Walter D. Mieher

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 10,451,412
- Issue date Oct 22, 2019
- KLA-Tencor Corporation
- Michael Adel
- G01 - MEASURING TESTING
Information Patent Grant
System and method for focus determination using focus-sensitive ove...
- Patent number 10,401,740
- Issue date Sep 3, 2019
- KLA-Tencor Corporation
- Walter Dean Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Signal response metrology for scatterometry based overlay measurements
- Patent number 10,352,876
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining in-plane distortions in a substrate
- Patent number 10,024,654
- Issue date Jul 17, 2018
- KLA-Tencor Corporation
- Mark D. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for measuring semiconductor device overlay us...
- Patent number 9,885,962
- Issue date Feb 6, 2018
- KLA-Tencor Corporation
- Andrei Veldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for measuring overlay errors
- Patent number 9,702,693
- Issue date Jul 11, 2017
- KLA-Tencor Corporation
- Mark Ghinovker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology with reduced sensitivity to grating anomalies
- Patent number 9,470,639
- Issue date Oct 18, 2016
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 9,347,879
- Issue date May 24, 2016
- KLA-Tencor Corporation
- Michael Adel
- G01 - MEASURING TESTING
Information Patent Grant
Methods of measuring overlay errors in area-imaging e-beam lithography
- Patent number 9,081,287
- Issue date Jul 14, 2015
- KLA-Tencor Corporation
- Walter D. Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment measurement system
- Patent number 9,030,661
- Issue date May 12, 2015
- KLA-Tencor Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Determination of training set size for a machine learning system
- Patent number 8,452,718
- Issue date May 28, 2013
- Tokyo Electron Limited
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay marks, methods of overlay mark design and methods of overla...
- Patent number 8,330,281
- Issue date Dec 11, 2012
- KLA-Tencor Technologies Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Azimuth angle measurement
- Patent number 8,040,511
- Issue date Oct 18, 2011
- KLA-Tencor Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,933,016
- Issue date Apr 26, 2011
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Overlay marks and methods of manufacturing such marks
- Patent number 7,879,627
- Issue date Feb 1, 2011
- KLA-Tencor Technologies Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,876,440
- Issue date Jan 25, 2011
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Methods for forming device structures on a wafer
- Patent number 7,867,693
- Issue date Jan 11, 2011
- KLA-Tencor Technologies Corp.
- Walter D. Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Parametric profiling using optical spectroscopic systems
- Patent number 7,826,071
- Issue date Nov 2, 2010
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,663,753
- Issue date Feb 16, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining lithographic focus and exposure
- Patent number 7,656,512
- Issue date Feb 2, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,616,313
- Issue date Nov 10, 2009
- KLA-Tencor Technologies Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,564,557
- Issue date Jul 21, 2009
- KLA-Tencor Technologies Corp.
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,433,040
- Issue date Oct 7, 2008
- KLA-Tencor Technologies Corp.
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,385,699
- Issue date Jun 10, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining lithographic focus and exposure
- Patent number 7,382,447
- Issue date Jun 3, 2008
- KLA-Tencor Technologies Corporation
- Walter Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,379,183
- Issue date May 27, 2008
- KLA-Tencor Technologies Corp.
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Method for process optimization and control by comparison between 2...
- Patent number 7,352,453
- Issue date Apr 1, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Overlay marks, methods of overlay mark design and methods of overla...
- Patent number 7,317,824
- Issue date Jan 8, 2008
- KLA-Tencor Technologies Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,317,531
- Issue date Jan 8, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for detecting overlay errors using scatterometry
- Patent number 7,301,634
- Issue date Nov 27, 2007
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20170336198
- Publication date Nov 23, 2017
- KLA-Tencor Corporation
- Michael Adel
- G01 - MEASURING TESTING
Information Patent Application
System and Method for Focus Determination Using Focus-Sensitive Ove...
- Publication number 20160334716
- Publication date Nov 17, 2016
- KLA-Tencor Corporation
- Walter Dean Mieher
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
APPARATUS FOR MEASURING OVERLAY ERRORS
- Publication number 20160313116
- Publication date Oct 27, 2016
- KLA-Tencor Corporation
- Mark Ghinovker
- G01 - MEASURING TESTING
Information Patent Application
Method and System for Determining In-Plane Distortions in a Substrate
- Publication number 20160290789
- Publication date Oct 6, 2016
- KLA-Tencor Corporation
- Mark D. Smith
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20160047744
- Publication date Feb 18, 2016
- KLA-Tencor Corporation
- Michael Adel
- G01 - MEASURING TESTING
Information Patent Application
Signal Response Metrology For Scatterometry Based Overlay Measurements
- Publication number 20150323316
- Publication date Nov 12, 2015
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY US...
- Publication number 20150117610
- Publication date Apr 30, 2015
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF MEASURING OVERLAY ERRORS IN AREA-IMAGING E-BEAM LITHOGR...
- Publication number 20140199618
- Publication date Jul 17, 2014
- KLA-Tencor Corporation
- Walter D. MIEHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and Methods for Determining One or More Characteristics of...
- Publication number 20120281275
- Publication date Nov 8, 2012
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
DETERMINATION OF TRAINING SET SIZE FOR A MACHINE LEARNING SYSTEM
- Publication number 20110307424
- Publication date Dec 15, 2011
- Wen Jin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF...
- Publication number 20100235114
- Publication date Sep 16, 2010
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20100091284
- Publication date Apr 15, 2010
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MARKS, METHODS OF OVERLAY MARK DESIGN AND METHODS OF OVERLA...
- Publication number 20090291513
- Publication date Nov 26, 2009
- KLA-Tencor Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20090284744
- Publication date Nov 19, 2009
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Parametric Profiling Using Optical Spectroscopic Systems
- Publication number 20090135416
- Publication date May 28, 2009
- KLA-Tencor Technologies Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE
- Publication number 20080192221
- Publication date Aug 14, 2008
- KLA-Tencor Technologies Corporation
- Walter Mieher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20080094630
- Publication date Apr 24, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20080049226
- Publication date Feb 28, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
- Publication number 20080024766
- Publication date Jan 31, 2008
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY MARKS, METHODS OF OVERLAY MARK DESIGN AND METHODS OF OVERLA...
- Publication number 20080023855
- Publication date Jan 31, 2008
- KLA-Tencor Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20070229829
- Publication date Oct 4, 2007
- KLA-Tencor Technologies Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Focus masking structures, focus patterns and measurements thereof
- Publication number 20070108368
- Publication date May 17, 2007
- KLA-Tencor Corporation
- Walter Dean Mieher
- B22 - CASTING POWDER METALLURGY
Information Patent Application
Overlay marks, methods of overlay mark design and methods of overla...
- Publication number 20060204073
- Publication date Sep 14, 2006
- KLA-Tencor Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Overlay marks, methods of overlay mark design and methods of overla...
- Publication number 20060177120
- Publication date Aug 10, 2006
- KLA-Tencor Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Focus masking structures, focus patterns and measurements thereof
- Publication number 20050208391
- Publication date Sep 22, 2005
- KLA-Tencor Technologies Corporation
- Walter Dean Mieher
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040257571
- Publication date Dec 23, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233442
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233443
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233439
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and methods for detecting overlay errors using scatterometry
- Publication number 20040233441
- Publication date Nov 25, 2004
- KLA-Tencor Technologies Corporation
- Walter D. Mieher
- G01 - MEASURING TESTING

