Walter E. Mlynko

Person

Vestal, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Combined chemical mechanical polishing and reactive ion etching pro...
- Patent number 6,221,775
- Issue date Apr 24, 2001
- International Business Machines Corp.
- Thomas G. Ference
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of photolithographically defining three regions with one mas...
- Patent number 6,147,394
- Issue date Nov 14, 2000
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of photolithographically defining three regions with one mas...
- Patent number 5,972,570
- Issue date Oct 26, 1999
- International Business Machines Corporation
- James A. Bruce
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing a narrow angle defined trench in a substrate
- Patent number 5,672,537
- Issue date Sep 30, 1997
- International Business Machines Corporation
- Daniel A. Carl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Angle defined trench conductor for a semiconductor device
- Patent number 5,610,441
- Issue date Mar 11, 1997
- International Business Machines Corporation
- Daniel A. Carl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Residue free vertical pattern transfer with top surface imaging res...
- Patent number 5,312,717
- Issue date May 17, 1994
- International Business Machines Corporation
- Harbans S. Sachdev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced plasma etching
- Patent number 5,110,409
- Issue date May 5, 1992
- IBM
- Frank D. Egitto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching a substrate with a gaseous organohalide co...
- Patent number 5,053,104
- Issue date Oct 1, 1991
- International Business Machines Corporation
- Suryadevara V. Babu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Enhanced plasma etching
- Patent number 4,985,112
- Issue date Jan 15, 1991
- International Business Machines Corporation
- Frank D. Egitto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for removing contaminant
- Patent number 4,853,081
- Issue date Aug 1, 1989
- IBM Corporation
- Walter E. Mlynko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Process for removing contaminant
- Patent number 4,654,115
- Issue date Mar 31, 1987
- International Business Machines Corporation
- Frank D. Egitto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Walter E. Mlynko

Person

Patents Grantslast 30 patents

Combined chemical mechanical polishing and reactive ion etching pro...

Method of photolithographically defining three regions with one mas...

Method of photolithographically defining three regions with one mas...

Method for preparing a narrow angle defined trench in a substrate

Angle defined trench conductor for a semiconductor device

Residue free vertical pattern transfer with top surface imaging res...

Enhanced plasma etching

Method of plasma etching a substrate with a gaseous organohalide co...

Enhanced plasma etching

Process for removing contaminant

Process for removing contaminant