Vladimir Levinski

Person

Migdal HaEmek, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Scanning overlay metrology with high signal to noise ratio
- Patent number 12,235,588
- Issue date Feb 25, 2025
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for measurement of misregistration and ameliora...
- Patent number 12,222,199
- Issue date Feb 11, 2025
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for correction of impact of wafer tilt on misre...
- Patent number 12,170,215
- Issue date Dec 17, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design for improved target placement accuracy
- Patent number 12,140,859
- Issue date Nov 12, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Imaging overlay targets using moiré elements and rotational symmetr...
- Patent number 12,105,433
- Issue date Oct 1, 2024
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Universal metrology model
- Patent number 12,078,601
- Issue date Sep 3, 2024
- KLA Corporation
- Nireekshan K. Reddy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image pre-processing for overlay metrology using decomposition tech...
- Patent number 12,067,745
- Issue date Aug 20, 2024
- KLA Corporation
- Nireekshan K. Reddy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imaging overlay with mutually coherent oblique illumination
- Patent number 12,032,300
- Issue date Jul 9, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 12,001,148
- Issue date Jun 4, 2024
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
On-product overlay targets
- Patent number 11,967,535
- Issue date Apr 23, 2024
- KLA Corporation
- Amnon Manassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metrology with layer-specific illumination...
- Patent number 11,852,590
- Issue date Dec 26, 2023
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Moiré scatterometry overlay
- Patent number 11,841,621
- Issue date Dec 12, 2023
- KLA Corporation CA
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical near-field metrology
- Patent number 11,815,347
- Issue date Nov 14, 2023
- KLA-Tencor Corporation
- Yuri Paskover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device-like metrology targets
- Patent number 11,709,433
- Issue date Jul 25, 2023
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-Moire grating design for use in metrology
- Patent number 11,614,692
- Issue date Mar 28, 2023
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 11,592,755
- Issue date Feb 28, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
On-the-fly scatterometry overlay metrology target
- Patent number 11,378,394
- Issue date Jul 5, 2022
- KLA Corporation
- Yuri Paskover
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for providing a quality metric for improved proce...
- Patent number 11,372,340
- Issue date Jun 28, 2022
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topographic phase control for overlay measurement
- Patent number 11,314,173
- Issue date Apr 26, 2022
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Off-axis illumination overlay measurement using two-diffracted orde...
- Patent number 11,281,111
- Issue date Mar 22, 2022
- KLA-Tencor Corporation
- Yoni Shalibo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging overlay targets using Moiré elements and rotational symmetr...
- Patent number 11,256,177
- Issue date Feb 22, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Misregistration metrology by using fringe Moiré and optical Moiré e...
- Patent number 11,164,307
- Issue date Nov 2, 2021
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology targets and methods with oblique periodic structures
- Patent number 11,137,692
- Issue date Oct 5, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mitigation of inaccuracies related to grating asymmetries in scatte...
- Patent number 11,112,704
- Issue date Sep 7, 2021
- KLA-Tencor Corporation
- Ido Adam
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Parameter-stable misregistration measurement amelioration in semico...
- Patent number 11,101,153
- Issue date Aug 24, 2021
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology target for scanning metrology
- Patent number 11,073,768
- Issue date Jul 27, 2021
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION
- Publication number 20240402615
- Publication date Dec 5, 2024
- KLA Corporation
- Yaniv Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...
- Publication number 20240337952
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20240329543
- Publication date Oct 3, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
SCANNING OVERLAY METROLOGY WITH HIGH SIGNAL TO NOISE RATIO
- Publication number 20240280914
- Publication date Aug 22, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20240210841
- Publication date Jun 27, 2024
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR SUPPRESSION OF TOOL INDUCED SHIFT IN SCANNING...
- Publication number 20240167813
- Publication date May 23, 2024
- KLA Corporation
- Itay Gdor
- G01 - MEASURING TESTING
Information Patent Application
IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY
- Publication number 20240118606
- Publication date Apr 11, 2024
- KLA Corporation
- Itay GDOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE PRE-PROCESSING FOR OVERLAY METROLOGY USING DECOMPOSITION TECH...
- Publication number 20240119626
- Publication date Apr 11, 2024
- KLA Corporation
- Nireekshan K. Reddy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCATTEROMETRY OVERLAY METROLOGY WITH ORTHOGONAL FINE-PITCH SEGMENTA...
- Publication number 20240053687
- Publication date Feb 15, 2024
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20230400780
- Publication date Dec 14, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
UNIVERSAL METROLOGY MODEL
- Publication number 20230384237
- Publication date Nov 30, 2023
- KLA Corporation
- Nireekshan K. Reddy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR ISOLATION OF SPECIFIC FOURIER PUPIL FREQUENCY...
- Publication number 20230314344
- Publication date Oct 5, 2023
- Yuri Paskover
- G01 - MEASURING TESTING
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20230259040
- Publication date Aug 17, 2023
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR CORRECTION OF IMPACT OF WAFER TILT ON MISRE...
- Publication number 20230197483
- Publication date Jun 22, 2023
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY TARGET DESIGN FOR IMPROVED TARGET PLACEMENT ACCURACY
- Publication number 20230194976
- Publication date Jun 22, 2023
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOIRÉ SCATTEROMETRY OVERLAY
- Publication number 20230133640
- Publication date May 4, 2023
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and System for Providing a Quality Metric for Improved Proce...
- Publication number 20230051705
- Publication date Feb 16, 2023
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADAPTIVE MODELING MISREGISTRATION MEASUREMENT SYSTEM AND METHOD
- Publication number 20220392809
- Publication date Dec 8, 2022
- KLA Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ON-PRODUCT OVERLAY TARGETS
- Publication number 20220328365
- Publication date Oct 13, 2022
- KLA Corporation
- Amnon Manassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20220317577
- Publication date Oct 6, 2022
- KLA Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
Systems and Methods for Measurement of Misregistration and Ameliora...
- Publication number 20220307824
- Publication date Sep 29, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL METROLOGY UTILIZING SHORT-WAVE INFRARED WAVELENGTHS
- Publication number 20220291143
- Publication date Sep 15, 2022
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
DEVICE-LIKE METROLOGY TARGETS
- Publication number 20220197152
- Publication date Jun 23, 2022
- KLA-Tencor Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ON-THE-FLY SCATTEROMETRY OVERLAY METROLOGY TARGET
- Publication number 20220187062
- Publication date Jun 16, 2022
- KLA Corporation
- Yuri Paskover
- G01 - MEASURING TESTING
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20220171297
- Publication date Jun 2, 2022
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY TARGET FOR SCANNING METROLOGY
- Publication number 20210311401
- Publication date Oct 7, 2021
- KLA Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Topographic Phase Control For Overlay Measurement
- Publication number 20210255551
- Publication date Aug 19, 2021
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPROVED SELF-MOIRE GRATING DESIGN FOR USE IN METROLOGY
- Publication number 20210200106
- Publication date Jul 1, 2021
- KLA Corporation
- Vladimir Levinski
- G02 - OPTICS

