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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Positive resist composition and method for forming resist pattern
Patent number
7,858,286
Issue date
Dec 28, 2010
Tokyo Ohka Kogyo Co., Ltd.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive resist composition and resist pattern forming method
Patent number
7,781,144
Issue date
Aug 24, 2010
Tokyo Ohka Kogyo Co., Ltd.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive resist composition and method of forming resist pattern us...
Patent number
7,192,687
Issue date
Mar 20, 2007
Tokyo Ohka Kogyo Co., Ltd.
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Poly (disulfonyl diazomethane) compound and positive-working chemic...
Patent number
6,180,313
Issue date
Jan 30, 2001
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yukawa
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
(Disulfonyl diazomethane compounds)
Patent number
6,153,733
Issue date
Nov 28, 2000
Tokyo Ohka Kogyo Co., Ltd.
Hiroto Yukawa
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20090098483
Publication date
Apr 16, 2009
TOKYO OHA KOGYO CO., LTD.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20090035698
Publication date
Feb 5, 2009
Tokyo Ohka Kogyo Co., Ltd.
Yohei Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Positive resist composition and method of forming resist pattern us...
Publication number
20050079445
Publication date
Apr 14, 2005
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY