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Vladimir Levinski
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Migdal HaEmek, IL
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Patents Grants
last 30 patents
Information
Patent Grant
On-product overlay targets
Patent number
11,967,535
Issue date
Apr 23, 2024
KLA Corporation
Amnon Manassen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for metrology with layer-specific illumination...
Patent number
11,852,590
Issue date
Dec 26, 2023
KLA Corporation
Amnon Manassen
G01 - MEASURING TESTING
Information
Patent Grant
Moiré scatterometry overlay
Patent number
11,841,621
Issue date
Dec 12, 2023
KLA Corporation CA
Andrew V. Hill
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Optical near-field metrology
Patent number
11,815,347
Issue date
Nov 14, 2023
KLA-Tencor Corporation
Yuri Paskover
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Device-like metrology targets
Patent number
11,709,433
Issue date
Jul 25, 2023
KLA-Tencor Corporation
Vladimir Levinski
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Self-Moire grating design for use in metrology
Patent number
11,614,692
Issue date
Mar 28, 2023
KLA Corporation
Vladimir Levinski
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Enhancing performance of overlay metrology
Patent number
11,592,755
Issue date
Feb 28, 2023
KLA Corporation
Amnon Manassen
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Grant
Reduction or elimination of pattern placement error in metrology me...
Patent number
11,537,043
Issue date
Dec 27, 2022
KLA-Tencor Corporation
Yoel Feler
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
On-the-fly scatterometry overlay metrology target
Patent number
11,378,394
Issue date
Jul 5, 2022
KLA Corporation
Yuri Paskover
G01 - MEASURING TESTING
Information
Patent Grant
Method and system for providing a quality metric for improved proce...
Patent number
11,372,340
Issue date
Jun 28, 2022
KLA Corporation
Daniel Kandel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Topographic phase control for overlay measurement
Patent number
11,314,173
Issue date
Apr 26, 2022
KLA-Tencor Corporation
Vladimir Levinski
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Off-axis illumination overlay measurement using two-diffracted orde...
Patent number
11,281,111
Issue date
Mar 22, 2022
KLA-Tencor Corporation
Yoni Shalibo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Imaging overlay targets using Moiré elements and rotational symmetr...
Patent number
11,256,177
Issue date
Feb 22, 2022
KLA Corporation
Yoel Feler
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Misregistration metrology by using fringe Moiré and optical Moiré e...
Patent number
11,164,307
Issue date
Nov 2, 2021
KLA Corporation
Yoel Feler
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Metrology targets and methods with oblique periodic structures
Patent number
11,137,692
Issue date
Oct 5, 2021
KLA-Tencor Corporation
Yoel Feler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mitigation of inaccuracies related to grating asymmetries in scatte...
Patent number
11,112,704
Issue date
Sep 7, 2021
KLA-Tencor Corporation
Ido Adam
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Parameter-stable misregistration measurement amelioration in semico...
Patent number
11,101,153
Issue date
Aug 24, 2021
KLA Corporation
Vladimir Levinski
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metrology target for scanning metrology
Patent number
11,073,768
Issue date
Jul 27, 2021
KLA Corporation
Andrew V. Hill
G01 - MEASURING TESTING
Information
Patent Grant
Determining the impacts of stochastic behavior on overlay metrology...
Patent number
10,901,325
Issue date
Jan 26, 2021
KLA-Tencor Corporation
Evgeni Gurevich
G01 - MEASURING TESTING
Information
Patent Grant
Overlay targets with orthogonal underlayer dummyfill
Patent number
10,890,436
Issue date
Jan 12, 2021
KLA Corporation
Nuriel Amir
G01 - MEASURING TESTING
Information
Patent Grant
Estimating amplitude and phase asymmetry in imaging technology for...
Patent number
10,866,090
Issue date
Dec 15, 2020
KLA-Tencor Corporation
Tal Marciano
G01 - MEASURING TESTING
Information
Patent Grant
Estimation of asymmetric aberrations
Patent number
10,824,082
Issue date
Nov 3, 2020
KLA-Tencor Corporation
Yoel Feler
G01 - MEASURING TESTING
Information
Patent Grant
Diffraction based overlay scatterometry
Patent number
10,824,079
Issue date
Nov 3, 2020
KLA-Tencor Corporation
Yuval Lubashevsky
G01 - MEASURING TESTING
Information
Patent Grant
Diffraction-based focus metrology
Patent number
10,761,023
Issue date
Sep 1, 2020
KLA-Tencor Corporation
Vladimir Levinski
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reticle optimization algorithms and optimal target design
Patent number
10,754,261
Issue date
Aug 25, 2020
KLA-Tencor Corporation
Yoel Feler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Symmetric target design in scatterometry overlay metrology
Patent number
10,591,406
Issue date
Mar 17, 2020
KLA-Tencor Corporation
Barak Bringoltz
G01 - MEASURING TESTING
Information
Patent Grant
Process compatibility improvement by fill factor modulation
Patent number
10,579,768
Issue date
Mar 3, 2020
KLA-Tencor Corporation
Vladimir Levinski
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Utilizing overlay misregistration error estimations in imaging over...
Patent number
10,565,697
Issue date
Feb 18, 2020
KLA-Tencor Corporation
Tzahi Grunzweig
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Metrology targets with supplementary structures in an intermediate...
Patent number
10,551,749
Issue date
Feb 4, 2020
KLA-Tencor Corporation
Vladimir Levinski
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Multi-layer overlay metrology target and complimentary overlay metr...
