Walter Augustyn

Person

Monroe, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method using visible and infrared light to align and mea...
- Patent number 7,365,848
- Issue date Apr 29, 2008
- ASML Holding N.V.
- Pankaj Raval
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 7,187,430
- Issue date Mar 6, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffuser plate and method of making same
- Patent number 7,164,534
- Issue date Jan 16, 2007
- ASML Holding N.V.
- Walter H. Augustyn
- G02 - OPTICS
Information Patent Grant
System and method for laser beam expansion
- Patent number 7,006,198
- Issue date Feb 28, 2006
- ASML Holding N.V.
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffuser plate and method of making same
- Patent number 7,002,747
- Issue date Feb 21, 2006
- ASML Holding N.V.
- Walter H. Augustyn
- G02 - OPTICS
Information Patent Grant
System and method for laser beam expansion
- Patent number 6,819,402
- Issue date Nov 16, 2004
- ASML Holding N.V.
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,813,003
- Issue date Nov 2, 2004
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,775,069
- Issue date Aug 10, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical phase decoder for interferometers
- Patent number 4,702,603
- Issue date Oct 27, 1987
- CMX Systems, Inc.
- Walter H. Augustyn
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
System and Method to Align and Measure Alignment Patterns on Multip...
- Publication number 20080198363
- Publication date Aug 21, 2008
- ASML Holding N.V.
- Pankaj Raval
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced Illumination System for Use in Microlithography
- Publication number 20070146674
- Publication date Jun 28, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method using visible and infrared light to align and mea...
- Publication number 20060115956
- Publication date Jun 1, 2006
- ASML Holding N.V.
- Pankaj Raval
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diffuser plate and method of making same
- Publication number 20050248743
- Publication date Nov 10, 2005
- ASML Holding N.V.
- Walter H. Augustyn
- G02 - OPTICS
Information Patent Application
System and method for laser beam expansion
- Publication number 20050083505
- Publication date Apr 21, 2005
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20040263821
- Publication date Dec 30, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diffuser plate and method of making same
- Publication number 20040136075
- Publication date Jul 15, 2004
- ASML Holding N.V.
- Walter H. Augustyn
- G02 - OPTICS
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20030227609
- Publication date Dec 11, 2003
- ASML US, Inc.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for laser beam expansion
- Publication number 20030117606
- Publication date Jun 26, 2003
- ASML US, Inc.
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20030076679
- Publication date Apr 24, 2003
- ASML US, Inc.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Walter Augustyn

Person

Patents Grantslast 30 patents

System and method using visible and infrared light to align and mea...

Advanced illumination system for use in microlithography

Diffuser plate and method of making same

System and method for laser beam expansion

Diffuser plate and method of making same

System and method for laser beam expansion

Advanced illumination system for use in microlithography

Advanced illumination system for use in microlithography

Optical phase decoder for interferometers

Patents Applicationslast 30 patents

System and Method to Align and Measure Alignment Patterns on Multip...

Advanced Illumination System for Use in Microlithography

System and method using visible and infrared light to align and mea...

Diffuser plate and method of making same

System and method for laser beam expansion

Advanced illumination system for use in microlithography

Diffuser plate and method of making same

Advanced illumination system for use in microlithography

System and method for laser beam expansion

Advanced illumination system for use in microlithography