Walter D. Mieher

Person

Patents Grantslast 30 patents

Apparatus and methods for detecting overlay errors using scatterometry

System and method for focus determination using focus-sensitive ove...

Signal response metrology for scatterometry based overlay measurements

Method and system for determining in-plane distortions in a substrate

Methods and apparatus for measuring semiconductor device overlay us...

Apparatus for measuring overlay errors

Optical metrology with reduced sensitivity to grating anomalies

Apparatus and methods for detecting overlay errors using scatterometry

Methods of measuring overlay errors in area-imaging e-beam lithography

Alignment measurement system

Determination of training set size for a machine learning system

Overlay marks, methods of overlay mark design and methods of overla...

Azimuth angle measurement

Apparatus and methods for detecting overlay errors using scatterometry

Overlay marks and methods of manufacturing such marks

Apparatus and methods for detecting overlay errors using scatterometry

Methods for forming device structures on a wafer

Parametric profiling using optical spectroscopic systems

Apparatus and methods for detecting overlay errors using scatterometry

Method for determining lithographic focus and exposure

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Method for determining lithographic focus and exposure

Apparatus and methods for detecting overlay errors using scatterometry

Method for process optimization and control by comparison between 2...

Overlay marks, methods of overlay mark design and methods of overla...

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Patents Applicationslast 30 patents

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

System and Method for Focus Determination Using Focus-Sensitive Ove...

APPARATUS FOR MEASURING OVERLAY ERRORS

Method and System for Determining In-Plane Distortions in a Substrate

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

Signal Response Metrology For Scatterometry Based Overlay Measurements

METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY US...

METHODS OF MEASURING OVERLAY ERRORS IN AREA-IMAGING E-BEAM LITHOGR...

Systems and Methods for Determining One or More Characteristics of...

DETERMINATION OF TRAINING SET SIZE FOR A MACHINE LEARNING SYSTEM

SYSTEMS AND METHODS FOR DETERMINING ONE OR MORE CHARACTERISTICS OF...

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

OVERLAY MARKS, METHODS OF OVERLAY MARK DESIGN AND METHODS OF OVERLA...

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

Parametric Profiling Using Optical Spectroscopic Systems

METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

OVERLAY MARKS, METHODS OF OVERLAY MARK DESIGN AND METHODS OF OVERLA...

Apparatus and methods for detecting overlay errors using scatterometry

Focus masking structures, focus patterns and measurements thereof

Overlay marks, methods of overlay mark design and methods of overla...

Overlay marks, methods of overlay mark design and methods of overla...

Focus masking structures, focus patterns and measurements thereof

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry

Apparatus and methods for detecting overlay errors using scatterometry