Patent number
10,527,954
Issue date
Jan 7, 2020
KLA-Tencor Corporation
Daniel Kandel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
IMAGE PRE-PROCESSING FOR OVERLAY METROLOGY USING DECOMPOSITION TECH...
Publication number
20240119626
Publication date
Apr 11, 2024
KLA Corporation
Nireekshan K. Reddy
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY
Publication number
20240118606
Publication date
Apr 11, 2024
KLA Corporation
Itay GDOR
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SCATTEROMETRY OVERLAY METROLOGY WITH ORTHOGONAL FINE-PITCH SEGMENTA...
Publication number
20240053687
Publication date
Feb 15, 2024
KLA Corporation
Vladimir Levinski
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
Publication number
20230400780
Publication date
Dec 14, 2023
KLA Corporation
Amnon Manassen
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Application
UNIVERSAL METROLOGY MODEL
Publication number
20230384237
Publication date
Nov 30, 2023
KLA Corporation
Nireekshan K. Reddy
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SYSTEM AND METHOD FOR ISOLATION OF SPECIFIC FOURIER PUPIL FREQUENCY...
Publication number
20230314344
Publication date
Oct 5, 2023
Yuri Paskover
G01 - MEASURING TESTING
Information
Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
Publication number
20230259040
Publication date
Aug 17, 2023
Andrew V. Hill
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SYSTEMS AND METHODS FOR CORRECTION OF IMPACT OF WAFER TILT ON MISRE...
Publication number
20230197483
Publication date
Jun 22, 2023
KLA Corporation
Vladimir Levinski
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
OVERLAY TARGET DESIGN FOR IMPROVED TARGET PLACEMENT ACCURACY
Publication number
20230194976
Publication date
Jun 22, 2023
KLA Corporation
Vladimir Levinski
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MOIRÉ SCATTEROMETRY OVERLAY
Publication number
20230133640
Publication date
May 4, 2023
Andrew V. Hill
G01 - MEASURING TESTING
Information
Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
Publication number
20230099105
Publication date
Mar 30, 2023
KLA-Tencor Corporation
Yoel Feler
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
Method and System for Providing a Quality Metric for Improved Proce...
Publication number
20230051705
Publication date
Feb 16, 2023
KLA Corporation
Daniel Kandel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ADAPTIVE MODELING MISREGISTRATION MEASUREMENT SYSTEM AND METHOD
Publication number
20220392809
Publication date
Dec 8, 2022
KLA Corporation
Amnon Manassen
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
ON-PRODUCT OVERLAY TARGETS
Publication number
20220328365
Publication date
Oct 13, 2022
KLA Corporation
Amnon Manassen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
Publication number
20220317577
Publication date
Oct 6, 2022
KLA Corporation
Amnon Manassen
G02 - OPTICS
Information
Patent Application
Systems and Methods for Measurement of Misregistration and Ameliora...
Publication number
20220307824
Publication date
Sep 29, 2022
KLA Corporation
Roie Volkovich
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
OPTICAL METROLOGY UTILIZING SHORT-WAVE INFRARED WAVELENGTHS
Publication number
20220291143
Publication date
Sep 15, 2022
Amnon Manassen
G01 - MEASURING TESTING
Information
Patent Application
DEVICE-LIKE METROLOGY TARGETS
Publication number
20220197152
Publication date
Jun 23, 2022
KLA-Tencor Corporation
Vladimir Levinski
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ON-THE-FLY SCATTEROMETRY OVERLAY METROLOGY TARGET
Publication number
20220187062
Publication date
Jun 16, 2022
KLA Corporation
Yuri Paskover
G01 - MEASURING TESTING
Information
Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
Publication number
20220171297
Publication date
Jun 2, 2022
KLA Corporation
Yoel Feler
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
METROLOGY TARGET FOR SCANNING METROLOGY
Publication number
20210311401
Publication date
Oct 7, 2021
KLA Corporation
Andrew V. Hill
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Topographic Phase Control For Overlay Measurement
Publication number
20210255551
Publication date
Aug 19, 2021
KLA-Tencor Corporation
Vladimir Levinski
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
IMPROVED SELF-MOIRE GRATING DESIGN FOR USE IN METROLOGY
Publication number
20210200106
Publication date
Jul 1, 2021
KLA Corporation
Vladimir Levinski
G02 - OPTICS
Information
Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
Publication number
20210149296
Publication date
May 20, 2021
KLA-Tencor Corporation
Yoel Feler
G01 - MEASURING TESTING
Information
Patent Application
Imaging Overlay Targets Using Moire Elements and Rotational Symmetr...
Publication number
20210072650
Publication date
Mar 11, 2021
KLA Corporation
Yoel Feler
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
PARAMETER-STABLE MISREGISTRATION MEASUREMENT AMELIORATION IN SEMICO...
Publication number
20210020480
Publication date
Jan 21, 2021
KLA Corporation
Vladimir LEVINSKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Metrology Target for Scanning Metrology
Publication number
20200409271
Publication date
Dec 31, 2020
KLA Corporation
Andrew V. Hill
G01 - MEASURING TESTING
Information
Patent Application
Topographic Phase Control For Overlay Measurement
Publication number
20200142323
Publication date
May 7, 2020
KLA-Tencor Corporation
Vladimir Levinski
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
Topographic Phase Control For Overlay Measurement
Publication number
20200142322
Publication date
May 7, 2020
KLA-Tencor Corporation
Vladimir Levinski
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
Topographic Phase Control For Overlay Measurement
Publication number
20200142321
Publication date
May 7, 2020
KLA-Tencor Corporation
Vladimir Levinski
G06 - COMPUTING CALCULATING COUNTING