5, 2010
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Method for improving the imaging properties of a projection objecti...
- Patent number 7,456,933
- Issue date Nov 25, 2008
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and photolithography tool comprising same
- Patent number 7,355,791
- Issue date Apr 8, 2008
- Carl Zeiss SMT AG
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Grant
Method of optimizing an objective with fluoride crystal lenses, and...
- Patent number 7,321,465
- Issue date Jan 22, 2008
- Carl Zeiss SMT AG
- Michael Totzeck
- G02 - OPTICS
Information Patent Grant
Method of determining lens materials for a projection exposure appa...
- Patent number 7,239,450
- Issue date Jul 3, 2007
- Carl Zeiss SMT AG
- Vladimir Kamenov
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20180373006
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20180095258
- Publication date Apr 5, 2018
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20170322343
- Publication date Nov 9, 2017
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20170192362
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20160231546
- Publication date Aug 11, 2016
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING
- Publication number 20160209750
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Oliver DIER
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20150055212
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140333913
- Publication date Nov 13, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140320955
- Publication date Oct 30, 2014
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY PROJECTION OBJECTIVE
- Publication number 20140293256
- Publication date Oct 2, 2014
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20130242279
- Publication date Sep 19, 2013
- Carl Zeiss SMT GMBH
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
REFLECTIVE MASK FOR EUV LITHOGRAPHY
- Publication number 20120320348
- Publication date Dec 20, 2012
- Carl Zeiss SMT GMBH
- Vladimir KAMENOV
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20120281196
- Publication date Nov 8, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20110222043
- Publication date Sep 15, 2011
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE
- Publication number 20110038061
- Publication date Feb 17, 2011
- Carl Zeiss SMT AG
- Alexander EPPLE
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20100079739
- Publication date Apr 1, 2010
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microlithography projection objective
- Publication number 20090115986
- Publication date May 7, 2009
- Carl Zeiss SMT AG
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
Microlithographic projection exposure apparatus
- Publication number 20080297754
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
Method for Determining Intensity Distribution in the Image Plane of...
- Publication number 20080212060
- Publication date Sep 4, 2008
- CARL ZEISS SMS GMBH
- Joern Greif-Wuestenbecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20080002167
- Publication date Jan 3, 2008
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Application
Method of determining lens materials for a projection exposure appa...
- Publication number 20070195423
- Publication date Aug 23, 2007
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
Optical system of a projection exposure apparatus
- Publication number 20060238735
- Publication date Oct 26, 2006
- Vladimir Kamenov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of determining lens materials for a projection exposure appa...
- Publication number 20060109560
- Publication date May 25, 2006
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
Method for improving the imaging properties of a projection objecti...
- Publication number 20060077371
- Publication date Apr 13, 2006
- Carl Zeiss SMT AG
- Ulrich Wegmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical system and photolithography tool comprising same
- Publication number 20060066764
- Publication date Mar 30, 2006
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
Catadioptric projection lens and method for compensating the intrin...
- Publication number 20050270659
- Publication date Dec 8, 2005
- Michael Albert
- G02 - OPTICS
Information Patent Application
Catadioptric reduction objective
- Publication number 20050190446
- Publication date Sep 1, 2005
- CARL ZEISS AMT AG
- Birgit Kuerz
- G02 - OPTICS
Information Patent Application
Method of optimizing an objective with fluoride crystal lenses, and...
- Publication number 20050180023
- Publication date Aug 18, 2005
- Michael Totzeck
- G02 - OPTICS
Information Patent Application
Catadioptric projection lens and method for compensating the intrin...
- Publication number 20040227988
- Publication date Nov 18, 2004
- Michael Albert
- G02 - OPTICS
Information Patent Application
Retardation element made from cubic crystal and an optical system t...
- Publication number 20040218271
- Publication date Nov 4, 2004
- Carl Zeiss SMT AG
- Juergen Hartmaier
- G02 - OPTICS

Vladimir Kamenov

Person

Patents Grantslast 30 patents

Microlithography projection objective

Catadioptric projection objective

Surface correction of mirrors with decoupling coating

Microlithographic projection exposure apparatus

Catadioptric projection objective

Catadioptric projection objective

Microlithography projection objective

Projection objective for microlithography with stray light compensa...

Catadioptric projection objective

Reflective mask for EUV lithography

Catadioptric projection objective

Projection objective of a microlithographic projection exposure app...

Method for determining intensity distribution in the image plane of...

Projection exposure apparatus and method for operating the same

Method for improving the imaging properties of a projection objecti...

Optical system and photolithography tool comprising same

Method of optimizing an objective with fluoride crystal lenses, and...

Method of determining lens materials for a projection exposure appa...

Patents Applicationslast 30 patents

CATADIOPTRIC PROJECTION OBJECTIVE

CATADIOPTRIC PROJECTION OBJECTIVE

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHY PROJECTION OBJECTIVE

CATADIOPTRIC PROJECTION OBJECTIVE

SURFACE CORRECTION OF MIRRORS WITH DECOUPLING COATING

CATADIOPTRIC PROJECTION OBJECTIVE

MICROLITHOGRAPHY PROJECTION OBJECTIVE

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

MICROLITHOGRAPHY PROJECTION OBJECTIVE

CATADIOPTRIC PROJECTION OBJECTIVE

REFLECTIVE MASK FOR EUV LITHOGRAPHY

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

CATADIOPTRIC PROJECTION OBJECTIVE

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

Microlithography projection objective

Microlithographic projection exposure apparatus

Method for Determining Intensity Distribution in the Image Plane of...

PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME

Method of determining lens materials for a projection exposure appa...

Optical system of a projection exposure apparatus

Method of determining lens materials for a projection exposure appa...

Method for improving the imaging properties of a projection objecti...

Optical system and photolithography tool comprising same

Catadioptric projection lens and method for compensating the intrin...

Catadioptric reduction objective

Method of optimizing an objective with fluoride crystal lenses, and...

Catadioptric projection lens and method for compensating the intrin...

Retardation element made from cubic crystal and an optical system t...