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Koza-gun, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Chemical amplification type positive resist composition, resist lam...
Patent number
7,150,956
Issue date
Dec 19, 2006
Tokyo Ohka Kogyo Co., Ltd.
Kazuyuki Nitta
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist composition of chemical amplification type, resist...
Patent number
6,921,621
Issue date
Jul 26, 2005
Tokyo Ohka Kogyo Co., Ltd.
Kazuyuki Nitta
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Photosensitive laminate, process for forming resist pattern using s...
Patent number
6,638,684
Issue date
Oct 28, 2003
Tokyo Ohka Kogyo Co., Ltd.
Waki Okubo
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
Chemical amplification type positive resist composition, resist lam...
Publication number
20050112498
Publication date
May 26, 2005
Toyko Ohka Kogyo Co., Ltd.
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist composition and method of forming resist pattern
Publication number
20050042540
Publication date
Feb 24, 2005
Tokyo Ohka Kogyo Co., Ltd.
Waki Okubo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist composition of chemical amplification type, resist...
Publication number
20030190550
Publication date
Oct 9, 2003
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photosensitive laminate, process for forming resist pattern using s...
Publication number
20020045123
Publication date
Apr 18, 2002
Waki Okubo
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC