Volker Grimm

Person

Langebrueck, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Enhancing transistor performance by reducing exposure to oxygen pla...
- Patent number 9,318,345
- Issue date Apr 19, 2016
- GLOBALFOUNDRIES Inc.
- Ronald Naumann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shrinkage of critical dimensions in a semiconductor device by selec...
- Patent number 9,070,639
- Issue date Jun 30, 2015
- GLOBALFOUNDRIES Inc.
- Dmytro Chumakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively removing a spacer in a dual stress liner app...
- Patent number 9,006,114
- Issue date Apr 14, 2015
- Advanced Micro Devices, Inc.
- Kai Frohberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for removing resist material after high dose implantation...
- Patent number 7,816,273
- Issue date Oct 19, 2010
- Advanced Micro Devices, Inc.
- Christian Krueger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stressed interlayer dielectric with reduced probability for void ge...
- Patent number 7,763,507
- Issue date Jul 27, 2010
- GLOBALFOUNDRIES Inc.
- Ralf Richter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing resist poisoning during patterning of silicon n...
- Patent number 7,550,396
- Issue date Jun 23, 2009
- Advanced Micro Devices, Inc.
- Kai Frohberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming contact pads
- Patent number 7,166,530
- Issue date Jan 23, 2007
- Advanced Micro Devices, Inc.
- Ronald Naumann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of adjusting etch selectivity by adapting aspect ratios in a...
- Patent number 6,969,676
- Issue date Nov 29, 2005
- Advanced Micro Devices, Inc.
- Christoph Schwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a transistor having a recessed gate electrode st...
- Patent number 6,897,114
- Issue date May 24, 2005
- Advanced Micro Devices, Inc.
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Enhancing Transistor Performance by Reducing Exposure to Oxygen Pla...
- Publication number 20130089985
- Publication date Apr 11, 2013
- GLOBALFOUNDRIES INC.
- Ronald NAUMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shrinkage of Critical Dimensions in a Semiconductor Device by Selec...
- Publication number 20120244710
- Publication date Sep 27, 2012
- GLOBALFOUNDRIES Dresden Module One Limited Liability Company & Co. KG
- Dmytro Chumakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Comprising Sophisticated Conductive Elements i...
- Publication number 20110266685
- Publication date Nov 3, 2011
- GLOBALFOUNDRIES INC.
- Dmytro Chumakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY REMOVING A SPACER IN A DUAL STRESS LINER APP...
- Publication number 20090273035
- Publication date Nov 5, 2009
- Kai Frohberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRESSED INTERLAYER DIELECTRIC WITH REDUCED PROBABILITY FOR VOID GE...
- Publication number 20090140396
- Publication date Jun 4, 2009
- Ralf Richter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR REMOVING RESIST MATERIAL AFTER HIGH DOSE IMPLANTATION...
- Publication number 20080160729
- Publication date Jul 3, 2008
- Christian Krueger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REDUCING RESIST POISONING DURING PATTERNING OF SILICON N...
- Publication number 20080081480
- Publication date Apr 3, 2008
- Kai Frohberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming contact pads
- Publication number 20060141758
- Publication date Jun 29, 2006
- Ronald Naumann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of adjusting etch selectivity by adapting aspect ratios in a...
- Publication number 20040241984
- Publication date Dec 2, 2004
- Christoph Schwan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced recessed gate transistor and a method of forming the same
- Publication number 20040126965
- Publication date Jul 1, 2004
- Christian Krueger
- H01 - BASIC ELECTRIC ELEMENTS

Volker Grimm

Person

Patents Grantslast 30 patents

Enhancing transistor performance by reducing exposure to oxygen pla...

Shrinkage of critical dimensions in a semiconductor device by selec...

Method for selectively removing a spacer in a dual stress liner app...

Technique for removing resist material after high dose implantation...

Stressed interlayer dielectric with reduced probability for void ge...

Method for reducing resist poisoning during patterning of silicon n...

Method of forming contact pads

Method of adjusting etch selectivity by adapting aspect ratios in a...

Methods of forming a transistor having a recessed gate electrode st...

Patents Applicationslast 30 patents

Enhancing Transistor Performance by Reducing Exposure to Oxygen Pla...

Shrinkage of Critical Dimensions in a Semiconductor Device by Selec...

Semiconductor Device Comprising Sophisticated Conductive Elements i...

METHOD FOR SELECTIVELY REMOVING A SPACER IN A DUAL STRESS LINER APP...

STRESSED INTERLAYER DIELECTRIC WITH REDUCED PROBABILITY FOR VOID GE...

TECHNIQUE FOR REMOVING RESIST MATERIAL AFTER HIGH DOSE IMPLANTATION...

METHOD FOR REDUCING RESIST POISONING DURING PATTERNING OF SILICON N...

Method of forming contact pads

Method of adjusting etch selectivity by adapting aspect ratios in a...

Advanced recessed gate transistor and a method of forming the same