Vladimir Levinski

Person

Patents Grantslast 30 patents

Scanning overlay metrology with high signal to noise ratio

Systems and methods for measurement of misregistration and ameliora...

Systems and methods for correction of impact of wafer tilt on misre...

Overlay target design for improved target placement accuracy

Optical metrology utilizing short-wave infrared wavelengths

Imaging overlay targets using moiré elements and rotational symmetr...

Targets for diffraction-based overlay error metrology

Universal metrology model

Image pre-processing for overlay metrology using decomposition tech...

Imaging overlay with mutually coherent oblique illumination

Reduction or elimination of pattern placement error in metrology me...

Enhancing performance of overlay metrology

On-product overlay targets

Systems and methods for metrology with layer-specific illumination...

Moiré scatterometry overlay

Optical near-field metrology

Device-like metrology targets

Self-Moire grating design for use in metrology

Enhancing performance of overlay metrology

Reduction or elimination of pattern placement error in metrology me...

On-the-fly scatterometry overlay metrology target

Method and system for providing a quality metric for improved proce...

Topographic phase control for overlay measurement

Off-axis illumination overlay measurement using two-diffracted orde...

Imaging overlay targets using Moiré elements and rotational symmetr...

Misregistration metrology by using fringe Moiré and optical Moiré e...

Metrology targets and methods with oblique periodic structures

Mitigation of inaccuracies related to grating asymmetries in scatte...

Parameter-stable misregistration measurement amelioration in semico...

Metrology target for scanning metrology

Patents Applicationslast 30 patents

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

SCANNING OVERLAY METROLOGY WITH HIGH SIGNAL TO NOISE RATIO

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

SYSTEM AND METHOD FOR SUPPRESSION OF TOOL INDUCED SHIFT IN SCANNING...

IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY

IMAGE PRE-PROCESSING FOR OVERLAY METROLOGY USING DECOMPOSITION TECH...

SCATTEROMETRY OVERLAY METROLOGY WITH ORTHOGONAL FINE-PITCH SEGMENTA...

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

UNIVERSAL METROLOGY MODEL

SYSTEM AND METHOD FOR ISOLATION OF SPECIFIC FOURIER PUPIL FREQUENCY...

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

SYSTEMS AND METHODS FOR CORRECTION OF IMPACT OF WAFER TILT ON MISRE...

OVERLAY TARGET DESIGN FOR IMPROVED TARGET PLACEMENT ACCURACY

MOIRÉ SCATTEROMETRY OVERLAY

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

Method and System for Providing a Quality Metric for Improved Proce...

ADAPTIVE MODELING MISREGISTRATION MEASUREMENT SYSTEM AND METHOD

ON-PRODUCT OVERLAY TARGETS

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

Systems and Methods for Measurement of Misregistration and Ameliora...

OPTICAL METROLOGY UTILIZING SHORT-WAVE INFRARED WAVELENGTHS

DEVICE-LIKE METROLOGY TARGETS

ON-THE-FLY SCATTEROMETRY OVERLAY METROLOGY TARGET

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

METROLOGY TARGET FOR SCANNING METROLOGY

Topographic Phase Control For Overlay Measurement

IMPROVED SELF-MOIRE GRATING DESIGN FOR USE IN METROLOGY